Abstract: The invention relates to a lens (1) for vision correction, particularly in form of a contact lens, for vision correction, wherein the lens (1) comprises: a transparent base element (10) having a back side (12), and a front side (11) facing away from the back side (12), a transparent and elastically expandable membrane (20) connected to said base element (10), wherein said membrane (20) comprises a back side (22) that faces said front side (11) of the base element (10), a lens shaping member (particularly (30) connected to said the membrane (20)) so that the lens shaping member (30) defines an area (23) of the membrane (20) having an adjustable curvature, and wherein the lens (1) comprises a lens volume (41) adjacent said area (23), and wherein the lens (1) comprises a reservoir volume (42) arranged in a peripheral region (24) of the lens (1), wherein a transparent liquid (50) is arranged in the lens volume and in the reservoir volume, and at least one electro-osmotic pump (70) configured to transfer transpare

Abstract: In a method for producing a sensor element, a silicon nanowire having a diameter less than 50 nm is contacted via at least two points by electrodes. The nanowire and the electrodes are arranged on one plane on a substrate. Catalytically active metal nanoparticles having a diameter in the range of 0.5-50 nm are deposited on the surface of an insulating substrate and the surface and the metal nanoparticles deposited thereon are exposed to a gas flow containing a gaseous silicon component at a temperature in the range of 300-1100° C., whereupon, during a time period in the range of 10-200 minutes, a nanowire of a length in the range of 5-200 ?m projecting from the substrate is formed.

Abstract: In a method for producing a sensor element, a silicon nanowire having a diameter less than 50 nm is contacted via at least two points by electrodes. The nanowire and the electrodes are arranged on one plane on a substrate. Catalytically active metal nanoparticles having a diameter in the range of 0.5-50 nm are deposited on the surface of an insulating substrate and the surface and the metal nanoparticles deposited thereon are exposed to a gas flow containing a gaseous silicon component at a temperature in the range of 300-1100° C., whereupon, during a time period in the range of 10-200 minutes, a nanowire of a length in the range of 5-200 ?m projecting from the substrate is formed.