Patents by Inventor Johan Van Boxmeer

Johan Van Boxmeer has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Lithographic Apparatus, Method of Exposing a Substrate, Method of Measurement, Device Manufacturing Method, and Device Manufacturing Thereby
    Publication number: 20070252963
    Abstract: A method of exposing a substrate (e.g. in a lithographic apparatus comprising a substrate table to support a substrate) according to one embodiment of the invention includes performing first and a second height measurement of a part of at least one substrate with a first and second sensor, generating and storing an offset error map based on a difference between the measurements; generating and storing a height map of portions of the substrate (or another substrate that has had a similar processing as the part) by performing height measurements with the first sensor and correcting this height map by means of the offset error map; and exposing the substrate (or the other substrate).
    Type: Application
    Filed: December 22, 2004
    Publication date: November 1, 2007
    Applicant: ASML Netherlands B.V.
    Inventors: Theodorus Modderman, Nicolaas Antonius Allegondus Van Asten, Johan Van Boxmeer, Gerrit Nijmeijer