Patents by Inventor Johan Franciscus Maria BECKERS
Johan Franciscus Maria BECKERS has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Publication number: 20230333482Abstract: A method for categorizing a substrate subject to a semiconductor manufacturing process including multiple operations, the method including: obtaining values of functional indicators derived from data generated during one or more of the multiple operations on the substrate, the functional indicators characterizing at least one operation; applying a decision model including one or more threshold values to the values of the functional indicators to obtain one or more categorical indicators; and assigning a category to the substrate based on the one or more categorical indicators.Type: ApplicationFiled: June 21, 2023Publication date: October 19, 2023Applicant: ASML NETHERLANDS B.V.Inventors: Arnaud HUBAUX, Johan Franciscus Maria Beckers, Dylan John David Davies, Johan Gertrudis Cornelis Kunnen, Willem Richard Pongers, Ajinkya Ravindra Daware, Chung-Hsun Li, Georgios Tsirogiannis, Hendrik Cornelis Anton Borger, Frederik Eduard De Jong, Juan Manuel Gonzalez Huesca, Andriy Hlod, Maxim Pisarenco
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Patent number: 11774868Abstract: An image sensor for immersion lithography, the image sensor including: a grating; an absorber layer on the grating, the absorber layer configured to absorb radiation; and a liquidphobic coating at an upper surface of the image sensor, wherein a protective layer is provided between the absorber layer and the liquidphobic layer, the protective layer being less reactive than the absorber layer to an immersion liquid.Type: GrantFiled: April 7, 2020Date of Patent: October 3, 2023Assignee: ASML NETHERLANDS B.V.Inventors: Nirupam Banerjee, Johan Franciscus Maria Beckers, Peter Brakhage, Arend Johannes Donkerbroek, Daniel Grimm, Tim Rathje, Martin Tilke, Sandro Wricke
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Patent number: 11687007Abstract: A method for categorizing a substrate subject to a semiconductor manufacturing process including multiple operations, the method including: obtaining values of functional indicators derived from data generated during one or more of the multiple operations on the substrate, the functional indicators characterizing at least one operation; applying a decision model including one or more threshold values to the values of the functional indicators to obtain one or more categorical indicators; and assigning a category to the substrate based on the one or more categorical indicators.Type: GrantFiled: January 9, 2020Date of Patent: June 27, 2023Assignee: ASML NETHERLANDS B.V.Inventors: Arnaud Hubaux, Johan Franciscus Maria Beckers, Dylan John David Davies, Johan Gertrudis Cornelis Kunnen, Willem Richard Pongers, Ajinkya Ravindra Daware, Chung-Hsun Li, Georgios Tsirogiannis, Hendrik Cornelis Anton Borger, Frederik Eduard De Jong, Juan Manuel Gonzalez Huesca, Andriy Hlod, Maxim Pisarenco
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Patent number: 11550234Abstract: An object, such as a sensor for an immersion lithographic apparatus, has an outer layer which comes in contact with immersion liquid and wherein the outer layer has a composition including a rare earth element. There is also provided an immersion lithographic apparatus having such an object and a method for manufacturing such an object.Type: GrantFiled: September 25, 2019Date of Patent: January 10, 2023Assignee: ASML Netherlands B.V.Inventors: Andrey Nikipelov, Johan Franciscus Maria Beckers
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Publication number: 20220163896Abstract: An image sensor for immersion lithography, the image sensor including: a grating; an absorber layer on the grating, the absorber layer configured to absorb radiation; and a liquidphobic coating at an upper surface of the image sensor, wherein a protective layer is provided between the absorber layer and the liquidphobic layer, the protective layer being less reactive than the absorber layer to an immersion liquid.Type: ApplicationFiled: April 7, 2020Publication date: May 26, 2022Applicant: ASML NETHERLANDS B.V.Inventors: Nirupam BANERJEE, Johan Franciscus Maria BECKERS, Peter BRAKHAGE, Arend Johannes DONKERBROEK, Daniel GRIMM, Tim RATHJE, Martin TILKE, Sandro WRICKE
