Patents by Inventor Johann Trenkler
Johann Trenkler has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Publication number: 20180224585Abstract: A reflective optical element and an EUV lithography appliance containing one such element are provided, the appliance displaying a low propensity to contamination. The reflective optical element has a protective layer system includes at least two layers. The optical characteristics of the protective layer system are between those of a spacer and an absorber, or correspond to those of a spacer. The selection of a material with the smallest possible imaginary part and a real part which is as close to 1 as possible in terms of the refractive index leads to a plateau-type reflectivity course according to the thickness of the protective layer system between two thicknesses d1 and d2. The thickness of the protective layer system is selected in such a way that it is less than d2.Type: ApplicationFiled: February 12, 2018Publication date: August 9, 2018Inventors: Johann Trenkler, Hans-Juergen Mann, Udo Nothelfer
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Patent number: 9910193Abstract: A reflective optical element and an EUV lithography appliance containing one such element are provided, the appliance displaying a low propensity to contamination. The reflective optical element has a protective layer system includes at least two layers. The optical characteristics of the protective layer system are between those of a spacer and an absorber, or correspond to those of a spacer. The selection of a material with the smallest possible imaginary part and a real part which is as close to 1 as possible in terms of the refractive index leads to a plateau-type reflectivity course according to the thickness of the protective layer system between two thicknesses d1 and d2. The thickness of the protective layer system is selected in such a way that it is less than d2.Type: GrantFiled: October 31, 2014Date of Patent: March 6, 2018Assignee: Carl Zeiss SMT GmbHInventors: Johann Trenkler, Hans-Juergen Mann, Udo Nothelfer
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Patent number: 8966830Abstract: The present invention relates to a device for the protection of living beings and objects from being buried in bulk material, a method for assembling said device and uses employing this device.Type: GrantFiled: February 10, 2012Date of Patent: March 3, 2015Assignee: Südzucker Aktiengesellschaft Mannheim/OchsenfurtInventor: Johann Trenkler
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Publication number: 20150055111Abstract: A reflective optical element and an EUV lithography appliance containing one such element are provided, the appliance displaying a low propensity to contamination. The reflective optical element has a protective layer system includes at least two layers. The optical characteristics of the protective layer system are between those of a spacer and an absorber, or correspond to those of a spacer. The selection of a material with the smallest possible imaginary part and a real part which is as close to 1 as possible in terms of the refractive index leads to a plateau-type reflectivity course according to the thickness of the protective layer system between two thicknesses d1 and d2. The thickness of the protective layer system is selected in such a way that it is less than d2.Type: ApplicationFiled: October 31, 2014Publication date: February 26, 2015Inventors: Johann Trenkler, Hans-Juergen Mann, Udo Nothelfer
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Patent number: 8944615Abstract: A method of manufacturing a projection objective (22) of a microlithographic projection exposure apparatus (10). The projection objective (22) comprises at least one mirror (M1 to M6) that each have a mirror support (241 to 246) and a reflective coating (26) applied thereon. First imaging aberrations of a pre-assembled projection objective are measured. Before the coating (26) is applied, the mirror supports (241 to 246) are provided with a desired surface deformation (34). If the mirrors (M1 to M6) are not reflective for projection light without the coating (26), measuring light is used that has another wavelength. Alternatively, two identical mirror supports (246) may be provided. One support having a reflective coating is part of the pre-assembled projection objective whose imaging aberrations are measured. The other support is provided with surface deformations before coating and mounting the support into the objective.Type: GrantFiled: February 23, 2010Date of Patent: February 3, 2015Assignee: Carl Zeiss SMT GmbHInventors: Hans-Juergen Mann, Stephan Muellender, Johann Trenkler, Harmut Enkisch
