Abstract: A process for producing an epitaxial and/or highly texturized grown film, free of foreign phases, of a high-T.sub.c -oxide superconductor on a substrate, in which an ablation process is triggered and maintained on a spender target by means of pulsed particles or a laser beams, and the thus developing small droplets are deposited on a heated substrate. The substrate is held at a temperature at which the droplets on impact wet the substrate and coagulate into a uniform smooth film.An apparatus for this process comprises an electron source which produces a pulsed electron beam with an electron energy of about 10 to 20 keV and a current density in the range of 10.sup.3 to 10.sup.4 A/cm.sup.2.

Abstract: A generator for pulsed electron beams of the type including a vacuum chamber for performing high voltage discharges, cathode and anode electrodes, for irradiating a sample with accelerated charge carriers, provided in the vacuum chamber, and a first high voltage capacitor connected between the cathode and anode electrodes to serve as the voltage source for the high voltage discharge between the electrodes.