Patents by Inventor Johan DEKOSTER

Johan DEKOSTER has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 8530339
    Abstract: The present disclosure is related to a method for the deposition of a continuous layer of germanium on a substrate by chemical vapor deposition. According to the disclosure, a mixture of a non-reactive carrier gas and a higher order germanium precursor gas, i.e. of higher order than germane (GeH4), is applied. In an example embodiment, the deposition is done under application of a deposition temperature between 275° C. and 500° C., with the partial pressure of the precursor gas within the mixture being at least 20 mTorr for temperatures between 275° C. and 285° C., and at least 10 mTorr for temperatures between 285° and 500° C.
    Type: Grant
    Filed: January 11, 2012
    Date of Patent: September 10, 2013
    Assignee: IMEC
    Inventors: Benjamin Vincent, Matty Caymax, Roger Loo, Johan Dekoster
  • Publication number: 20120175741
    Abstract: The present disclosure is related to a method for the deposition of a continuous layer of germanium on a substrate by chemical vapor deposition. According to the disclosure, a mixture of a non-reactive carrier gas and a higher order germanium precursor gas, i.e. of higher order than germane (GeH4), is applied. In an example embodiment, the deposition is done under application of a deposition temperature between 275° C. and 500° C., with the partial pressure of the precursor gas within the mixture being at least 20 mTorr for temperatures between 275° C. and 285° C., and at least 10 mTorr for temperatures between 285° and 500° C.
    Type: Application
    Filed: January 11, 2012
    Publication date: July 12, 2012
    Applicant: IMEC
    Inventors: Benjamin VINCENT, Matty CAYMAX, Roger LOO, Johan DEKOSTER