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Publication number: 20220082949Abstract: A method for categorizing a substrate subject to a semiconductor manufacturing process including multiple operations, the method including: obtaining values of functional indicators derived from data generated during one or more of the multiple operations on the substrate, the functional indicators characterizing at least one operation; applying a decision model including one or more threshold values to the values of the functional indicators to obtain one or more categorical indicators; and assigning a category to the substrate based on the one or more categorical indicators.Type: ApplicationFiled: January 9, 2020Publication date: March 17, 2022Applicant: ASML NETHERLANDS B.V.Inventors: Arnaud HUBAUX, Johan Franciscus Maria BECKERS, Dylan John David DAVIES, Johan Gertrudis Cornelis KUNNEN, Willem Richard PONGERS, Ajinkya Ravindra DAWARE, Chung-Hsun LI, Georgios TSIROGIANNIS, Hendrik Cornelis Anton BORGER, Frederik Eduard DEJONG, Juan Manuel GONZALEZ HUESCA, Andriy HLOD, Maxim PISARENCO
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Publication number: 20210397100Abstract: An object, such as a sensor for an immersion lithographic apparatus, has an outer layer which comes in contact with immersion liquid and wherein the outer layer has a composition including a rare earth element. There is also provided an immersion lithographic apparatus having such an object and a method for manufacturing such an object.Type: ApplicationFiled: September 25, 2019Publication date: December 23, 2021Applicant: ASML NETHERLANDS B.V.Inventors: Andrey NIKIPELOV, Johan Franciscus Maria BECKERS
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Patent number: 11143969Abstract: A method of performance testing working parameters of a fluid handing structure in an immersion lithographic apparatus, the method including: placing a test substrate having an upper surface with a first portion with a resist defining the upper surface and a second portion with a material different from the resist defining the rest of the upper surface on a table in the immersion lithographic apparatus, confining liquid on a region of an upper surface of the table and/or the upper surface of the test substrate by operating the fluid handing structure using the associated working parameters, moving the table such that the region moves from the second portion to the first portion, and detecting change to and/or residue on the first portion as a result of liquid being left behind on the first portion during the moving.Type: GrantFiled: March 9, 2018Date of Patent: October 12, 2021Assignee: ASML Netherlands B.V.Inventors: Giovanni Luca Gattobigio, Nirupam Banerjee, Johan Franciscus Maria Beckers, Erik Henricus Egidius Catharina Eummelen, Ronald Frank Kox, Theodorus Wilhelmus Polet, Cornelius Maria Rops, Mike Paulus Johannes Van Gils, Wouterus Jozephus Johannes Van Sluisveld, Rik Vangheluwe
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Patent number: 10976196Abstract: A sensor mark including: a substrate having: a deep ultra violet (DUV) radiation absorbing layer including a first material which substantially absorbs DUV radiation; and a protecting layer including a second material, wherein: the DUV radiation absorbing layer has a through hole in it; the protecting layer is positioned, in plan, in the through hole and the protecting layer in the through hole has a patterned region having a plurality of through holes; and the second material is more noble than the first material.Type: GrantFiled: February 15, 2018Date of Patent: April 13, 2021Assignee: ASML Netherlands B.V.Inventors: Joost André Klugkist, Vadim Yevgenyevich Banine, Johan Franciscus Maria Beckers, Madhusudhanan Jambunathan, Maxim Aleksandrovich Nasalevich, Andrey Nikipelov, Roland Johannes Wilhelmus Stas, David Ferdinand Vles, Wilhelmus Jacobus Johannes Welters, Sandro Wricke
