Patents by Inventor Jochen Hetzler

Jochen Hetzler has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20130182264
    Abstract: A projection exposure tool for microlithography for exposing a substrate is disclosed. The tool includes a projection objective. The tool also includes an optical measuring apparatus for determining a surface topography of the substrate before the substrate is exposed. The measuring apparatus has a measuring beam path which extends outside of the projection objective. The measuring apparatus is a wavefront measuring apparatus configured to determine topography measurement values simultaneously at a number of points on the substrate surface.
    Type: Application
    Filed: March 7, 2013
    Publication date: July 18, 2013
    Applicant: Carl Zeiss SMT GmbH
    Inventors: Jochen Hetzler, Sascha Bleidistel, Toralf Gruner, Joachim Hartjes
  • Patent number: 8436982
    Abstract: A projection objective for microlithography includes at least one optical assembly with optical elements which are disposed between an object plane and an image plane. The optical assembly includes at least one optical terminal element, which is disposed close to the image plane. A first immersion liquid is disposed on the image oriented surface of the optical terminal element. A second immersion liquid is disposed on the object oriented surface of the optical terminal element. The object oriented surface includes a first surface section for the imaging light to enter into the terminal element, and the image oriented surface includes a second surface portion for the imaging light to exit from the terminal element.
    Type: Grant
    Filed: March 12, 2010
    Date of Patent: May 7, 2013
    Assignee: Carl Zeiss SMT GmbH
    Inventors: Helmut Beierl, Heiko Feldmann, Jochen Hetzler, Michael Totzeck
  • Publication number: 20120224186
    Abstract: A mirror (M) of a projection exposure apparatus for microlithography configured for structured exposure of a light-sensitive material and a method for producing a mirror (M). The mirror (M) has a substrate body (B), a first mirror surface (S) and a second mirror surface (S?). The first mirror surface (S) is formed on a first side (VS) of the substrate body (B). The second mirror surface (S?) is formed on a second side (RS) of the substrate body (B), the second side being different from the first side of the substrate body (B). The mirror (M) may be embodied, in particular, such that the substrate body (B) is produced from a glass ceramic material.
    Type: Application
    Filed: February 6, 2012
    Publication date: September 6, 2012
    Applicant: CARL ZEISS SMT GMBH
    Inventors: Jochen HETZLER, Ralf MUELLER, Wolfgang SINGER
  • Publication number: 20120160007
    Abstract: A method for calibrating an apparatus for the position measurement of measurement structures on a lithography mask comprises the following steps: qualifying a calibration mask comprising diffractive structures arranged thereon by determining positions of the diffractive structures with respect to one another by means of interferometric measurement, determining positions of measurement structures arranged on the calibration mask with respect to one another by means of the apparatus, and calibrating the apparatus by means of the positions determined for the measurement structures and also the positions determined for the diffractive structures.
    Type: Application
    Filed: April 10, 2010
    Publication date: June 28, 2012
    Applicant: CARL ZEISS SMS GMBH
    Inventors: Norbert Kerwien, Jochen Hetzler
  • Publication number: 20120092637
    Abstract: The disclosure relates to a microlithographic projection exposure apparatus and a microlithographic projection exposure apparatus, as well as related components, methods and articles made by the methods. The microlithographic projection exposure apparatus includes an illumination system and a projection objective. The illumination system can illuminate a mask arranged in an object plane of the projection objective. The mask can have structures which are to be imaged. The method can include illuminating a pupil plane of the illumination system with light. The method can also include modifying, in a plane of the projection objective, the phase, amplitude and/or polarization of the light passing through that plane. The modification can be effected for at least two diffraction orders in mutually different ways. A mask-induced loss in image contrast obtained in the imaging of the structures can be reduced compared to a method without the modification.
