Patents by Inventor Joerg Vetter
Joerg Vetter has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Publication number: 20250100815Abstract: An apparatus (1) for conveying polymer particles, particularly foamed polymer particles, from a first location (L1) to a second location (L2), the apparatus (1) comprising: a pressurizing unit (2) for generating a pressurized particle conveying fluid stream, particularly comprising polymer particles in a pressurized fluid, the pressurized particle conveying fluid stream having a first pressure level; a decompressing unit (3) for decompressing the pressurized particle conveying fluid stream from the first pressure level to generate a decompressed particle conveying fluid stream having a second pressure level, wherein the decompressing unit (3) comprises: a first chamber (6) for receiving the pressurized particle conveying fluid stream and a second chamber (7) surrounding the first chamber (6), wherein the first chamber (6) is delimited by a first wall structure (6.1) and the second chamber (7) is delimited by a second wall structure (7.1); wherein the first wall structure comprises (6.Type: ApplicationFiled: January 9, 2023Publication date: March 27, 2025Applicant: FOX Velution GmbHInventors: Mirjam Martina LUCHT, Jörg VETTER
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Patent number: 12163213Abstract: A method to produce a hard coating onto a substrate, wherein the hard coating comprises a hydrogen-free amorphous carbon coating, wherein the amorphous carbon coating is deposited onto the substrate using a cathodic arc discharge deposition technique, wherein a bias voltage is applied to the substrate with an absolute value that is greater than 0 V, preferably greater than 10 V and less than 1000 V, and wherein the absolute value of the bias voltage is increased during the coating process to obtain a first structure and a second structure and a gradient between the first and the second structure along the coating thickness, wherein the first and the second structure comprise sp2 and sp3 carbon bonds but differ in their relative concentration, wherein at least one coating pause is applied during the coating process in order to reduce the substrate temperature during the coating pause.Type: GrantFiled: July 31, 2020Date of Patent: December 10, 2024Assignee: Oerlikon Surface Solutions AG, PfäffikonInventors: Jürgen Becker, Neir Beganovic, Johann Karner, Timea Stelzig, Jörg Vetter
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Publication number: 20240227255Abstract: A method for preparing cellular plastic particles comprising the steps: providing a plastic material in the form of pre-expanded plastic material particles, loading of the pre-expanded plastic material particles with a blowing agent under the influence of pressure, expanding the pre-expanded plastic material particles loaded with a blowing agent for the production of cellular plastic particles, in particular cellular plastic particles with lower density, under the influence of temperature, wherein the expanding of the plastic material particles loaded with blowing agent under the influence of temperature is carried out by irradiating the plastic material particles loaded with blowing agent with high-energy thermal radiation, in particular infrared radiation.Type: ApplicationFiled: April 25, 2022Publication date: July 11, 2024Applicant: FOX Velution GmbHInventors: Jörg VETTER, Mirjam LUCHT, Josua SCHNEIDER
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Publication number: 20240227254Abstract: A method for the production of cellular plastic particles comprising the steps: providing a plastic material in the form of compact plastic material particles, loading of the compact plastic material particles with at least one blowing agent under the influence of pressure, expanding the plastic material particles loaded with at least one blowing agent to produce cellular plastic particles under the influence of temperature.Type: ApplicationFiled: April 25, 2022Publication date: July 11, 2024Applicant: FOX Velution GmbHInventors: Jörg VETTER, Mirjam LUCHT, Josua SCHNEIDER
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Patent number: 11942311Abstract: In order to improve the etching depth and/or the etching homogeneity at a substrate, a plasma source with one or more single electrodes or one or more magnets is proposed. The magnet generates a magnetic field in the vicinity of the electrodes, which may be rear-side or front-side.Type: GrantFiled: December 5, 2019Date of Patent: March 26, 2024Assignee: OERLIKON SURFACE SOLUTIONS AG, PFÄFFIKONInventor: Jörg Vetter
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Publication number: 20220372629Abstract: A substrate having a multilayer coating system in the form of a surface coating, which has an outer cover layer comprising amorphous carbon, and a coating process for producing a substrate. At least a first MoaNx support layer is provided between the substrate and the cover layer, which support layer has a nitrogen content x, referred to an Mo content a, which is in the range of 25 at %?x?55 at %, with x+a=100 at %.Type: ApplicationFiled: September 17, 2020Publication date: November 24, 2022Applicant: OERLIKON SURFACE SOLUTIONS AG, PFÄFFIKONInventors: Jörg VETTER, Jürgen BECKER, Johann KARNER
