Patents by Inventor Joerg Sundermeyer
Joerg Sundermeyer has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Patent number: 12221456Abstract: The invention relates to the use of a metal complex, which has at least one ligand of the formula R1—N3—R2, wherein R1 and R2 are hydrocarbon moieties, for depositing the metal or a compound of the metal from the gas phase. The invention further relates to methods for depositing metals from the metal complexes, and to metal complexes, substituted triazene compounds and to methods for the production thereof.Type: GrantFiled: December 12, 2018Date of Patent: February 11, 2025Assignee: Umicore AG & Co. KGInventors: Joerg Sundermeyer, Susanne Pulz, Fabian Schroeder
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Patent number: 12180234Abstract: The invention relates to the synthesis and provision of a new class of volatile metal organic compounds based on bis(alkylimine)glyoxal and bis(dialkylhydrazone)glyoxal ligands in combination with cyclopentadienide and alkyl ligands for use in ALD and CVD processes.Type: GrantFiled: July 26, 2019Date of Patent: December 31, 2024Assignee: UMICORE AG & CO. KGInventors: Nicholas Rau, Joerg Sundermeyer, Andreas Rivas Nass, Ralf Karch, Annika Frey, Angelino Doppiu, Eileen Woerner
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Patent number: 12091427Abstract: Metal complexes of formula (I) are described: [M(L1)x(L2)y(hydra)z]n??formula (I) wherein: M=metal atom having an atomic number selected from the ranges a) through c): a) 12, 21 to 34, with the exception of 30, b) 39 to 52, with the exception of 48, c) 71 to 83, with the exception of 80, L1=neutral or anionic ligand, with x=0 or 1, L2=neutral or anionic ligand, with y=0 or 1, (hydra)=acetone dimethylhydrazone monoanion, with z=1, 2, or 3, n=1 or 2, and the total charge of the complex is 0.Type: GrantFiled: March 27, 2020Date of Patent: September 17, 2024Assignee: Umicore AG & CO. KGInventors: Joerg Sundermeyer, Henrik Schumann, Wolf Schorn, Nicholas Rau, Annika Frey, Ralf Karch, Eileen Woerner, Angelino Doppiu
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Patent number: 11407650Abstract: The invention relates to a method for producing a compound of formula MXn from a precursor compound of formula MXm, where M is a metal, X is a halide selected from F, Cl, Br, J, m is a number selected from the range 2 to 8, and n is a number selected from the range 1 to 7, with the condition that n<m, comprising a method step in which the precursor compound is reduced with a silane compound to the compound of formula MXn.Type: GrantFiled: January 24, 2018Date of Patent: August 9, 2022Assignee: Umicore AG & Co. KGInventors: Joerg Sundermeyer, Lisa Hamel, Ruben Ramon Mueller, Andreas Rivas-Nass, Angelino Doppiu, Eileen Woerner, Ralf Karch
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Patent number: 11384102Abstract: The invention relates to lithium alkyl aluminates according to the general formula Li[AlR4] and to a method for preparing same, starting from LiAlH4 and RLi in an aprotic solvent. The invention also relates to compounds according to the general formula Li[AlR4] which can be obtained using the claimed method, and to the use thereof. The invention also relates to the use of a lithium alkyl aluminate Li[AlR4] as a transfer reagent for transferring at least one radical R to an element halide or metal halide and to a method for transferring at least one radical R to a compound E(X)q for preparing a compound according to the general formula E(X)q-pRp, where E=aluminium, gallium, indium, thallium, germanium, tin, lead, antimony, bismuth, zinc, cadmium, mercury, or phosphorus, X=halogen, q=2, 3 or 4, and p=1, 2, 3 or 4. The invention also relates to compounds which can be obtained using such a method, to the use thereof, and to a substrate which has an aluminium layer or a layer containing aluminium on one surface.Type: GrantFiled: November 28, 2019Date of Patent: July 12, 2022Assignee: Umicore AG & Co. KGInventors: Susanne Herritsch, Joerg Sundermeyer
