Abstract: Microorganism of the genus Eubacterium, and its obtainment and use, which is suitable in pure culture, DSM 11798, and/or mixed culture with the strain Enterococcus casseliflavus, DSM 11799, or in mixed culture with other anaerobic microorganisms for the detoxification of trichothecenes. A feedstuff additive for the inactivation of trichothecenes in feedstuffs or in the digestive tract of animals contains a pure and/or mixed culture of the microorganism (DSM 11798 or DSM 11799) or a mixed culture with other anaerobic microorganisms in an amount from 0.2 to 3 kg, in particular 0.5 to 2.5 kg, per 1000 kg of feedstuff. The feedstuff additive containing DSM 11798 achieves probiotic effect on an animal and maintains or improves fertility performance of an animal subject to fusariotoxin-contaminated feed.

Abstract: In a feed additive and/or drinking water additive for domestic animals, which contains at least bacteria of the strain Streptococcus faecium IMB 52 (DSM 3530), it is provided that standardized cell wall components from Bacillus sp. and/or Streptoccocus sp. and/or Bifidobacterium sp. as well as inulin are additionally contained.

Abstract: Microorganism of the genus Eubacterium, and its obtainment and use, which is suitable in pure culture, DSM 11798, and/or mixed culture with the strain Enterococcus casseliflavus, DSM 11799, or in mixed culture with other anaerobic microorganisms for the detoxification of trichothecenes. A feedstuff additive for the inactivation of trichothecenes in feedstuffs or in the digestive tract of animals contains a pure and/or mixed culture of the microorganism (DSM 11798 or DSM 11799) or a mixed culture with other anaerobic microorganisms in an amount from 0.2 to 3 kg, in particular 0.5 to 2.5 kg, per 1000 kg of feedstuff.

Abstract: The invention relates to a novel ski pole set whereby at least two ski poles form a ski carrier having pole disks which function as freely rotatable wheels for the device.

Abstract: A method for adjusting the registry of a mask in relation to a substrate in a projection printing photolithographic device characterized by after obtaining the adjustment of the registry, correcting the focus of the objective of the device so that the desired surface of the substrate lies in a plane of focus of the objective. The adjusting of the focus is accomplished by displacing the objective or imaging lenses in a direction vertical to the plane of the mask and the surface of the substrate in such a manner that there results an optimum focusing of the light utilized during the adjustment process of the mask to the surface of the substrate.

Abstract: In a method for the automatic adjustment of semiconductor wafers, adjustment marks are arranged on the surface of the wafer to be adjusted. Light is emitted through a transparent body with an attached mask. The transparent body and mask are displaced so that adjustment patterns on the mask are aligned with respect to the wafer adjustment patterns. A shutter below the mask ensures that only light beams which pass through the adjustment patterns of the mask hit the surface of the semiconductor wafer. Light beams passing through the adjustment patterns of the mask are directed onto the surface of the semiconductor wafer by an objective. The wafer reflects the light back through the objective, shutter apertures and adjustment patterns. The reflected back beams of light are detected by light sensitive elements and the orientation of the mask and transparent body is arranged such that minimum reflected light is received at the light sensitive elements.