Patents by Inventor Joel S. Rossier

Joel S. Rossier has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 7087181
    Abstract: The technology is based on the anisotropic plasma etching of organic polymer sheets partially protected by a metallic mask. The originality of the process is to pattern the surface properties by the same physical means as the one used for the three dimensional fabrication and simultaneously to this fabrication. Surface properties means, but are not limited to hydrophobicity, hydrophilicity, conductivity, reflectability, rugosity and more precisely the chemical and/or physical state of the surface. It is also possible to generate the desired fonctionalities, for instance carboxylic acid, ester, ether, amid or imid, during the etching process. The patterning of the different properties may be achieved by two different techniques that may be used separately or simultaneously.
    Type: Grant
    Filed: January 30, 2001
    Date of Patent: August 8, 2006
    Assignee: DiagnoSwiss S.A.
    Inventors: Walter Schmidt, Frédéric Reymond, Joël S. Rossier
  • Patent number: 7037417
    Abstract: An apparatus for manipulating fluid samples comprises a micro-chip device having first and second covered channels, each channel having openings at both ends. The channels intersect to form a common intersection. Three of the openings of the channels are connected to a multi-port valve to control pressure in the device.
    Type: Grant
    Filed: March 19, 2001
    Date of Patent: May 2, 2006
    Assignees: Ecole Polytechnique Federale de Lausanne, DiagnoSwiss SA
    Inventors: Joel S. Rossier, Frederic Reymond, Hye Jin Lee, Xiaoxia Bai, Hubert H. Girault
  • Publication number: 20030102284
    Abstract: The technology is based on the anisotropic plasma etching of organic polymer sheets partially protected by a metallic mask. The originality of the process is to pattern the surface properties by the same physical means as the one used for the three dimensional fabrication and simultaneously to this fabrication. Surface properties means, but are not limited to hydrophobicity, hydrophilicity, conductivity, reflectability, rugosity and more precisely the chemical and/or physical state of the surface. It is also possible to generate the desired fonctionalities, for instance carboxylic acid, ester, ether, amid or imid, during the etching process. The patterning of the different properties may be achieved by two different techniques that may be used separately or simultaneously.
    Type: Application
    Filed: October 18, 2002
    Publication date: June 5, 2003
    Inventors: Walter Schmidt, Frederic Reymond, Joel S. Rossier
  • Publication number: 20020130044
    Abstract: An apparatus for manipulating fluid samples is described. The apparatus comprises a micro-chip device having at least a first and second covered channel with openings at either end of said first and second covered channel. The first and second covered channels intersect to form a common intersection. In use at least three of the openings to said first and second covered channels are connected to a multi-port valve to control the pressure in the device.
    Type: Application
    Filed: March 19, 2001
    Publication date: September 19, 2002
    Inventors: Joel S. Rossier, Frederic Reymond, Hye Jin Lee, Xiaoxia Bai, Hubert H. Girault