Patents by Inventor Johan Hendrik GIESBERS

Johan Hendrik GIESBERS has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • PELLICLE MEMBRANE FOR A LITHOGRAPHIC APPARATUS
    Publication number: 20230333462
    Abstract: A pellicle membrane for use in a lithographic apparatus, the pellicle membrane characterized by in plane variation in composition is described. A method of manufacturing a pellicle membrane, the method including: providing a first material layer on a sacrificial layer on a substrate; providing a photoresist layer on the first material layer; patterning the photoresist layer; etching the first material layer to form a patterned surface; and either i) depositing a layer of a second material on the patterned surface and subsequently lifting off the portion of the second material deposited on the patterned photoresist layer, or ii) removing the remaining photoresist layer, depositing a layer of a second material on the patterned surface, and subsequently planarizing the surface.
    Type: Application
    Filed: August 5, 2021
    Publication date: October 19, 2023
    Applicant: ASML NETHERLANDS B. V.
    Inventors: Ties Wouter VAN DER WOORD, Alexander Ludwig KLEIN, Zomer Silvester HOUWELING, Inci DONMEZ NOYAN, Volker Dirk HILDENBRAND, Adrianus Johannes Maria HILDENBRAND, Johan Hendrik GIESBERS