Abstract: An apparatus, in accordance with one embodiment, includes a superjunction device having a voltage sustaining layer formed of a semiconductor material and a dopant in the voltage sustaining layer. The dopant is for distributing an electric field within the voltage sustaining layer. The dopant is more concentrated along a sidewall of the voltage sustaining layer than toward a center of the voltage sustaining layer, the sidewall extending at least a portion of the distance between a top surface and a bottom surface of a voltage sustaining layer. Methods of electric field-enhanced dopant diffusion to form a superjunction device are also presented.

Abstract: Ultraviolet light sources such as UV and DUV laser diodes and light emitting diodes (LEDs) are described. The UV light source may comprise at least one quantum well with first and second photoconductive layers on opposite sides thereof. The UV light source may further comprise at least one optical pump configured to direct pump light to the UV light emitter. The pump light may have a photon energy less than the band gap of the at least one quantum well to increase the conductivity of electrons and holes in the first and second photoconductive layers. The electrons and holes can thereby propagate to the quantum well where at least some of the electrons and holes combine resulting in the emission of UV light.

Abstract: An apparatus includes a heterostructure including a substrate of Group-III-nitride material, a source layer including a dopant positioned on a surface of the substrate, and a conductive cap layer positioned on the source layer. A method of electric field-enhanced impurity diffusion includes obtaining a heterostructure including a substrate of Group-III-nitride semiconductor material, a source layer including a dopant positioned directly on the substrate, and a conductive cap layer positioned above the source layer, and applying a thermal annealing treatment to the heterostructure. An electric field gradient is established within the source layer and the cap layer for causing diffusion of an element from the substrate to the cap layer, and for causing diffusion of the dopant from the source layer to a former location of the element in the substrate thereby changing a conductivity and/or magnetic characteristic of the substrate.