Abstract: A method includes defining a disparity range having discrete disparities and taking first, second, and third images of a spatial region using first, second, and third imaging units. The imaging units are arranged in an isosceles triangle geometry. The method includes determining first similarity values for a pixel of the first image for all the discrete disparities along a first epipolar line associated with the pixel in the second image. The method includes determining second similarity values for the pixel for all discrete disparities along a second epipolar line associated with the pixel in the third image. The method includes combining the first and second similarity values and determining a common disparity based on the combined similarity values. The method includes determining a distance to a point within the spatial region for the pixel from the common disparity and the isosceles triangle geometry.

Abstract: A method includes defining a disparity range having discrete disparities and taking first, second, and third images of a spatial region using first, second, and third imaging units. The imaging units are arranged in an isosceles triangle geometry. The method includes determining first similarity values for a pixel of the first image for all the discrete disparities along a first epipolar line associated with the pixel in the second image. The method includes determining second similarity values for the pixel for all discrete disparities along a second epipolar line associated with the pixel in the third image. The method includes combining the first and second similarity values and determining a common disparity based on the combined similarity values. The method includes determining a distance to a point within the spatial region for the pixel from the common disparity and the isosceles triangle geometry.

Abstract: A spatial area is monitored by means of at least a first and a second image recording unit that have a common viewing area. At least one virtual protection zone is defined within the common viewing area. A first and a second image of the spatial area are recorded by means of the first and a second image recording unit. The images are compared with one another in order to identify mutually disjoint image regions in the images. An alarm signal is generated when a disjoint image region covers the virtual protection zone.

Abstract: A method of forming an integrated deep and shallow trench isolation structure comprises depositing a hard mask on a film stack having a plurality of layers formed on a substrate such that the hard mask is deposited on a furthermost layer from the substrate, imprinting a first pattern into the hard mask to define an open end of a first trench, imprinting a second pattern into the hard mask to define an open end of a second trench, and etching into the film stack the first trench to a first depth and the second trench to a second depth such that the first trench and the second trench each define a blind aperture in the surface of the film stack.

Abstract: A spatial area is monitored by means of at least a first and a second image recording unit that have a common viewing area. At least one virtual protection zone is defined within the common viewing area. A first and a second image of the spatial area are recorded by means of the first and a second image recording unit. The images are compared with one another in order to identify mutually disjoint image regions in the images. An alarm signal is generated when a disjoint image region covers the virtual protection zone.

Abstract: A method of forming an integrated deep and shallow trench isolation structure comprises depositing a hard mask on a film stack having a plurality of layers formed on a substrate such that the hard mask is deposited on a furthermost layer from the substrate, imprinting a first pattern into the hard mask to define an open end of a first trench, imprinting a second pattern into the hard mask to define an open end of a second trench, and etching into the film stack the first trench to a first depth and the second trench to a second depth such that the first trench and the second trench each define a blind aperture in the surface of the film stack.

Abstract: There are disclosed polybenzoxazole precursors which can be processed by centrifugal techniques, which can be cyclized to polybenzoxazoles on substrates without difficulty, and which after cyclization to polybenzoxazoles exhibit a high temperature stability. In particular, these precursors and the polybenzoxazoles prepared from them possess high resistance against the diffusion of metals.

Abstract: A method for metallizing dielectrics includes applying a photosensitive dielectric to a substrate. The dielectric is then exposed to light through a mask, is seeded with a metal and is subjected to a temperature treatment. Afterwards, the dielectric is chemically metallized. Alternatively, the dielectric can be first be seeded with a metal after being applied to the substrate, and can then be exposed to light through a mask. Afterwards, excess seeding material is removed and the dielectric is chemically metallized.

Abstract: Bis-o-aminophenols and o-aminophenolcarboxylic acids have the following structures: A1 to A7 are, independently of each other, H, F, CH3, CF3, OCH3 or OCF3. T is an aromatic or heterocyclic residue. A method for preparing bis-o-aminophenols and o-aminophenolcarboxylic acids is also provided.

Abstract: A method for metallizing dielectrics includes applying a photosensitive dielectric to a substrate. The dielectric is then exposed to light through a mask, is seeded with a metal and is subjected to a temperature treatment. Afterwards, the dielectric is chemically metallized. Alternatively, the dielectric can be first be seeded with a metal after being applied to the substrate, and can then be exposed to light through a mask. Afterwards, excess seeding material is removed and the dielectric is chemically metallized.