Abstract: The invention relates to a method for producing a multi-layer sliding bearing element (1), according to which, in a chamber of a cathode sputtering installation a metal layer is deposited on a substrate by means of cathode sputtering of at least one target, said method comprising the steps: introducing a substrate into the chamber of the cathode sputtering installation; ion etching of the surface of the substrate to be coated by ion bombardment, whereby substrate particles are removed from the surface of the substrate; depositing the metal layer on the substrate, whereto target particles are produced from at least one target that is connected as the cathode, said particles being settled on the substrate. In the step of ion etching of the substrate, the target is connected as the anode and at least some of the substrate particles are deposited on the target. The polarity of the target is then reversed for the deposition of the metal layer on the surface of the substrate.

Abstract: The invention relates to a sliding bearing element (1) comprising a supporting layer (2) and a sliding layer (3), the sliding layer (3) being made of silver or silver having a maximum content of other metals of 5% by weight, selected from a group consisting of Cu, Sb, Mo, Co, and the sliding layer (3) has a microstructure with grains (6, 7) and has a sliding layer thickness (12). The microstructure changes on the sliding layer thickness (12) from a globular habitus of the grains (7) in the region of a second surface (9) of the sliding layer (3) closer to the supporting layer (2) to a habitus in an at least approximately columnar form, a longitudinal extension (10) of the grains (7) being arranged in the region of a first surface (8) of the sliding layer (3) farther away from the supporting layer (2).

Abstract: The invention relates to a method for producing a multi-layer sliding bearing element (1), according to which, in a chamber of a cathode sputtering installation a metal layer is deposited on a substrate by means of cathode sputtering of at least one target, said method comprising the steps: introducing a substrate into the chamber of the cathode sputtering installation; ion etching of the surface of the substrate to be coated by ion bombardment, whereby substrate particles are removed from the surface of the substrate; depositing the metal layer on the substrate, whereto target particles are produced from at least one target that is connected as the cathode, said particles being settled on the substrate. In the step of ion etching of the substrate, the target is connected as the anode and at least some of the substrate particles are deposited on the target. The polarity of the target is then reversed for the deposition of the metal layer on the surface of the substrate.

Abstract: The invention relates to a sliding bearing element (1) comprising a supporting layer (2) and a sliding layer (3), the sliding layer (3) being made of silver or silver having a maximum content of other metals of 5% by weight, selected from a group consisting of Cu, Sb, Mo, Co, and the sliding layer (3) has a microstructure with grains (6, 7) and has a sliding layer thickness (12). The microstructure changes on the sliding layer thickness (12) from a globular habitus of the grains (7) in the region of a second surface (9) of the sliding layer (3) closer to the supporting layer (2) to a habitus in an at least approximately columnar form, a longitudinal extension (10) of the grains (7) being arranged in the region of a first surface (8) of the sliding layer (3) farther away from the supporting layer (2).

Abstract: The invention relates to a multi-layered plain bearing (1) comprising a sliding layer (5) made from a tin-based alloy, which contains between 1 wt. % and 8 wt. % Sb, between 8 wt. % and 20 wt. % Cu and if necessary at least one of the elements Si, Cr, Ti, Zn, Ag and Fe, wherein the proportion of each of these elements is between 0.1 wt. % and 2 wt. %, the total content of all of the alloy elements is a maximum of 30 wt. % and remainder is formed by Sn, wherein at least a proportion of the Cu with Sn is present as a copper-rich deposit in the tin matrix with a maximum particle size of 50 nm and/or in addition contains at least one further element from a second group consisting of Al, Bi and Ni, wherein the proportion of the at least one further element is between 0.1 wt. % and 5 wt. % for each of said elements, and wherein the sliding layer (5), which contains at least one element of the second element group, is deposited by a PVD-method when the particle size of the nanoparticles is greater than 50 nm.

Abstract: The invention relates to a multi-layered plain bearing (1) comprising a sliding layer (5) made from a tin-based alloy, which contains between 1 wt. % and 8 wt. % Sb, between 8 wt. % and 20 wt. % Cu and if necessary at least one of the elements Si, Cr, Ti, Zn, Ag and Fe, wherein the proportion of each of these elements is between 0.1 wt. % and 2 wt. %, the total content of all of the alloy elements is a maximum of 30 wt. % and remainder is formed by Sn, wherein at least a proportion of the Cu with Sn is present as a copper-rich deposit in the tin matrix with a maximum particle size of 50 nm and/or in addition contains at least one further element from a second group consisting of Al, Bi and Ni, wherein the proportion of the at least one further element is between 0.1 wt. % and 5 wt. % for each of said elements, and wherein the sliding layer (5), which contains at least one element of the second element group, is deposited by a PVD-method when the particle size of the nanoparticles is greater than 50 nm.