Patents by Inventor Joezf Petrus Henricus Benschop

Joezf Petrus Henricus Benschop has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Dual stage lithographic apparatus and device manufacturing method
    Patent number: RE44446
    Abstract: The invention relates to a dual stage lithographic apparatus, wherein two substrate stages are constructed and arranged for mutual cooperation in order to perform a joint scan movement. The joint scan movement brings the lithographic apparatus from a first configuration, wherein immersion liquid is confined between a first substrate held by the first stage of the stages and a projection system of the apparatus, to a second configuration, wherein the immersion liquid is confined between a second substrate held by the second stage of the two stages and the projection system, such that during the joint scan movement the liquid is essentially confined within the space with respect to the projection system.
    Type: Grant
    Filed: August 13, 2012
    Date of Patent: August 20, 2013
    Assignee: ASML Netherlands B.V.
    Inventors: Marinus Aart Van Den Brink, Joezf Petrus Henricus Benschop, Erik Roelof Loopstra