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Patent number: 10745421Abstract: The invention relates to a method for the cost-effective and environmentally friendly production of alkyl indium sesquichloride in high yield and with high selectivity and purity. The alkyl indium sesquichloride produced according to the invention is particularly suitable, also as a result of the high purity and yield, for the production, on demand, of indium-containing precursors in high yield and with high selectivity and purity. As a result of the high purity, the indium-containing precursors that can be produced are particularly suitable for metal organic chemical vapour deposition (MOCVD) or metal organic vapour phase epitaxy (MOVPE). The novel method according to the invention is characterised by the improved execution of the method, in particular a rapid process control. Owing to targeted and extensive use of raw materials that are cost-effective and have a low environmental impact, the method is also suitable for use on an industrial scale.Type: GrantFiled: February 27, 2019Date of Patent: August 18, 2020Assignee: UMICORE AG & CO. KGInventors: Joerg Sundermeyer, Annika Frey, Wolf Schorn, Ralf Karch, Andreas Rivas-Nass, Eileen Woerner, Angelino Doppiu
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Publication number: 20200031684Abstract: The invention relates to a method for producing a compound of formula MXn from a precursor compound of formula MXm, where M is a metal, X is a halide selected from F, Cl, Br, J, m is a number selected from the range 2 to 8, and n is a number selected from the range 1 to 7, with the condition that n<m, comprising a method step in which the precursor compound is reduced with a silane compound to the compound of formula MXn.Type: ApplicationFiled: January 24, 2018Publication date: January 30, 2020Inventors: Joerg Sundermeyer, Lisa HAMEL, Ruben RAMON MUELLER, Andreas RIVAS-NASS, Angelino DOPPIU, Eileen WOERNER, Ralf KARCH
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Patent number: 10239892Abstract: The invention relates to a method for the cost-effective and environmentally friendly production of alkyl indium sesquichloride in high yield and with high selectivity and purity. The alkyl indium sesquichloride produced according to the invention is particularly suitable, also as a result of the high purity and yield, for the production, on demand, of indium-containing precursors in high yield and with high selectivity and purity. As a result of the high purity, the indium-containing precursors that can be produced are particularly suitable for metal organic chemical vapor deposition (MOCVD) or metal organic vapor phase epitaxy (MOVPE). The novel method according to the invention is characterized by the improved execution of the method, in particular a rapid process control. Owing to targeted and extensive use of raw materials that are cost-effective and have a low environmental impact, the method is also suitable for use on an industrial scale.Type: GrantFiled: March 16, 2017Date of Patent: March 26, 2019Assignee: UMICORE AG & CO. KGInventors: Joerg Sundermeyer, Annika Frey, Wolf Schorn, Ralf Karch, Andreas Rivas-Nass, Eileen Woerner, Angelino Doppiu
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Patent number: 10093687Abstract: The present patent application relates to new metal complexes having at least one N-aminoguanidinate ligand. The patent application further relates to the preparation of the new metal complexes and also to their use. The new metal complexes are especially suitable as precursors for the preparation of functional layers by means of gas-phase thin-film processes such as CVD, MO-CVD, MOVPE and ALD. Additionally, they are also suitable as catalysts for olefin hydroamination and for olefin polymerization.Type: GrantFiled: November 25, 2015Date of Patent: October 9, 2018Assignee: UMICORE AG & CO. KGInventors: Joerg Sundermeyer, Katrin Schlechter
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Patent number: 9617284Abstract: The invention relates to a method for the cost-effective and environmentally friendly production of alkyl indium sesquichloride in high yield and with high selectivity and purity. The alkyl indium sesquichloride produced according to the invention is particularly suitable, also as a result of the high purity and yield, for the production, on demand, of indium-containing precursors in high yield and with high selectivity and purity. As a result of the high purity, the indium-containing precursors that can be produced are particularly suitable for metal organic chemical vapor deposition (MOCVD) or metal organic vapor phase epitaxy (MOVPE). The novel method according to the invention is characterized by the improved execution of the method, in particular a rapid process control. Owing to targeted and extensive use of raw materials that are cost-effective and have a low environmental impact, the method is also suitable for use on an industrial scale.Type: GrantFiled: August 18, 2014Date of Patent: April 11, 2017Assignee: Umicore AG & Co. KGInventors: Joerg Sundermeyer, Annika Frey, Wolf Schorn, Ralf Karch, Andreas Rivas-Nass, Eileen Woerner, Angelino Doppiu