    Type: Application
    Filed: December 21, 2011
    Publication date: April 19, 2012
    Applicant: CARL ZEISS SMT GMBH
    Inventors: Michael Totzeck, Aksel Goehnermeier, Wolfgang Singer, Helmut Beierl, Heiko Feldmann, Hans-Juergen Mann, Jochen Hetzler
  • Patent number: 8107054
    Abstract: The disclosure relates to a microlithographic projection exposure apparatus and a microlithographic projection exposure apparatus, as well as related components, methods and articles made by the methods. The microlithographic projection exposure apparatus includes an illumination system and a projection objective. The illumination system can illuminate a mask arranged in an object plane of the projection objective. The mask can have structures which are to be imaged. The method can include illuminating a pupil plane of the illumination system with light. The method can also include modifying, in a plane of the projection objective, the phase, amplitude and/or polarization of the light passing through that plane. The modification can be effected for at least two diffraction orders in mutually different ways. A mask-induced loss in image contrast obtained in the imaging of the structures can be reduced compared to a method without the modification.
    Type: Grant
    Filed: September 15, 2008
    Date of Patent: January 31, 2012
    Assignee: Carl Zeiss SMT GmbH
    Inventors: Michael Totzeck, Aksel Goehnermeier, Wolfgang Singer, Helmut Beierl, Heiko Feldmann, Hans-Juergen Mann, Jochen Hetzler
  • Patent number: 8089634
    Abstract: Optical element having an optical surface, which optical surface is adapted to a non-spherical target shape, such that a long wave variation of the actual shape of the optical surface with respect to the target shape is limited to a maximum value of 0.2 nm, wherein the long wave variation includes only oscillations having a spatial wavelength equal to or larger than a minimum spatial wavelength of 10 mm.
    Type: Grant
    Filed: January 8, 2010
    Date of Patent: January 3, 2012
    Assignee: Carl Zeiss SMT GmbH
    Inventors: Jochen Hetzler, Frank Schillke, Stefan Schulte, Rolf Freimann, Bernd Doerband
  • Patent number: 7848031
    Abstract: A method of manufacturing an optical element (5) comprises testing an optical surface (3) of the optical element, using an interferometer 1a directing measuring light (23a) onto the optical surface wherein the measuring light traverses two successive holograms (44, 48) disposed in the beam path of the measuring light upstream of the optical surface.
    Type: Grant
    Filed: January 20, 2006
    Date of Patent: December 7, 2010
    Assignee: Carl Zeiss SMT AG
    Inventors: Jochen Hetzler, Susanne Beder, Heiko Feldmann
  • Publication number: 20100201959
    Abstract: A projection objective for microlithography includes at least one optical assembly with optical elements which are disposed between an object plane and an image plane. The optical assembly includes at least one optical terminal element, which is disposed close to the image plane. A first immersion liquid is disposed on the image oriented surface of the optical terminal element. A second immersion liquid is disposed on the object oriented surface of the optical terminal element. The object oriented surface includes a first surface section for the imaging light to enter into the terminal element, and the image oriented surface includes a second surface portion for the imaging light to exit from the terminal element.
    Type: Application
    Filed: March 12, 2010
    Publication date: August 12, 2010
    Applicant: CARL ZEISS SMT AG
    Inventors: Helmut Beierl, Heiko Feldmann, Jochen Hetzler, Michael Totzeck
  • Publication number: 20100177321
    Abstract: Optical element having an optical surface, which optical surface is adapted to a non-spherical target shape, such that a long wave variation of the actual shape of the optical surface with respect to the target shape is limited to a maximum value of 0.2 nm, wherein the long wave variation includes only oscillations having a spatial wavelength equal to or larger than a minimum spatial wavelength of 10 mm.
    Type: Application
    Filed: January 8, 2010
    Publication date: July 15, 2010
    Inventors: Jochen HETZLER, Frank Schillke, Stefan Schulte, Rolf Freimann, Bernd Doerband
  • Publication number: 20100134768
    Abstract: The disclosure relates to a projection exposure system for microlithography, which includes at least one optical system that has at least one optical element with at least two aspherical surfaces essentially arranged rigidly relative to each other.
    Type: Application
    Filed: November 23, 2009
    Publication date: June 3, 2010
    Applicant: CARL ZEISS SMT AG
    Inventors: Jochen Hetzler, Toralf Gruner
  • Patent number: 7605926
    Abstract: A method of positioning optical elements relative to each other uses an interferometer apparatus comprising a plurality of holograms generating beams of adjustment measuring light which are incident on optical surfaces of the optical elements. Interference patterns generated by superimposing adjustment measuring light of the beams reflected from the surfaces are indicative of positioning errors of the optical elements. The beams of adjustment measuring light may comprise focused beams forming a point focus on the optical surface and beams of light which is orthogonally incident on extended portions on the optical surface.
