Abstract: A baseband signal is processed by amplifying a first pulse width modulation radio frequency signal having a first non-negligible peak-to-peak amplitude and a second non-negligible peak-to-peak amplitude larger than the first non-negligible peak-to-peak amplitude. A second pulse width modulation radio frequency signal is also amplified, the second pulse width modulation radio frequency signal having a third non-negligible peak-to-peak amplitude approximately equal to the second non-negligible peak-to-peak amplitude of the first pulse width modulation signal when the baseband signal power is at or above the second threshold level. The amplified signals are constructively combined to form a pulse width modulation radio frequency signal comprising a plurality of non-negligible peak-to-peak amplitude levels each corresponding to a different baseband signal power range.

Abstract: In one embodiment of the present invention, a semiconductor circuit including an amplifier disposed on a semiconductor substrate is disclosed. A first bond wire coupled to an input of the amplifier, a second bond wire coupled to an output of the amplifier, and a third bond wire coupled in series with the first bond wire. A third bond wire is disposed on the semiconductor substrate so that a mutual inductance between the second bond wire and the third bond wire at least partially cancels a mutual inductance between the first bond wire and the second bond wire.

Abstract: In one embodiment of the present invention, a semiconductor circuit including an amplifier disposed on a semiconductor substrate is disclosed. A first bond wire coupled to an input of the amplifier, a second bond wire coupled to an output of the amplifier, and a third bond wire coupled in series with the first bond wire. A third bond wire is disposed on the semiconductor substrate so that a mutual inductance between the second bond wire and the third bond wire at least partially cancels a mutual inductance between the first bond wire and the second bond wire.

Abstract: A differential transistor pair comprises a plurality of transistor cells in a substrate. Each cell comprises first drain regions at the respective edge of the cell, and a second drain region in between. Source regions are located between the respective first drain region and the second drain region. First gate regions are located between the respective first drain region and the source regions, and second gate regions are located between the source regions and the second drain region. The first drain regions of all cells are interconnected to a common first drain terminal, and the second drain region of all cells are interconnected to a common second drain terminal. The first gate regions of all cells are interconnected to a common first gate terminal, and the second gate regions of all cells are interconnected to a common second gate terminal.

Abstract: A method is disclosed for noise distribution in high resistivity substrates containing differential or balanced integrated circuitry obtaining a noise suppression by an introduction of noise distributors. Noise from an external noise source (5) is made isotropic in relation to branches of a differential or balanced integrated circuitry by creating a low resistivity path adjacent to the differential or balanced integrated circuitry typically formed by two integrated transistors (A, B) or group of transistors. The low resistivity path in the general case is made symmetrical in relation to the integrated transistors thereby forming a noise distributor for distributing the noise evenly. The noise distributor then is formed as a floating substrate contact (10) of the same doping kind as a substrate or a well within which the differential or balanced circuitry is contained.