Patents by Inventor JOE-MING CHANG

JOE-MING CHANG has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 9442132
    Abstract: A drying system, which can be implemented in an atomic force microscopy (AFM) machine according to the invention, includes an elastomer having elasticity and disposed between an AFM scan head device and a platen to form a chamber. A sample supporting substrate is disposed in the chamber and for placement of a specimen. A gas inlet pipeline extends from an outside of the chamber to an inside of the chamber to introduce a drying gas into the chamber. A gas outlet pipeline extends from the inside of the chamber to the outside of the chamber to exhaust the drying gas out of the chamber. Using the mechanism of introducing and exhausting the drying gas can exhaust the moisture out of the chamber, so that the relative humidity (RH) is decreased below 5% and a constant internal pressure is held in the space to become stable.
    Type: Grant
    Filed: February 19, 2015
    Date of Patent: September 13, 2016
    Assignee: NATIONAL TSING HUA UNIVERSITY
    Inventors: Fan-Gang Tseng, Joe-Ming Chang
  • Publication number: 20160003867
    Abstract: A drying system, which can be implemented in an atomic force microscopy (AFM) machine according to the invention, includes an elastomer having elasticity and disposed between an AFM scan head device and a platen to form a chamber. A sample supporting substrate is disposed in the chamber and for placement of a specimen. A gas inlet pipeline extends from an outside of the chamber to an inside of the chamber to introduce a drying gas into the chamber. A gas outlet pipeline extends from the inside of the chamber to the outside of the chamber to exhaust the drying gas out of the chamber. Using the mechanism of introducing and exhausting the drying gas can exhaust the moisture out of the chamber, so that the relative humidity (RH) is decreased below 5% and a constant internal pressure is held in the space to become stable.
    Type: Application
    Filed: February 19, 2015
    Publication date: January 7, 2016
    Inventors: FAN-GANG TSENG, JOE-MING CHANG
  • Patent number: 8726411
    Abstract: A charged probe and an electric field measuring method are provided. The probe can be charged with single electricity on single nano particle attached on the top of the probe tip being a charged probe and the probe is applicable for measuring the electric fields of object in the nano scale. The probe comprises an insulating tip base, a cantilever and a single nano-particle. The cantilever is arranged for supporting the insulating tip base and the single nano-particle is configured on the erosion plane. After conducting contact electrification method to charge the electric nano particle, the single nano-particle will be charged with fixed number of single electrical charge. Then, the amount of the fixed number of single electrical charge is calculated by the virtual image charge calculation method. The charged probe can be used to measure the electric fields distribution by tapping mode or f-d curve measurement.
    Type: Grant
    Filed: June 18, 2013
    Date of Patent: May 13, 2014
    Assignee: National Tsing Hua University
    Inventors: Fan-Gang Tseng, Joe-Ming Chang
  • Publication number: 20140020140
    Abstract: A multi-head probe suitable for an atomic force microscopy (AFM) comprises a tip base, a single cantilever beam and at least two tips. The tip base has a tip end, which is ground to form a surface. The cantilever beam is connected to the tip base and for supporting the tip base. The at least two tips are disposed on the surface.
    Type: Application
    Filed: November 19, 2012
    Publication date: January 16, 2014
    Applicant: NATIONAL TSING HUA UNIVERSITY
    Inventors: FAN-GANG TSENG, JOE-MING CHANG