Abstract: Device and method for producing defined properties of gradient layers in a system of multilayered coatings in sputtering installations with the following features: a) a pair of cathodes arranged in a common process chamber and consisting of a first cathode body and a second cathode body is supplied with direct current by means of a common power supply, wherein, before entering the process chamber, the direct current is converted into a series of pulses comprising alternating positive and negative pulses with interpulse periods in between, b) an arrangement for controlling the length of the individual pulses and the duration of the respective interpulse periods.

Abstract: Device and method for producing defined properties of gradient layers in a system of multilayered coatings in sputtering installations with the following features: a) a pair of cathodes arranged in a common process chamber and consisting of a first cathode body and a second cathode body is supplied with direct current by means of a common power supply, wherein, before entering the process chamber, the direct current is converted into a series of pulses comprising alternating positive and negative pulses with interpulse periods in between, b) an arrangement for controlling the length of the individual pulses and the duration of the respective interpulse periods.

Abstract: Disclosed are an apparatus and a method for saving energy while increasing the conveying speed in vacuum coating plants consisting of a series of sputtering segments (3) and gas separation segments (2) along with a continuous substrate plane (1).

Abstract: Disclosed are an apparatus and a method for saving energy while increasing the conveying speed in vacuum coating plants consisting of a series of sputtering segments (3) and gas separation segments (2) along with a continuous substrate plane (1).

Abstract: A layer system that can be annealed comprises a transparent substrate, preferably a glass substrate, and a first layer sequence which is applied directly to the substrate or to one or more bottom layers that are deposited onto the substrate. The layer sequence includes a substrate-proximal blocking layer, a selective layer and a substrate-distal blocking layer. Also provided is a method for producing a layer system that can be annealed and has a sufficient quality even under critical climatic conditions and/or undefined conditions of the substrate. During the heat treatment (annealing, bending), the color location of the layer system is maintained substantially stable and the color location can be widely varied at a low emissivity of the layer system. For this purpose, a first dielectric intermediate layer is interposed between the substrate-proximal blocking layer and the selective layer and is configured as a substoichiometric gradient layer.

Abstract: A layer system that can be annealed comprises a transparent substrate, preferably a glass substrate, and a first layer sequence which is applied directly to the substrate or to one or more bottom layers that are deposited onto the substrate. The layer sequence includes a substrate-proximal blocking layer, a selective layer and a substrate-distal blocking layer. Also provided is a method for producing a layer system that can be annealed and has a sufficient quality even under critical climatic conditions and/or undefined conditions of the substrate. During the heat treatment (annealing, bending), the color location of the layer system is maintained substantially stable and the color location can be widely varied at a low emissivity of the layer system. For this purpose, a first dielectric intermediate layer is interposed between the substrate-proximal blocking layer and the selective layer and is configured as a substoichiometric gradient layer.

Abstract: A layer system that can be annealed comprises a transparent substrate, preferably a glass substrate, and a first layer sequence which is applied directly to the substrate or to one or more bottom layers that are deposited onto the substrate. The layer sequence includes a substrate-proximal blocking layer, a selective layer and a substrate-distal blocking layer. Also provided is a method for producing a layer system that can be annealed and has a sufficient quality even under critical climatic conditions and/or undefined conditions of the substrate. During the heat treatment (annealing, bending), the color location of the layer system is maintained substantially stable and the color location can be widely varied at a low emissivity of the layer system. For this purpose, a first dielectric intermediate layer is interposed between the substrate-proximal blocking layer and the selective layer and is configured as a substoichiometric gradient layer.

Abstract: A layer system that filters sun and heat can be applied to glass by a vacuum coating process. The system comprises at least one series of metal layers in addition to a respective series of lower dielectric layers and a respective series of upper dielectric layers. At least one series of metal layers and one series of upper and lower dielectric layers are configured as a sandwich system, wherein one metal layer is encapsulated by an upper and a lower intermediate layer consisting of hypostoichiometrically nitrided or oxidized metal of the metal layer and sandwich systems of the series of layers contain individual sandwich layers of a stoichiometric and hypostoichiometric oxide or nitride of a metal or semiconductor. An oxygen or nitrogen deficit of the sandwich layers increases towards a neighboring sandwich system and the oxide and nitride layers are produced in a vacuum coating process.

Abstract: A layer system that can be annealed comprises a transparent substrate, preferably a glass substrate, and a first layer sequence which is applied directly to the substrate or to one or more bottom layers that are deposited onto the substrate. The layer sequence includes a substrate-proximal blocking layer, a selective layer and a substrate-distal blocking layer. Also provided is a method for producing a layer system that can be annealed and has a sufficient quality even under critical climatic conditions and/or undefined conditions of the substrate. During the heat treatment (annealing, bending), the color location of the layer system is maintained substantially stable and the color location can be widely varied at a low emissivity of the layer system. For this purpose, a first dielectric intermediate layer is interposed between the substrate-proximal blocking layer and the selective layer and is configured as a substoichiometric gradient layer.

Abstract: A layer system that filters sun and heat can be applied to glass by a vacuum coating process. The system comprises at least one series of metal layers in addition to a respective series of lower dielectric layers and a respective series of upper dielectric layers. At least one series of metal layers and one series of upper and lower dielectric layers are configured as a sandwich system, wherein one metal layer is encapsulated by an upper and a lower intermediate layer consisting of hypostoichiometrically nitrided or oxidized metal of the metal layer and sandwich systems of the series of layers contain individual sandwich layers of a stoichiometric and hypostoichiometric oxide or nitride of a metal or semiconductor. An oxygen or nitrogen deficit of the sandwich layers increases towards a neighboring sandwich system and the oxide and nitride layers are produced in a vacuum coating process.