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Patent number: 9540401Abstract: The invention relates to a method for the cost-effective and environmentally friendly production of dialkyl indium chloride in high yield and with high selectivity and purity. The dialkyl indium chloride produced according to the invention is particularly suitable, also as a result of the high purity and yield, for the production, on demand, of indium-containing precursors in high yield and with high selectivity and purity. As a result of the high purity, the indium-containing precursors that can be produced are particularly suitable for metal organic chemical vapor deposition (MOCVD) or metal organic vapor phase epitaxy (MOVPE). The novel method according to the invention is characterized by the improved execution of the method, in particular a rapid process control. Owing to targeted and extensive use of raw materials that are cost-effective and have a low environmental impact, the method is also suitable for use on an industrial scale.Type: GrantFiled: August 18, 2014Date of Patent: January 10, 2017Assignee: UMICORE AG & CO. KGInventors: Joerg Sundermeyer, Annika Frey, Wolf Schorn, David Grosse-Hagenbrock, Ralf Karch, Andreas Rivas-Nass, Eileen Woerner, Angelino Doppiu
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Publication number: 20160207942Abstract: The invention relates to a method for the cost-effective and environmentally friendly production of alkyl indium sesquichloride in high yield and with high selectivity and purity. The alkyl indium sesquichloride produced according to the invention is particularly suitable, also as a result of the high purity and yield, for the production, on demand, of indium-containing precursors in high yield and with high selectivity and purity. As a result of the high purity, the indium-containing precursors that can be produced are particularly suitable for metal organic chemical vapour deposition (MOCVD) or metal organic vapour phase epitaxy (MOVPE). The novel method according to the invention is characterised by the improved execution of the method, in particular a rapid process control. Owing to targeted and extensive use of raw materials that are cost-effective and have a low environmental impact, the method is also suitable for use on an industrial scale.Type: ApplicationFiled: August 18, 2014Publication date: July 21, 2016Applicant: UMICORE AG & CO. KGInventors: Joerg Sundermeyer, Annika Frey, Wolf Schorn, Ralf Karch, Andreas Rivas-Nass, Eileen Woerner, Angelino Doppiu
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Patent number: 9353139Abstract: The invention relates to new metal complexes having N-aminoamidinate ligands, more particularly metal complexes having N,N?-bis(dimethylamino)acetamidinate, N,N?-bis(dimethylamino)formamidinate, N-dimethylaminoacetamidinate or N-dimethylamino-N?-isopropyl-acetamidinate ligands as well as to their preparation and use. The metal complexes are characterized by a five-membered chelate ring. The metal complexes are formed with the metals from the main groups of the PTE, but also with transition-group elements such as tantalum (Ta), iron (Fe), cobalt (Co), nickel (Ni), copper (Cu) or zinc (Zn), and also with precious metals such as palladium (Pd). The complexes of the invention find use as precursors for the preparation of functional layers by means of gas-phase thin-film processes such as CVD, MO-CVD and ALD. Additionally they may be used as catalysts for olefin hydroamination and for olefin polymerization.Type: GrantFiled: February 20, 2012Date of Patent: May 31, 2016Assignee: Umicore AG & Co. KGInventors: Joerg Sundermeyer, Wolf Schorn, Ralf Karch
