Abstract: A tape manufacturing system and a tape-surface-inspection unit are disclosed. The tape-surface-inspection unit is capable of continuously characterizing the surface of a non-transparent tape that is usable with or without a tape manufacturing system. The tape-surface-inspection unit includes a surface illuminator, an imager, an image processor, a tape guide, and, optionally, an indexer. The surface illuminator provides a tape surface located by the tape guide in a manner that allows the imager to capture images for characterization by the image processor. The indexer facilitates a correlation of locations along the tape and a characterization of the locations on the tape. The tape manufacturing system, in addition to at least one tape-surface-inspection unit, includes a tape-processing unit, a tape handler, and a controller.

Abstract: A tape manufacturing system and a tape-surface-inspection unit are disclosed. The tape-surface-inspection unit is capable of continuously characterizing the surface of a non-transparent tape that is usable with or without a tape manufacturing system. The tape-surface-inspection unit includes a surface illuminator, an imager, an image processor, a tape guide, and, optionally, an indexer. The surface illuminator provides a tape surface located by the tape guide in a manner that allows the imager to capture images for characterization by the image processor. The indexer facilitates a correlation of locations along the tape and a characterization of the locations on the tape. The tape manufacturing system, in addition to at least one tape-surface-inspection unit, includes a tape-processing unit, a tape handler, and a controller.

Abstract: An x-ray diffraction measurement apparatus for measuring a sample, having an x-ray source and detector coupled together in a combination for coordinated rotation around the sample, such that x-ray diffraction data can be taken at multiple phi angles. The apparatus may provide a pole figure representation of crystal orientation of the sample, wherein the pole figure represents the crystal alignment, and a full width half maximum value is calculated from the pole figure for crystal alignment quantification. Data may be taken at discrete positions along a length of the sample, and the sample is in a fixed position during measuring; or data may be taken continuously along a length of the article, as the sample continuously moves along its length in a movement path between the source and detector. The sample may be in the form of a tape, linearly passing through a measurement zone.

Abstract: A method for forming a superconductive article is disclosed. According to one method, a substrate is provided, the substrate having an aspect ratio of not less than about 1×103, forming a buffer layer overlying the substrate, forming a superconductor layer overlying the buffer layer, and characterizing at least one of the substrate, the buffer layer and the superconductor layer by x-ray diffraction. In this regard, x-ray diffraction is carried out such that data are taken at multiple phi angles. Data acquisition at multiple phi angles permits robust characterization of the film or layer subject to characterization, and such data may be utilized for process control and/or quality control. Additional methods for forming superconductive articles, and for characterizing same with XRD are also disclosed.