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Patent number: 10948825Abstract: A method of processing a substrate includes: providing a substrate with a layer of photosensitive material on a surface of the substrate; and removing at least part of the photosensitive material from around an outer edge of the layer of photosensitive material so as to generate an edge, having a radial width, around the layer of photosensitive material remaining on the surface of the substrate, wherein the photosensitive material varies in thickness forming a thickness profile across the radial width and the removing is controlled so as to generate variation in the thickness profile along the length of the edge, and/or wherein the removing is controlled so as to generate a rough edge around the layer of photosensitive material remaining on the surface of the substrate.Type: GrantFiled: December 22, 2016Date of Patent: March 16, 2021Assignee: ASML NETHERLANDS B.V.Inventors: Christianus Wilhelmus Johannes Berendsen, Güneş Nakibo{hacek over (g)}lu, Daan Daniel Johannes Antonius Van Sommeren, Gijsbert Rispens, Johan Franciscus Maria Beckers, Theodorus Johannes Antonius Renckens
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Publication number: 20200166845Abstract: A method of processing a substrate includes: providing a substrate with a layer of photosensitive material on a surface of the substrate; and removing at least part of the photosensitive material from around an outer edge of the layer of photosensitive material so as to generate an edge, having a radial width, around the layer of photosensitive material remaining on the surface of the substrate, wherein the photosensitive material varies in thickness forming a thickness profile across the radial width and the removing is controlled so as to generate variation in the thickness profile along the length of the edge, and/or wherein the removing is controlled so as to generate a rough edge around the layer of photosensitive material remaining on the surface of the substrate.Type: ApplicationFiled: December 22, 2016Publication date: May 28, 2020Applicant: ASML NETHERLANDS B.V.Inventors: Christianus Wilhelmus Johannes BERENDSEN, Günes NAKIBOGLU, Daan Daniel Johannes Antonius VAN SOMMEREN, Gijsbert RISPENS, Johan Franciscus Maria BECKERS, Theodorus Johannes Antonius RENCKENS
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Publication number: 20200150545Abstract: A method of performance testing working parameters of a fluid handing structure in an immersion lithographic apparatus, the method including: placing a test substrate having an upper surface with a first portion with a resist defining the upper surface and a second portion with a material different from the resist defining the rest of the upper surface on a table in the immersion lithographic apparatus, confining liquid on a region of an upper surface of the table and/or the upper surface of the test substrate by operating the fluid handing structure using the associated working parameters, moving the table such that the region moves from the second portion to the first portion, and detecting change to and/or residue on the first portion as a result of liquid being left behind on the first portion during the moving.Type: ApplicationFiled: March 9, 2018Publication date: May 14, 2020Applicant: ASML NETHERLANDS B.V.Inventors: Giovanni Luca GATTOBIGIO, Nirupam BANERJEE, Johan Franciscus Maria BECKERS, Erik Henricus Egidius Catharina EUMMELEN, Ronald Frank KOX, Theodoras Wilhelmus POLET, Cornelius Maria ROPS, Mike Paulus Johannes VAN GILS, Wouterus Jozephus Johannes VAN SLUISVELD, Rik VANGHELUWE
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Publication number: 20200064183Abstract: A sensor mark including: a substrate having: a deep ultra violet (DUV) radiation absorbing layer including a first material which substantially absorbs DUV radiation; and a protecting layer including a second material, wherein: the DUV radiation absorbing layer has a through hole in it; the protecting layer is positioned, in plan, in the through hole and the protecting layer in the through hole has a patterned region having a plurality of through holes; and the second material is more noble than the first material.Type: ApplicationFiled: February 15, 2018Publication date: February 27, 2020Applicant: ASML NETHERLANDS B.V.Inventors: Joost André KLUGKIST, Vadim Yevgenyevich BANINE, Johan Franciscus Maria BECKERS, Madhusudhanan JAMBUNATHAN, Maxim Aleksandrovich NASALEVICH, Andrey NIKIPELOV, Roland Johannes Wilhelmus STAS, David Ferdinand VLES, Wilhelmus Jacobus Johannes WELTERS, Sandro WRICKE