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Patent number: 8891163Abstract: A reflective optical element and an EUV lithography appliance containing one such element are provided, the appliance displaying a low propensity to contamination. The reflective optical element has a protective layer system includes at least two layers. The optical characteristics of the protective layer system are between those of a spacer and an absorber, or correspond to those of a spacer. The selection of a material with the smallest possible imaginary part and a real part which is as close to 1 as possible in terms of the refractive index leads to a plateau-type reflectivity course according to the thickness of the protective layer system between two thicknesses d1 and d2. The thickness of the protective layer system is selected in such a way that it is less than d2.Type: GrantFiled: July 11, 2013Date of Patent: November 18, 2014Assignee: Carl Zeiss SMT GmbHInventors: Johann Trenkler, Hans-Juergen Mann, Udo Nothelfer
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Publication number: 20130312918Abstract: The present invention relates to a device for the protection of living beings and objects from being buried in bulk material, a method for assembling said device and uses employing this device.Type: ApplicationFiled: February 10, 2012Publication date: November 28, 2013Applicant: Südzucker Aktiengesellschaft Mannheim/OchsenfurtInventor: Johann Trenkler
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Publication number: 20130301023Abstract: A reflective optical element and an EUV lithography appliance containing one such element are provided, the appliance displaying a low propensity to contamination. The reflective optical element has a protective layer system includes at least two layers. The optical characteristics of the protective layer system are between those of a spacer and an absorber, or correspond to those of a spacer. The selection of a material with the smallest possible imaginary part and a real part which is as close to 1 as possible in terms of the refractive index leads to a plateau-type reflectivity course according to the thickness of the protective layer system between two thicknesses d1 and d2. The thickness of the protective layer system is selected in such a way that it is less than d2.Type: ApplicationFiled: July 11, 2013Publication date: November 14, 2013Inventors: Johann Trenkler, Hans-Juergen Mann, Udo Nothelfer
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Patent number: 8537460Abstract: A reflective optical element and an EUV lithography appliance containing one such element are provided, the appliance displaying a low propensity to contamination. The reflective optical element has a protective layer system includes at least two layers. The optical characteristics of the protective layer system are between those of a spacer and an absorber, or correspond to those of a spacer. The selection of a material with the smallest possible imaginary part and a real part which is as close to 1 as possible in terms of the refractive index leads to a plateau-type reflectivity course according to the thickness of the protective layer system between two thicknesses d1 and d2. The thickness of the protective layer system is selected in such a way that it is less than d2.Type: GrantFiled: June 22, 2012Date of Patent: September 17, 2013Assignee: Carl Zeiss SMT GmbHInventors: Johann Trenkler, Hans-Jürgen Mann, Udo Nothelfer
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Publication number: 20120293779Abstract: A reflective optical element and an EUV lithography appliance containing one such element are provided, the appliance displaying a low propensity to contamination. The reflective optical element has a protective layer system includes at least two layers. The optical characteristics of the protective layer system are between those of a spacer and an absorber, or correspond to those of a spacer. The selection of a material with the smallest possible imaginary part and a real part which is as close to 1 as possible in terms of the refractive index leads to a plateau-type reflectivity course according to the thickness of the protective layer system between two thicknesses d1 and d2. The thickness of the protective layer system is selected in such a way that it is less than d2.Type: ApplicationFiled: June 22, 2012Publication date: November 22, 2012Inventors: Johann Trenkler, Hans-Juergen Mann, Udo Nothelfer
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Patent number: 8243364Abstract: A reflective optical element and an EUV lithography appliance containing one such element are provided, the appliance displaying a low propensity to contamination. The reflective optical element has a protective layer system includes at least two layers. The optical characteristics of the protective layer system are between those of a spacer and an absorber, or correspond to those of a spacer. The selection of a material with the smallest possible imaginary part and a real part which is as close to 1 as possible in terms of the refractive index leads to a plateau-type reflectivity course according to the thickness of the protective layer system between two thicknesses d1 and d2. The thickness of the protective layer system is selected in such a way that it is less than d2.Type: GrantFiled: May 27, 2011Date of Patent: August 14, 2012Assignee: CARL ZEISS SMT GmbHInventors: Johann Trenkler, Hans-Juergen Mann, Udo Nothelfer
