Patents by Inventor Joe Piccirillo

Joe Piccirillo has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Methods for fabricating dual material gate in a semiconductor device
    Patent number: 7635648
    Abstract: A method for fabricating dual material gate structures in a device is provided. The dual material gate structures have different gate electrode materials in different regions of the device. In one embodiment, the method includes providing a substrate having a patterned first gate electrode and a patterned first gate dielectric layer disposed on the substrate, removing a portion of the first gate electrode from the substrate to define a trench on the substrate, and filling the trench to form a second gate electrode.
    Type: Grant
    Filed: April 10, 2008
    Date of Patent: December 22, 2009
    Assignee: Applied Materials, Inc.
    Inventors: Igor Peidous, Victor Ku, Joe Piccirillo
  • METHODS FOR FABRICATING DUAL MATERIAL GATE IN A SEMICONDUCTOR DEVICE
    Publication number: 20090258484
    Abstract: A method for fabricating dual material gate structures in a device is provided. The dual material gate structures have different gate electrode materials in different regions of the device. In one embodiment, the method includes providing a substrate having a patterned first gate electrode and a patterned first gate dielectric layer disposed on the substrate, removing a portion of the first gate electrode from the substrate to define a trench on the substrate, and filling the trench to form a second gate electrode.
    Type: Application
    Filed: April 10, 2008
    Publication date: October 15, 2009
    Inventors: IGOR PEIDOUS, Victor Ku, Joe Piccirillo