    Type: Grant
    Filed: August 22, 2008
    Date of Patent: October 20, 2009
    Assignee: Carl Zeiss SMT AG
    Inventors: Jochen Hetzler, Ralf Arnold, Frank Schillke, Bernd Doerband
  • Publication number: 20090073398
    Abstract: The disclosure relates to a microlithographic projection exposure apparatus and a microlithographic projection exposure apparatus, as well as related components, methods and articles made by the methods. The microlithographic projection exposure apparatus includes an illumination system and a projection objective. The illumination system can illuminate a mask arranged in an object plane of the projection objective. The mask can have structures which are to be imaged. The method can include illuminating a pupil plane of the illumination system with light. The method can also include modifying, in a plane of the projection objective, the phase, amplitude and/or polarization of the light passing through that plane. The modification can be effected for at least two diffraction orders in mutually different ways. A mask-induced loss in image contrast obtained in the imaging of the structures can be reduced compared to a method without the modification.
    Type: Application
    Filed: September 15, 2008
    Publication date: March 19, 2009
    Applicant: Carl Zeiss SMT AG
    Inventors: Michael Totzeck, Aksel Goehnermeier, Wolfgang Singer, Helmut Beierl, Heiko Feldmann, Hans-Juergen Mann, Jochen Hetzler
  • Publication number: 20080137090
    Abstract: A method of manufacturing an optical element (5) comprises testing an optical surface (3) of the optical element, using an interferometer 1a directing measuring light (23a) onto the optical surface wherein the measuring light traverses two successive holograms (44, 48) disposed in the beam path of the measuring light upstream of the optical surface.
    Type: Application
    Filed: January 20, 2006
    Publication date: June 12, 2008
    Applicant: Carl Zeiss SMT AG
    Inventors: Jochen Hetzler, Susanne Beder, Heiko Feldmann
  • Publication number: 20060274325
    Abstract: A method of qualifying a diffraction grating comprises performing plural measurements by illuminating a region of the grating with a beam of measuring light and detecting an intensity of measuring light diffracted by the grating into a 0th diffraction order. A wavelength of the measuring light or a polarization of the measuring light or an angle of incidence of the measuring light onto the diffraction grating is varied between subsequent measurements. A shape parameter of diffracting elements forming the grating comprises a pitch, height or width of structural features of the diffracting elements. The shape parameter is advantageously used in analyzing interferometric measurements performed on optical surfaces during manufacture of optical elements of a high accuracy.
    Type: Application
    Filed: May 23, 2006
    Publication date: December 7, 2006
    Applicant: Carl Zeiss SMT AG
    Inventors: Jochen Hetzler, Ulrich Andiel, Hartmut Brandenburg
  • Patent number: 7061626
    Abstract: A method of manufacturing an optical element having an optical surface of a target shape includes performing an interferometric test using an interferometer optics, wherein the interferometer optics includes a hologram that deflects a beam of measuring light by a substantial angle or that displaces an axis of symmetry of measuring light emerging from the hologram with respect to an axis of symmetry of measuring light incident on the hologram.
    Type: Grant
    Filed: May 14, 2004
    Date of Patent: June 13, 2006
    Assignee: Carl Zeiss SMT AG
    Inventors: Frank Schillke, Susanne Beder, Jochen Hetzler
  • Publication number: 20050123840
    Abstract: A mask (20) for use in a microlithographic projection exposure apparatus (10) has a support (28) on which a pattern of opaque structures (32) is applied. The intermediate spaces (36, 36?) remaining between the structures (32c) are filled with a liquid or solid dielectric material (38, 38?). This increases the polarisation dependency of the diffraction efficiency, so that the mask can be used as a polarizer.
    Type: Application
    Filed: November 10, 2004
    Publication date: June 9, 2005
    Inventors: Michael Totzeck, Toralf Gruner, Jochen Hetzler