Abstract: Provided herein are compositions and systems comprising an engineered release factor and methods for producing the same. Also provided herein are compositions, systems, and methods for producing a polypeptide comprising a non-canonical amino acid.

Abstract: A method for adjusting a display setting of a display is disclosed. The method comprises detecting an ambient lighting condition; determining whether a stored display setting corresponding to the detected ambient lighting condition exists in a memory; if the corresponding stored display Detecting a condition of ambient setting does not exist, requesting a user entry of a display setting as the corresponding stored display setting; and adjusting the display setting of the display according to the corresponding stored display setting.

Abstract: A system and method for effective communication across a plurality of communication modalities are provided. The present disclosure provides for a communication platform (116) that determines the most effective communication modality for communication with a particular user based on a plurality of factors, such as, but not limited to, the time of the communication, the communication history with the particular user, and any stored preferences. Additionally, the present disclosure provides for a content filter (222) for filtering inappropriate content of a communication to a user based on factors such as, but not limited to, the communication modality used, the location of the sender, and the relationship of the sender to the recipient.

Abstract: A reagent assembly for a combustion tube includes a reagent tube which is sealably and removably coupled to the open end of the combustion tube such that, when the reagent in the reagent tube is depleted, it can be easily removed without disassembly of the furnace or changing the combustion tube. The reagent tube includes a twist-lock cap to facilitate removal of the reagent tube.

Abstract: A method for forming a cavity (30) to a structure such as a poly fuse (114) with a deep etch process whereby a mask is formed over the structure a first dielectric layer (23) and an etch partially through the first dielectric layer is performed. Next, a second dielectric layer (34) is deposited and a second mask is formed for completing the etch to the structure. Finally, an etch through the second dielectric (34) to an area at or near the structure is performed. A resultant device has non-etched second dielectric material on the sidewalls of the etch cavity 30.

Abstract: A method for forming a cavity (30) to a structure such as a poly fuse (114) with a deep etch process whereby a mask is formed over the structure a first dielectric layer (23) and an etch partially through the first dielectric layer is performed. Next, a second dielectric layer (34) is deposited and a second mask is formed for completing the etch to the structure. Finally, an etch through the second dielectric (34) to an area at or near the structure is performed. A resultant device has non-etched second dielectric material on the sidewalls of the etch cavity 30.