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Patent number: 11504888Abstract: Methods for producing at least a part of a sporting good, in particular a sports shoe, can include: (a) depositing a first material into a mold, and (b) vibrating the mold to modify the distribution of the first material in the mold.Type: GrantFiled: November 28, 2017Date of Patent: November 22, 2022Assignee: adidas AGInventors: Hans-Peter Nürnberg, Henry Niles Hanson, Martin Löhner, Dietmar Klaus Drummer, Jörg Vetter, Mirjam Lucht, Heinz Hohensinner, André Schmidt, Norbert Stark, Winfried Schmidt, Markus Hohenberger, Stephan Lintner, Muhammad Tausif, Tom O'Hare, Parikshit Goswami, Stephen John Russell
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Publication number: 20220275498Abstract: A method to produce a hard coating onto a substrate, wherein the hard coating comprises a hydrogen-free amorphous carbon coating, wherein the amorphous carbon coating is deposited onto the substrate using a cathodic arc discharge deposition technique, wherein a bias voltage is applied to the substrate with an absolute value that is greater than 0 V, preferably greater than 10 V and less than 1000 V, and wherein the absolute value of the bias voltage is increased during the coating process to obtain a first structure and a second structure and a gradient between the first and the second structure along the coating thickness, wherein the first and the second structure comprise sp2 and sp3 carbon bonds but differ in their relative concentration, wherein at least one coating pause is applied during the coating process in order to reduce the substrate temperature during the coating pause.Type: ApplicationFiled: July 31, 2020Publication date: September 1, 2022Inventors: Jürgen BECKER, Neir BEGANOVIC, Johann KARNER, Timea STELZIG, Jörg VETTER
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Patent number: 11342168Abstract: The present invention relates to a method for the evaporation of a cathode by means of cathodic arc evaporation, wherein the focal spot of the arc is forced to a predetermined track on the cathode surface by means of temporally and spatially controllable magnetic fields, wherein a predetermined removal of material of the cathode surface is produced. The invention also relates to a device for carrying out the method according to the invention.Type: GrantFiled: February 14, 2018Date of Patent: May 24, 2022Assignee: OERLIKON SURFACE SOLUTIONS AG, PFAFFIKONInventors: Joerg Vetter, Markus Willach
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Publication number: 20220051879Abstract: In order to improve the etch depth and/or the etch homogeneity of a substrate, a plasma source with one or more evaporators and two or more electrodes according to the invention is proposed. The use of more than one electrode allows the use of different currents at the electrodes and a time-selective application of the currents, so that an improved control of the plasma generation is enabled.Type: ApplicationFiled: December 5, 2019Publication date: February 17, 2022Applicant: OERLIKON SURFACE SOLUTIONS AG, PFÄFFIKONInventor: Jörg VETTER
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Publication number: 20220051882Abstract: In order to improve the etching depth and/or the etching homogeneity at a substrate, a plasma source with one or more single electrodes or one or more magnets is proposed. The magnet generates a magnetic field in the vicinity of the electrodes, which may be rear-side or front-side.Type: ApplicationFiled: December 5, 2019Publication date: February 17, 2022Applicant: OERLIKON SURFACE SOLUTIONS AG, PFÄFFIKONInventor: Jörg VETTER
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Patent number: 11060179Abstract: An electric-arc evaporation method for coating surfaces, wherein at least two active consumption targets are used in the method, characterized in that the consumption targets are alternately connected as a cathode and an anode during the coating process.Type: GrantFiled: April 4, 2016Date of Patent: July 13, 2021Assignee: Oerlikon Surface Solutions AG, PfäffikonInventor: Joerg Vetter
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Patent number: 11020849Abstract: A handheld tool case including at least one base unit, which includes at least one side wall, and at least one cover unit, which is intended to indirectly or directly delimit, with the base unit, a case interior for the storage and/or transportation of at least one transportation object. It is provided that the handheld tool case includes a positioning unit, which, in at least one operating state, during a closing movement between the base unit and the cover unit, converts a closing force into a positioning force on the at least one transportation object, which has at least one component in the direction of the side wall.Type: GrantFiled: December 2, 2015Date of Patent: June 1, 2021Assignee: Robert Bosch GmbHInventors: Joerg Vetter, Josef Baumgartner, Hansjoerg Beutel, Jan Breitenbach, Juergen Luginsland, Peter Pozsega
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Publication number: 20200402781Abstract: The present invention relates to a method for the evaporation of a cathode by means of cathodic arc evaporation, wherein the focal spot of the arc is forced to a predetermined track on the cathode surface by means of temporally and spatially controllable magnetic fields, wherein a predetermined removal of material of the cathode surface is produced. The invention also relates to a device for carrying out the method according to the invention.Type: ApplicationFiled: February 14, 2018Publication date: December 24, 2020Inventors: Joerg VETTER, Markus WILLACH
