Abstract: A method for producing a low-emissivity layer system on at least one side of the substrate includes the steps of providing the substrate, forming at least one low-emissivity layer on at least one side of the substrate by a deposition process and briefly tempering at least one deposited layer. The electromagnetic radiation used for briefly tempering a low-emissivity layer is adjusted in such a manner that the tempered layer has layer properties comparable to those of a conventionally heat-treated low-emissivity layer of a safety glass.

Abstract: In a process for coating a substrate, the substrate is arranged opposite a removal surface of a target and the coating material is atomized by sputtering under an inert or reactive-gas-containing process gas and deposited on the substrate. The coating takes place from a mixed target with at least one target component A and a target component B. At the beginning of the sputtering process, the distribution of the target components A and B in a superficial target layer of the removal surface is modified by high-power impulse magnetron sputtering.