Abstract: In order to improve the etching depth and/or the etching homogeneity at a substrate, a plasma source with one or more single electrodes or one or more magnets is proposed. The magnet generates a magnetic field in the vicinity of the electrodes, which may be rear-side or front-side.

Abstract: A substrate having a multilayer coating system in the form of a surface coating, which has an outer cover layer comprising amorphous carbon, and a coating process for producing a substrate. At least a first MoaNx support layer is provided between the substrate and the cover layer, which support layer has a nitrogen content x, referred to an Mo content a, which is in the range of 25 at %?x?55 at %, with x+a=100 at %.

Abstract: Methods for producing at least a part of a sporting good, in particular a sports shoe, can include: (a) depositing a first material into a mold, and (b) vibrating the mold to modify the distribution of the first material in the mold.

Abstract: A method to produce a hard coating onto a substrate, wherein the hard coating comprises a hydrogen-free amorphous carbon coating, wherein the amorphous carbon coating is deposited onto the substrate using a cathodic arc discharge deposition technique, wherein a bias voltage is applied to the substrate with an absolute value that is greater than 0 V, preferably greater than 10 V and less than 1000 V, and wherein the absolute value of the bias voltage is increased during the coating process to obtain a first structure and a second structure and a gradient between the first and the second structure along the coating thickness, wherein the first and the second structure comprise sp2 and sp3 carbon bonds but differ in their relative concentration, wherein at least one coating pause is applied during the coating process in order to reduce the substrate temperature during the coating pause.

Abstract: The present invention relates to a method for the evaporation of a cathode by means of cathodic arc evaporation, wherein the focal spot of the arc is forced to a predetermined track on the cathode surface by means of temporally and spatially controllable magnetic fields, wherein a predetermined removal of material of the cathode surface is produced. The invention also relates to a device for carrying out the method according to the invention.

Abstract: In order to improve the etch depth and/or the etch homogeneity of a substrate, a plasma source with one or more evaporators and two or more electrodes according to the invention is proposed. The use of more than one electrode allows the use of different currents at the electrodes and a time-selective application of the currents, so that an improved control of the plasma generation is enabled.

Abstract: In order to improve the etching depth and/or the etching homogeneity at a substrate, a plasma source with one or more single electrodes or one or more magnets is proposed. The magnet generates a magnetic field in the vicinity of the electrodes, which may be rear-side or front-side.

Abstract: An electric-arc evaporation method for coating surfaces, wherein at least two active consumption targets are used in the method, characterized in that the consumption targets are alternately connected as a cathode and an anode during the coating process.

Abstract: A handheld tool case including at least one base unit, which includes at least one side wall, and at least one cover unit, which is intended to indirectly or directly delimit, with the base unit, a case interior for the storage and/or transportation of at least one transportation object. It is provided that the handheld tool case includes a positioning unit, which, in at least one operating state, during a closing movement between the base unit and the cover unit, converts a closing force into a positioning force on the at least one transportation object, which has at least one component in the direction of the side wall.

Abstract: The present invention relates to a method for the evaporation of a cathode by means of cathodic arc evaporation, wherein the focal spot of the arc is forced to a predetermined track on the cathode surface by means of temporally and spatially controllable magnetic fields, wherein a predetermined removal of material of the cathode surface is produced. The invention also relates to a device for carrying out the method according to the invention.

Abstract: The present disclosure relates to a coated substrate having a hard material coating, which comprises a hard carbon layer of the hydrogen-free amorphous carbon layer type, wherein the coating comprises a layer consisting of zirconium between the substrate and the hydrogen-free amorphous carbon layer; wherein between the layer consisting of zirconium and the hydrogen-free amorphous carbon layer, a layer consisting of Zr—Cx can be formed in which a zirconium monocarbide is formed; and the layer consisting of Zr—Cx and comprising zirconium monocarbide is applied directly to the adhesive layer consisting of zirconium.