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Patent number: 8228483Abstract: A projection objective is disclosed. The projection objective can include a plurality of optical elements arranged to image a pattern from an object field in an object surface of the projection objective to an image field in an image surface of the projection objective with electromagnetic operating radiation from a wavelength band around an operating wavelength ?. The plurality of optical elements can include an optical correction plate that includes a body comprising a material transparent to the operating radiation, the body having a first optical surface, a second optical surface, a plate normal substantially perpendicular to the first and second optical surfaces, and a thickness profile defined as a distance between the first and second optical surfaces measured parallel to the plate normal. The first optical surface can have a non-rotationally symmetric aspheric first surface profile with a first peak-to-valley value PV1>?.Type: GrantFiled: February 2, 2010Date of Patent: July 24, 2012Assignee: Carl Zeiss SMT GmbHInventors: Ulrich Loering, Gerd Reisinger, Franz-Josef Stickel, Sonja Schneider, Johann Trenkler, Stefan Kraus, Gordon Doering, Aksel Goehnermeier
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Patent number: 8164077Abstract: An optical element, especially a normal-incidence collector mirror, for radiation in the EUV and/or soft X-ray region of wavelengths is described. The element has a substrate, a multilayer coating with an optically active region, and a capacitor, having a first and a second capacitor electrode. At least one layer of the multilayer coating serves as the first capacitor electrode. At least one dielectric layer is provided between the two capacitor electrodes. Also described is an optical system with at least one optical element, having a first electrode arranged in the vicinity of the optical element.Type: GrantFiled: November 24, 2009Date of Patent: April 24, 2012Assignee: Carl Zeiss SMT GmbHInventors: Marco Wedowski, Nadyeh Shariloo, legal representative, Markus Weiss, Stephan Muellender, Johann Trenkler, Hartmut Enkisch, Gisela Sipos, Hubert Adriaan van Mierlo, Michiel David Nijkerk, Fokko Pieter Wieringa
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Publication number: 20110228237Abstract: A reflective optical element and an EUV lithography appliance containing one such element are provided, the appliance displaying a low propensity to contamination. The reflective optical element has a protective layer system includes at least two layers. The optical characteristics of the protective layer system are between those of a spacer and an absorber, or correspond to those of a spacer. The selection of a material with the smallest possible imaginary part and a real part which is as close to 1 as possible in terms of the refractive index leads to a plateau-type reflectivity course according to the thickness of the protective layer system between two thicknesses d1 and d2. The thickness of the protective layer system is selected in such a way that it is less than d2.Type: ApplicationFiled: May 27, 2011Publication date: September 22, 2011Applicant: CARL ZEISS SMT GMBHInventors: Johann TRENKLER, Hans-Juergen MANN, Udo NOTHELFER
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Patent number: 7952797Abstract: A reflective optical element and an EUV lithography appliance containing one such element are provided, the appliance displaying a low propensity to contamination. The reflective optical element has a protective layer system consisting of at least one layer. The optical characteristics of the protective layer system are between those of a spacer and an absorber, or correspond to those of a spacer. The selection of a material with the smallest possible imaginary part and a real part which is as close to 1 as possible in terms of the refractive index leads to a plateau-type reflectivity course according to the thickness of the protective layer system between two thicknesses d1 and d2. The thickness of the protective layer system is selected in such a way that it is less than d2.Type: GrantFiled: March 6, 2009Date of Patent: May 31, 2011Assignee: CARL ZEISS SMT GmbHInventors: Johann Trenkler, Hans-Jürgen Mann, Udo Nothelfer
