Abstract: The present invention provides polishes for surfaces, comprising aminoorganopolysiloxanes (A) which are solid at room temperature, contain fluoro groups and are able to change their aggregate state reversibly as a result of changes in temperature.

Abstract: 1,3-dihalo-1,1,3,3-tetra(organyl)disiloxanes of the general formula XR2Si—O—SiR2X  (1) are prepared by reacting hydrogen halide with the corresponding 1,3-dihydro-1,1,3,3-tetra(organyl)disiloxanes of the general formula HR2Si—O—SiR2H  (2), in which R is an alkyl or halogen substituted alkyl group and X is halogen, in the presence of a catalyst selected from transition metals of the 8th subgroup of the periodic table of the elements, or compounds or complexes of these transition metals.

Abstract: A process for the preparation of halogenated 1,2-disilaethanes of the general formula X3−nRnSi—CHR1CHR1—SiRnX3−n  (I) in which R may be identical or different and denotes a hydrogen atom or a monovalent optionally substituted hydrocarbon radical having 1 to 40 carbon atom(s) per radical, R1 may be identical or different and denotes a hydrogen atom or a monovalent optionally substituted hydrocarbon radical having 1 to 40 carbon atom(s) per radical, X denotes a halogen atom and n denotes 0, 1 or 2, wherein halogenated 1,2-disilaethenes of the general formula X3−nRnSi—CR1═CR1—SiRnX3−n  (II) in which R, R1, X and n have the meaning stated above therefor, are reacted with hydrogen in the presence of promoting catalysts. The product is produced in high yield and purity.

Abstract: The invention relates to organopolysiloxanes that have amino groups and are solid at room temperature which can reversibly change their states of aggregation on the basis of temperature changes. Preparations containing these organopolysiloxanes are useful in the cleaning, care, and hydrophobicization of surfaces.

Abstract: The invention relates to a process for the preparation of silanes of the general formula 1R.sub.m R.sup.1.sub.n SiX.sub.4-m-n (1)by reaction of Grignard reagents of the general formula 2R.sup.1 MgX.sup.1 (2)with silanes of the general formula 3R.sub.m SiX.sub.4-m (3)whereinR denotes C.sub.1 - to C.sub.10 -hydrocarbon radicals optionally substituted by fluorine, chlorine or cyano radicals,R.sup.1, in the .alpha.-position relative to the silicon atom, denotes tertiary C.sub.4 - to C.sub.30 -hydrocarbon radicals optionally substituted by fluorine, chlorine or cyano radicals,X and X.sup.1 each denote chlorine, bromine or iodine,m denotes the values 2 or 3 andn denotes the values 1 or 2,in the presence of a transition metal catalyst and an inert, aprotic, and chelating compound.