Abstract: Cylindrical evaporation source which includes, at an outer cylinder wall, target material to be evaporated as well as a first magnetic field source and a second magnetic field source which form at least a part of a magnet system and are arranged in an interior of the cylindrical evaporation source for generating a magnetic field. In this respect, first magnetic field source and second magnetic field source are provided at a carrier system such that a shape and/or a strength of the magnetic field can be set in a predefinable spatial region in accordance with a predefinable scheme. In embodiments, the carrier system is configured for setting the shape and/or strength of the magnetic field of the carrier system such that the first magnetic field source is arranged at a first carrier arm and is pivotable by a predefinable pivot angle (?1) with respect to a first pivot axis.

Abstract: The present disclosure relates to a coated substrate having a hard material coating, which comprises a hard carbon layer of the hydrogen-free amorphous carbon layer type, wherein the coating comprises a layer consisting of zirconium between the substrate and the hydrogen-free amorphous carbon layer; wherein between the layer consisting of zirconium and the hydrogen-free amorphous carbon layer, a layer consisting of Zr—Cx can be formed in which a zirconium monocarbide is formed; and the layer consisting of Zr—Cx and comprising zirconium monocarbide is applied directly to the adhesive layer consisting of zirconium.

Abstract: The invention relates to a physical vapor deposition coating device (1), comprising a process chamber (2) with an anode (3) and a consumable cathode (4) to be consumed by an electrical discharge for coating a substrate located within the process chamber (2). The coating device (1) further includes a first electrical energy source (5) being connected with its negative pole to said consumable cathode (4), and a second electrical energy source (6) being connected with its positive pole to said anode (3). According to the invention, a third electrical energy source (7) is provided being connected with its negative pole to a source cathode (8) which is different from the consumable cathode (4). In addition, the invention relates to a physical vapor deposition method for coating a substrate.

Abstract: The invention relates to a coating chamber (1) for performing a vacuum-assisted coating process, in particular PVD or CVD or electric arc coating chamber or hybrid coating chamber. The coating chamber (1) comprises a heat shield (3, 31, 32, 33), which is arranged on a temperature-controllable chamber wall (2) of the coating chamber (1) and is intended for adjusting an exchange of a predeterminable amount of thermal radiation between the heat shield (3, 31, 32, 33) and the temperature-controllable chamber wall (2).

Abstract: Described are methods for producing at least a part of a sporting good, in particular a sports shoe. According to one aspect of the invention, the method includes the steps of: (a) depositing a first material into a mold and (b) vibrating the mold to modify the distribution of the first material in the mold.

Abstract: An electric-arc evaporation method for coating surfaces, wherein at least two active consumption targets are used in the method, characterized in that the consumption targets are alternately connected as a cathode and an anode during the coating process.

Abstract: The present invention relates to a wear resistant coating suitable to be deposited on cutting tool inserts for chip forming metal machining. The coating comprises at least two layers with different grain size, but with essentially the same composition. The coating is deposited by Physical Vapor Deposition (PVD).

Abstract: A handheld tool case including at least one base unit, which includes at least one side wall, and at least one cover unit, which is intended to indirectly or directly delimit, with the base unit, a case interior for the storage and/or transportation of at least one transportation object. It is provided that the handheld tool case includes a positioning unit, which, in at least one operating state, during a closing movement between the base unit and the cover unit, converts a closing force into a positioning force on the at least one transportation object, which has at least one component in the direction of the side wall.

Abstract: Evaporation source, in particular for use in a sputtering process or in a vacuum arc evaporation process, preferably a cathode vacuum arc evaporation process. The evaporation source includes an inner base body which is arranged in an outer carrier body and which is arranged with respect to the outer carrier body such that a cooling space in flow communication with an inlet and an outlet is formed between the base body and the carrier body. In accordance with the invention, the cooling space includes an inflow space and an outflow space, and the inflow space is in flow communication with the outflow space via an overflow connection for the cooling of the evaporation source such that a cooling fluid can be conveyed from the inlet via the inflow space the overflow connection and the outflow space to the outlet.