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Patent number: 10844493Abstract: The present disclosure relates to a coated substrate having a hard material coating, which comprises a hard carbon layer of the hydrogen-free amorphous carbon layer type, wherein the coating comprises a layer consisting of zirconium between the substrate and the hydrogen-free amorphous carbon layer; wherein between the layer consisting of zirconium and the hydrogen-free amorphous carbon layer, a layer consisting of Zr—Cx can be formed in which a zirconium monocarbide is formed; and the layer consisting of Zr—Cx and comprising zirconium monocarbide is applied directly to the adhesive layer consisting of zirconium.Type: GrantFiled: February 28, 2017Date of Patent: November 24, 2020Assignee: OERLIKON SURFACE SOLUTIONS AG, PFÄFFIKONInventor: Joerg Vetter
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Patent number: 10811239Abstract: Cylindrical evaporation source which includes, at an outer cylinder wall, target material to be evaporated as well as a first magnetic field source and a second magnetic field source which form at least a part of a magnet system and are arranged in an interior of the cylindrical evaporation source for generating a magnetic field. In this respect, first magnetic field source and second magnetic field source are provided at a carrier system such that a shape and/or a strength of the magnetic field can be set in a predefinable spatial region in accordance with a predefinable scheme. In embodiments, the carrier system is configured for setting the shape and/or strength of the magnetic field of the carrier system such that the first magnetic field source is arranged at a first carrier arm and is pivotable by a predefinable pivot angle (?1) with respect to a first pivot axis.Type: GrantFiled: February 24, 2014Date of Patent: October 20, 2020Assignee: OERLIKON SURFACE SOLUTIONS AG, PFÄFFIKONInventors: Joerg Vetter, Stefan Esser, Jurgen Mueller, Georg Erkens
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Publication number: 20190249310Abstract: The present disclosure relates to a coated substrate having a hard material coating, which comprises a hard carbon layer of the hydrogen-free amorphous carbon layer type, wherein the coating comprises a layer consisting of zirconium between the substrate and the hydrogen-free amorphous carbon layer; wherein between the layer consisting of zirconium and the hydrogen-free amorphous carbon layer, a layer consisting of Zr—Cx can be formed in which a zirconium monocarbide is formed; and the layer consisting of Zr—Cx and comprising zirconium monocarbide is applied directly to the adhesive layer consisting of zirconium.Type: ApplicationFiled: February 28, 2017Publication date: August 15, 2019Inventor: Joerg Vetter
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Patent number: 10083822Abstract: The invention relates to a physical vapor deposition coating device (1), comprising a process chamber (2) with an anode (3) and a consumable cathode (4) to be consumed by an electrical discharge for coating a substrate located within the process chamber (2). The coating device (1) further includes a first electrical energy source (5) being connected with its negative pole to said consumable cathode (4), and a second electrical energy source (6) being connected with its positive pole to said anode (3). According to the invention, a third electrical energy source (7) is provided being connected with its negative pole to a source cathode (8) which is different from the consumable cathode (4). In addition, the invention relates to a physical vapor deposition method for coating a substrate.Type: GrantFiled: August 19, 2009Date of Patent: September 25, 2018Assignee: OERLIKON SURFACE SOLUTIONS AG, PFAEFFIKONInventors: Jones Alami, Georg Erkens, Tariq Rasa, Jörg Vetter
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Publication number: 20180265968Abstract: The invention relates to a coating chamber (1) for performing a vacuum-assisted coating process, in particular PVD or CVD or electric arc coating chamber or hybrid coating chamber. The coating chamber (1) comprises a heat shield (3, 31, 32, 33), which is arranged on a temperature-controllable chamber wall (2) of the coating chamber (1) and is intended for adjusting an exchange of a predeterminable amount of thermal radiation between the heat shield (3, 31, 32, 33) and the temperature-controllable chamber wall (2).Type: ApplicationFiled: January 15, 2016Publication date: September 20, 2018Applicant: OERLIKON SURFACE SOLUTIONS AG, PFAEFFIKONInventors: Joerg VETTER, Siegfried KRASSNITZER, Markus ESSELBACH
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Publication number: 20180147752Abstract: Described are methods for producing at least a part of a sporting good, in particular a sports shoe. According to one aspect of the invention, the method includes the steps of: (a) depositing a first material into a mold and (b) vibrating the mold to modify the distribution of the first material in the mold.Type: ApplicationFiled: November 28, 2017Publication date: May 31, 2018Inventors: Hans-Peter Nürnberg, Henry Niles Hanson, Frank Prissok, Martin Löhner, Dietmar Klaus Drummer, Jörg Vetter, Mirjam Lucht, Heinz Hohensinner, André Schmidt, Norbert Stark, Winfried Schmidt, Markus Hohenberger, Stephan Lintner, Muhammad Tausif, Tom O'Hare, Parikshit Goswami, Stephen John Russell