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Publication number: 20140099249Abstract: Monosubstituted oxalic acid derivatives of the general formula (I) [A]+[O—C(O)—C(O)—O—X???(I) Wherein the meaning is for [A]+ a cation made from an organic moiety A having a formally positively charged heteroatom selected from the group consisting of nitrogen, phosphorus and sulfur X is a C1 to C30 organic residue and wherein the following compounds (I) are disclaimed: Tetramethylammonium monomethyloxalate Methyltri(alkyl)ammonium monomethyloxalate Trimethyl(1-hydroxyethyl)ammonium monomethyloxalate Methyltriethylammonium monomethyloxalate Tetraethylammonium monomethyloxalate n-Propyltriethylammonium mono-n-propyloxalate n-Butyltriethylammonium mono-n-butyloxalate Benzyltriethylammonium monobenzyloxalate cyclohexyldimethylammonium monomethyloxalate Dimethyl-phenylammonium monomethyloxalate.Type: ApplicationFiled: October 9, 2013Publication date: April 10, 2014Applicant: BASF SEInventors: Klemens Massonne, Joerg Sundermeyer, Axel Braam
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Publication number: 20140051878Abstract: The invention relates to new metal complexes having N-aminoamidinate ligands, more particularly metal complexes having N,N?-bis(dimethylamino)acetamidinate, N,N?-bis(dimethylamino)formamidinate, N-dimethylaminoacetamidinate or N-dimethylamino-N?-isopropyl-acetamidinate ligands as well as to their preparation and use. The metal complexes are characterized by a five-membered chelate ring. The metal complexes are formed with the metals from the main groups of the PTE, but also with transition-group elements such as tantalum (Ta), iron (Fe), cobalt (Co), nickel (Ni), copper (Cu) or zinc (Zn), and also with precious metals such as palladium (Pd). The complexes of the invention find use as precursors for the preparation of functional layers by means of gas-phase thin-film processes such as CVD, MO-CVD and ALD. Additionally they may be used as catalysts for olefin hydroamination and for olefin polymerization.Type: ApplicationFiled: February 20, 2012Publication date: February 20, 2014Inventors: Joerg Sundermeyer, Wolf Schorn, Ralf Karch
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Patent number: 8076500Abstract: A method for the production of N-aryl carbamates (urethanes) and N-aryl isocyanates is described in which aromatic nitro compounds are subjected to a reductive carbonylation in the presence of carbon monoxide and organic compounds carrying hydroxyl groups, wherein the carbonylation is carried out in the presence of metal complex catalysts, for which anionic N,O chelate ligands of the general type [M(N˜O)?2] and [M(O˜N˜N˜O)2?] containing a bi- or trivalent transition metal of the groups 5 to 11 are used.Type: GrantFiled: June 9, 2006Date of Patent: December 13, 2011Assignee: Philipps-Universitaet MarburgInventors: Joerg Sundermeyer, Fuming Mei
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Patent number: 7045644Abstract: The present invention relates to catalyst system containing at least one imidochrome compound and at least one activation compound. This invention also relates to imidochrome compounds, to a method for olefin polymerization and to methods for producing said imidochrome compounds.Type: GrantFiled: April 22, 2004Date of Patent: May 16, 2006Assignee: Basell Polyolefine GmbHInventors: Markus Schopf, Joerg Sundermeyer, Jennifer Kiepke, Konstantin A. Rufanov, Walter Heitz, Uwe Peucker
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Publication number: 20040214970Abstract: The present invention relates to catalyst system containing at least one imidochrome compound and at least one activation compound. This invention also relates to imidochrome compounds, to a method for olefin polymerization and to methods for producing said imidochrome compounds.Type: ApplicationFiled: April 22, 2004Publication date: October 28, 2004Inventors: Markus Schopf, Joerg Sundermeyer, Jennifer Kipke, Konstantin A. Rufanov, Walter Heitz, Uwe Peucker
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Patent number: 6784261Abstract: The present invention relates to catalyst system containing at least one imidochrome compound and at least one activation compound. This invention also relates to imidochrome compounds, to a method for olefin polymerization and to methods for producing said imidochrome compounds.Type: GrantFiled: April 12, 2002Date of Patent: August 31, 2004Assignee: Basell Polyolefine GmbHInventors: Markus Schopf, Joerg Sundermeyer, Jennifer Kiepke, Konstantin A. Rufanov, Walter Heitz, Uwe Peucker