Patents by Inventor Jochen Ritter

Jochen Ritter has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 5498291
    Abstract: The invention relates to an arrangement for coating or etching substrates. In this arrangement an HF substrate bias voltage is generated without contact. For this purpose plasma sources are equipped with a bias pot which is disposed at the dark space distance from a substrate carrier and acted upon by HF. Depending on the source used, the bias pot can be constructed as an independent unit or as a component part of the source connected so as to be conducting-for example as an HF magnetron. Via this coupled-in HF power the dc potential on the carrier, and consequently the ion bombardment on the substrate, can be set specifically.
    Type: Grant
    Filed: March 17, 1995
    Date of Patent: March 12, 1996
    Assignee: Leybold Aktiengesellschaft
    Inventors: Manfred Arnold, Guido Blang, Rainer Gegenwart, Jochen Ritter, Helmut Stoll
  • Patent number: 5423971
    Abstract: The invention relates to an electrode configuration for a device for generating a plasma. RF is coupled contactlessly via a capacitive coupling electrode disposed at the dark space distance into a carrier backside of a coating installation. Dark space shields on the coating side define the plasma zone and prevent the formation of parasitic plasmas. HF substrate bias voltage on the moving substrate carrier is achieved with a defined plasma zone and the development of parasitic plasmas is avoided.
    Type: Grant
    Filed: January 10, 1994
    Date of Patent: June 13, 1995
    Assignee: Leybold Aktiengesellschaft
    Inventors: Manfred Arnold, Guido Blang, Rainer Gegenwart, Klaus Michael, Michael Scherer, Jochen Ritter, Oliver Burkhardt
  • Patent number: 5318928
    Abstract: The method calls for introducing an inert gas into a tank where a high frequency energy source is applied to internal electrodes for the ignition of a plasma within the tank. The sensor surface is cleaned by sputtering away impurities from the sensor surface by means of plasma particles striking the sensor surface. Next, a monomer containing silicon and a reactive gas are introduced into the tank with continuous throttling of the inert gas feed and maintenance of the plasma, while the electric power characteristics fed into the plasma are being controlled. This leads to the deposition on the sensor surface of a compound composed of particles from the monomer containing silicon and from the reactive gas.
    Type: Grant
    Filed: June 11, 1992
    Date of Patent: June 7, 1994
    Assignee: Leybold Aktiengesellschaft
    Inventors: Rainer Gegenwart, Jochen Ritter, Helmut Stoll, Norbert Weimer, Hans-Dieter Wurczinger
  • Patent number: 5237152
    Abstract: Apparatus for thin-coating processes for the treatment of substrates (8) of large surface area using a plasma (6) which is excited by microwaves (M) and the latter are coupled from a source by means of a waveguide (1) consisting of at least one hollow conductor (1), as well as by means of a horn antenna, into a plasma chamber (5), the waveguide (W) having a substantially rectangular aperture, an area is provided at the end of the hollow conductor (Q) with a slit-like constriction (Q), a rectangular horn (2) adjoins this area, and a compensation area (3) is provided between the largest aperture of the rectangular horn (2), as well as of the plasma chamber (5).
    Type: Grant
    Filed: September 30, 1991
    Date of Patent: August 17, 1993
    Assignee: Leybold Aktiengesellschaft
    Inventors: Rainer Gegenwart, Roland Gesche, Karl-Heinz Kretschmer, Jochen Ritter, Sonja Noll
  • Patent number: 5224202
    Abstract: A heated evaporator housing is provided at its inlet with an ultrasonic atomizer for reducing monomer to small droplets and a permeable porous body completely occupying a cross section of the housing between the inlet and the outlet. A vacuum pump and a reaction chamber for coating substrates are provided downstream of the outlet.
    Type: Grant
    Filed: September 19, 1991
    Date of Patent: June 29, 1993
    Assignee: Leybold Aktiengesellschaft
    Inventors: Manfred Arnold, Rainer Gegenwart, Sonja Noll, Jochen Ritter, Helmut Stoll
  • Patent number: 5144196
    Abstract: Particle source, especially for reactive ion etching and plasma-enhanced CVD processes in pass-through apparatus for the treatment of large-area substrates (4) having a container completely enveloping a first plasma (19), a magnetic field generator (8, 9, 10) which fulfills the electron-cyclotron resonance, a waveguide (15) connected to the container for the delivery of electromagnetic waves, preferably microwaves (17), for the production of the plasma (19), a coupling window (16) as well as a gas feeding system for supplying the plasma process with reactive, and, for example, inert gas, the first plasma (19) being enveloped by a plasma chamber (7), the interior spaces of the plasma chamber (7) and of the adjacent vacuum chamber (2) are connected to one another, an additional guard window (12) is situated in the plasma chamber (7) directly in front of the coupling window and has an approximately constant gap (13) between it and the chamber walls (7c, 7d), a separate feeding is performed of for example inert g
    Type: Grant
    Filed: September 30, 1991
    Date of Patent: September 1, 1992
    Assignee: Leybold Aktiengesellschaft
    Inventors: Rainer Gegenwart, Jochen Ritter
  • Patent number: 5069930
    Abstract: Monomers containing silicon and oxygen which are liquid at room temperature and have a low vapor pressure are fed in a liquid state via a mass flow regulator to an evaporator provided with a body having capillary action where the liquid is evaporated by radiant heat. Evaporated monomer is fed to the reaction zone of a vacuum chamber where thin coatings are applied on substrates by chemical vapor deposition.
    Type: Grant
    Filed: March 29, 1990
    Date of Patent: December 3, 1991
    Assignee: Leybold Aktiengesellschaft
    Inventors: Ingo Hussla, Jochen Ritter
  • Patent number: 4947789
    Abstract: An evaporator chamber has an entry end with a conduit connected to the output of a mass flow regulator, an exit end connected to a vacuum, and a wall surface extending therebetween. A body having capillary action is disposed in the chamber and has one end connected to the conduit and a free surface spaced from the wall surface in line of sight thereof. Heating means for the wall surface heats the body radiantly and causes monomer carried thereby to evaporate.
    Type: Grant
    Filed: November 4, 1988
    Date of Patent: August 14, 1990
    Assignee: Leybold Aktiengesellschaft
    Inventors: Ingo Hussla, Jochen Ritter