Abstract: A method may support realistic test circuit generation through random circuit layer blocks. The method may include accessing a set of circuit layer blocks, performing a block-level design rule check (DRC) process on the set of circuit layer blocks, wherein the block-level DRC process applies selected design rules that are a subset of a design rule set for a circuit manufacturing process, and obtaining a set of clean circuit layer blocks by discarding circuit layer blocks in the accessed set of circuit layer blocks that fail the block-level DRC process and keeping circuit layer blocks in the accessed set of circuit layer blocks that pass the block-level DRC process. The method may also include generating a test circuit layer formed through randomly selected circuit blocks from the set of clean circuit layer blocks and utilizing the test circuit layer in support of testing the circuit manufacturing process.

Abstract: A dosing device for demand-dosing a liquid includes a primary container, a point of release for releasing the liquid, a main liquid channel between the primary container and the point of release and a vented secondary container, wherein the secondary container is coupled to the main liquid channel at a branch point, wherein the secondary container and the main liquid channel are designed such that the main liquid channel preferably fills with the liquid before the secondary container. The dosing device further includes a liquid valve between the primary container and the branch point, a sensor for measuring the filling level in the secondary container and finally means for opening the valve responsive to a predetermined filling level in the secondary container.

Abstract: A method is provided for correcting rule violating areas of a photomask using a digital representation of the photomask. The method includes identifying violating areas of the photomask from a digital representation of the photomask. The violating areas include areas that violate a minimum width rule and/or areas that violate a minimum space rule for the photomask. The violating areas are then manipulated for the purpose of eliminating the violating areas. They are manipulated differently based on whether the violating area lies inside a design shape of a layout pattern to be imaged using the photomask and/or whether the violating area lies outside the design shape.

Abstract: A method is provided for correcting rule violating areas of a photomask using a digital representation of the photomask. The method includes identifying violating areas of the photomask from a digital representation of the photomask. The violating areas include areas that violate a minimum width rule and/or areas that violate a minimum space rule for the photomask. The violating areas are then manipulated for the purpose of eliminating the violating areas. They are manipulated differently based on whether the violating area lies inside a design shape of a layout pattern to be imaged using the photomask and/or whether the violating area lies outside the design shape.

Abstract: A dosing device for demand-dosing a liquid includes a primary container (10), a point of release (22) for releasing the liquid, a main liquid channel (16) between the primary container (10) and the point of release (22) and a vented secondary container (26), wherein the secondary container (26) is coupled to the main liquid channel 16 at a branch point (20), wherein the secondary container (26) and the main liquid channel (16) are designed such that the main liquid channel (16) preferably fills with the liquid before the secondary container (26). The dosing device further includes a liquid valve (18) between the primary container (10) and the branch point (20), a sensor (30) for measuring the filling level in the secondary container (26) and finally means (32) for opening the valve (18) responsive to a predetermined filling level in the secondary container (26).