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Publication number: 20100195070Abstract: A projection objective is disclosed. The projection objective can include a plurality of optical elements arranged to image a pattern from an object field in an object surface of the projection objective to an image field in an image surface of the projection objective with electromagnetic operating radiation from a wavelength band around an operating wavelength ?. The plurality of optical elements can include an optical correction plate that includes a body comprising a material transparent to the operating radiation, the body having a first optical surface, a second optical surface, a plate normal substantially perpendicular to the first and second optical surfaces, and a thickness profile defined as a distance between the first and second optical surfaces measured parallel to the plate normal. The first optical surface can have a non-rotationally symmetric aspheric first surface profile with a first peak-to-valley value PV1>?.Type: ApplicationFiled: February 2, 2010Publication date: August 5, 2010Applicant: Carl Zeiss SMT AGInventors: Ulrich Loering, Gerd Reisinger, Franz-Josef Stickel, Sonja Schneider, Johann Trenkler, Stefan Kraus, Gordon Doering, Aksel Goehnermeier
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Publication number: 20100149517Abstract: A method of manufacturing a projection objective (22) of a microlithographic projection exposure apparatus (10). The projection objective (22) comprises at least one mirror (M1 to M6) that each have a mirror support (241 to 246) and a reflective coating (26) applied thereon. First imaging aberrations of a pre-assembled projection objective are measured. Before the coating (26) is applied, the mirror supports (241 to 246) are provided with a desired surface deformation (34). If the mirrors (M1 to M6) are not reflective for projection light without the coating (26), measuring light is used that has another wavelength. Alternatively, two identical mirror supports (246) may be provided. One support having a reflective coating is part of the pre-assembled projection objective whose imaging aberrations are measured. The other support is provided with surface deformations before coating and mounting the support into the objective.Type: ApplicationFiled: February 23, 2010Publication date: June 17, 2010Applicant: Carl Zeiss SMT AGInventors: Hans-Juergen Mann, Stephan Muellender, Johann Trenkler, Harmut Enkisch
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Publication number: 20100067653Abstract: An optical element, especially a normal-incidence collector mirror, for radiation in the EUV and/or soft X-ray region of wavelengths is described. The element has a substrate, a multilayer coating with an optically active region, and a capacitor, having a first and a second capacitor electrode. At least one layer of the multilayer coating serves as the first capacitor electrode. At least one dielectric layer is provided between the two capacitor electrodes. Also described is an optical system with at least one optical element, having a first electrode arranged in the vicinity of the optical element.Type: ApplicationFiled: November 24, 2009Publication date: March 18, 2010Applicant: Carl Zeiss SMT AGInventors: Marco Wedowski, Markus Weiss, Stephan Mûllender, Johann Trenkler, Hartmut Enkisch, Gisela Sipos, H.A. van Mierlo, Michiel David Nijkerk, Fokko Pieter Wieringa, Nadyeh Shariloo
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Patent number: 7646004Abstract: An optical element, especially a normal-incidence collector mirror, for radiation in the EUV and/or soft X-ray region of wavelengths is described. The element has a substrate, a multilayer coating with an optically active region, and a capacitor, having a first and a second capacitor electrode. At least one layer of the multilayer coating serves as the first capacitor electrode. At least one dielectric layer is provided between the two capacitor electrodes. Also described is an optical system with at least one optical element, having a first electrode arranged in the vicinity of the optical element.Type: GrantFiled: May 24, 2006Date of Patent: January 12, 2010Assignee: Carl Zeiss SMT AGInventors: Marco Wedowski, Nadyeh Shariloo, legal representative, Markus Weiss, Stephan Müllender, Johann Trenkler, Hartmut Enkisch, Gisela Sipos, H. A. van Mierlo, Michiel David Nijkerk, Fokko Pieter Wieringa
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Patent number: 7629055Abstract: A limiting factor in the operation of EUV lithographic devices is the lifetime or the reflectivity of the reflective optics that is reduced by contamination with carbon-containing substances. Protective coatings that are resistant to oxidation or are inert against water are already known. According to the invention it is proposed to deposit protective coatings on, for example, multilayers that suppress the growth of carbon-containing substances in combination with layers that are inert against residual gas atmosphere and energy input. Even with a long operating time a high reflectivity is thereby retained. The protective coatings may be deposited by electron-beam vaporization, magnetron- or ion-beam sputtering.Type: GrantFiled: June 10, 2005Date of Patent: December 8, 2009Assignee: Carl Zeiss SMT AGInventor: Johann Trenkler