Patents by Inventor Johannes Adam

Johannes Adam has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20080306203
    Abstract: The invention relates to a silicon dioxide dispersion that comprises a) an outer flowable phase containing 1) polymerizable monomers, oligomers and/or prepolymers that can be converted to polymers by non-radical reaction; and/or 2) polymers, and b) a disperse phase containing amorphous silicon dioxide. The inventive dispersion is characterized in that the average particle size dmax of the silicon dioxide as measured by small angle neutron scattering (SANS) is between 3 and 50 nm at a maximum half-width of the distribution curve of 1.5 dmax. Such a silicon dioxide dispersion can be easily manufactured even at higher concentrations of the disperse phase and can be used to produce polymer materials that have advantageous properties, especially advantageous mechanical properties.
    Type: Application
    Filed: August 13, 2008
    Publication date: December 11, 2008
    Applicant: HANSE CHEMIE AG
    Inventors: Johannes ADAM, Christof ROSCHER, Christian EGER, Thorsten ADEBAHR, Robert WIECZORRECK, Manfred PYRLIK
  • Publication number: 20080247008
    Abstract: A scanner and a method of scanning an image on an original includes an optical sensor having sensor elements for each of three basic colors that is used to generate pixel values of the scanned image. Each pixel value represents an optical density of a pixel of the image and is generated mainly on the basis of a signal of only one of the sensor elements. Each of the sensor elements for each of the basic colors is used to generate pixel values representing substantially different parts of the image.
    Type: Application
    Filed: May 27, 2008
    Publication date: October 9, 2008
    Applicant: OCE-TECHNOLOGIES B.V.
    Inventors: Cornelis Bartholomeus Maria Van Mil, Jacobus Hubertus Theodoor Jamar, Robertus Johannes Adam Gorter
  • Publication number: 20040147029
    Abstract: The invention relates to a silicon dioxide dispersion that comprises a) an outer flowable phase containing a1) polymerizable monomers, oligomers and/or prepolymers that can be converted to polymers by non-radical reaction; and/or a2) polymers, b) a disperse phase containing amorphous silicon dioxide. The inventive dispersion is characterized in that the average particle size dmax of the silicon dioxide as measured by small angle neutron scattering (SANS) is between 3 and 50 nm at a maximum half-width of the distribution curve of 1.5 dmax. Such a silicon dioxide dispersion can be easily manufactured even at higher concentrations of the disperse phase and can be used to produce polymer materials that have advantageous properties, especially advantageous mechanical properties.
    Type: Application
    Filed: March 15, 2004
    Publication date: July 29, 2004
    Inventor: Johannes Adam