Patents by Inventor Jochen Doehnel

Jochen Doehnel has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Production of VDMOS-transistors having optimized gate contact
    Patent number: 8268688
    Abstract: A method for producing VDMOS transistors in which a specific layer arrangement and a specific method sequence allow setting up an improved gate contact when simultaneously producing source and gate contacts using a single contact hole mask (photo mask).
    Type: Grant
    Filed: April 10, 2006
    Date of Patent: September 18, 2012
    Assignee: X-Fab Semiconductor Foundries AG
    Inventors: Jochen Doehnel, Siegfried Hering
  • Production of VDMOS-Transistors Having Optimized Gate Contact
    Publication number: 20100035366
    Abstract: The invention relates to a method for producing VDMOS transistors in which a specific layer arrangement and a specific method sequence allow setting up an improved gate contact when simultaneously producing source and gate contacts using a single contact hole mask (photo mask).
    Type: Application
    Filed: April 10, 2006
    Publication date: February 11, 2010
    Applicant: X-FAB Semiconductor Foundries AG
    Inventors: Jochen Doehnel, Siegfried Hering