Patents by Inventor Joerg Holzmann

Joerg Holzmann has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Microlithographic projection exposure apparatus and method of correcting optical wavefront deformations in such an apparatus
    Patent number: 9684251
    Abstract: A microlithographic projection exposure apparatus includes a correction device configured to correct optical wavefront deformations. The correction device includes first and second optical elements and a drive mechanism configured to move the first and second optical elements between a first arrangement and a second arrangement. In the first arrangement the first optical element is an inner optical element having at least a portion that is arranged in a projection light path, and the second optical element is an outer optical element that is arranged completely outside the projection light path. In the second arrangement the second optical element is the inner optical element, and the first optical element is the outer optical element. The correction device further includes a temperature control device configured to modify a temperature distribution in the outer optical element.
    Type: Grant
    Filed: February 29, 2016
    Date of Patent: June 20, 2017
    Assignee: Carl Zeiss SMT GmbH
    Inventors: Joerg Holzmann, Robert Weiss, Toralf Gruner
  • MICROLITHOGRAPHIC PROJECTION EXPOSURE APPARATUS AND METHOD OF CORRECTING OPTICAL WAVEFRONT DEFORMATIONS IN SUCH AN APPARATUS
    Publication number: 20160179018
    Abstract: A microlithographic projection exposure apparatus includes a correction device configured to correct optical wavefront deformations. The correction device includes first and second optical elements and a drive mechanism configured to move the first and second optical elements between a first arrangement and a second arrangement. In the first arrangement the first optical element is an inner optical element having at least a portion that is arranged in a projection light path, and the second optical element is an outer optical element that is arranged completely outside the projection light path. In the second arrangement the second optical element is the inner optical element, and the first optical element is the outer optical element. The correction device further includes a temperature control device configured to modify a temperature distribution in the outer optical element.
    Type: Application
    Filed: February 29, 2016
    Publication date: June 23, 2016
    Inventors: Joerg Holzmann, Robert Weiss, Toralf Gruner