Patents by Inventor Johannes Bernardus Ridder

Johannes Bernardus Ridder has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 8598550
    Abstract: A collector assembly with a radiation collector, a cover plate and a support member connecting the radiation collector to the cover plate are provided. The cover plate is designed to cover an opening in a collector chamber. The collector chamber opening may be large enough to pass the radiation collector and the support member. The removed radiation collector can be cleaned with different cleaning procedures, which may be performed in a cleaning device. Such cleaning device may for example consist of the following: a circumferential hull designed to provide an enclosure volume for circumferentially enclosing at least the radiation collector; an inlet configured to provide at least one of a cleaning gas and a cleaning liquid to the enclosure volume to clean at least said radiation collector; and an outlet configured to remove said at least one of said cleaning gas and said cleaning liquid from the enclosure volume.
    Type: Grant
    Filed: February 3, 2012
    Date of Patent: December 3, 2013
    Assignee: ASML Netherlands B.V.
    Inventors: Vadim Yevgenyevich Banine, Vladimir Vitalevitch Ivanov, Josephus Jacobus Smits, Lambertus Adrianus Van Den Wildenberg, Vladimir Mihailovitch Krivtsun, Alexander Matthijs Struycken, Johannes Bernardus Ridder, Harm-Jan Voorma, Carolus Ida Maria Antonius Spee, Klaas Timmer
  • Patent number: 8289498
    Abstract: A lithographic apparatus includes a projection system configured to project an image onto a substrate, a substrate table configured to support the substrate, a first chamber that at least partially surrounds the projection system, and a second chamber that at least partially surrounds the substrate table and a first frame. The apparatus includes a base frame configured to support the second chamber, and an intermediate frame coupled to the base frame. The intermediate frame is configured to separate the first chamber and the second chamber. The apparatus includes a support coupled to the first frame. The support is configured to support the first chamber through a coupled opening in the intermediate frame and the second chamber.
    Type: Grant
    Filed: June 12, 2009
    Date of Patent: October 16, 2012
    Assignee: ASML Netherlands B.V.
    Inventors: Erik Roelof Loopstra, Petrus Rutgerus Bartray, Leon Martin Levasier, Bernardus Antonius Johannes Luttikhuis, Josephus Jacobus Smits, Anthonie Aantjes, Maurice Willem Jozef Etiƫnne Wijckmans, Johannes Bernardus Ridder, Andre Schreuder, Dennis Jozef Maria Paulussen, Peter Gerardus Jonkers, Hugues Poincelin, Fransiscus Theresia Noel Heusschen
  • Publication number: 20120140196
    Abstract: A collector assembly with a radiation collector, a cover plate and a support member connecting the radiation collector to the cover plate are provided. The cover plate is designed to cover an opening in a collector chamber. The collector chamber opening may be large enough to pass the radiation collector and the support member. The removed radiation collector can be cleaned with different cleaning procedures, which may be performed in a cleaning device. Such cleaning device may for example consist of the following: a circumferential hull designed to provide an enclosure volume for circumferentially enclosing at least the radiation collector; an inlet configured to provide at least one of a cleaning gas and a cleaning liquid to the enclosure volume to clean at least said radiation collector; and an outlet configured to remove said at least one of said cleaning gas and said cleaning liquid from the enclosure volume.
    Type: Application
    Filed: February 3, 2012
    Publication date: June 7, 2012
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Vadim Yevgenyevich Banine, Vladimir Vitalevitch Ivanov, Josephus Jacobus Smits, Harm-Jan Voorma, Lambertus Adrianus Van Den Wildenberg, Vladimir Mihailovitch Krivtsun, Alexander Matthijs Struycken, Carolus Ida Maria Antonius Spee, Klaas Timmer, Johannes Bernardus Ridder
  • Patent number: 8134136
    Abstract: A collector assembly with a radiation collector, a cover plate and a support member connecting the radiation collector to the cover plate are provided. The cover plate is designed to cover an opening in a collector chamber. The collector chamber opening may be large enough to pass the radiation collector and the support member. The removed radiation collector can be cleaned with different cleaning procedures, which may be performed in a cleaning device. Such cleaning device may for example consist of the following: a circumferential hull designed to provide an enclosure volume for circumferentially enclosing at least the radiation collector; an inlet configured to provide at least one of a cleaning gas and a cleaning liquid to the enclosure volume to clean at least said radiation collector; and an outlet configured to remove said at least one of said cleaning gas and said cleaning liquid from the enclosure volume.
    Type: Grant
    Filed: June 22, 2010
    Date of Patent: March 13, 2012
    Assignee: ASML Netherlands B.V.
    Inventors: Vadim Yevgenyevich Banine, Vladimir Vitalevitch Ivanov, Josephus Jacobus Smits, Lambertus Adrianus Van Den Wildenberg, Vladimir Mihailovitch Krivtsun, Alexander Matthijs Struycken, Johannes Bernardus Ridder, Harm-Jan Voorma, Carolus Ida Maria Antonius Spee, Klaas Timmer
  • Publication number: 20100290015
    Abstract: A collector assembly with a radiation collector, a cover plate and a support member connecting the radiation collector to the cover plate are provided. The cover plate is designed to cover an opening in a collector chamber. The collector chamber opening may be large enough to pass the radiation collector and the support member. The removed radiation collector can be cleaned with different cleaning procedures, which may be performed in a cleaning device. Such cleaning device may for example consist of the following: a circumferential hull designed to provide an enclosure volume for circumferentially enclosing at least the radiation collector; an inlet configured to provide at least one of a cleaning gas and a cleaning liquid to the enclosure volume to clean at least said radiation collector; and an outlet configured to remove said at least one of said cleaning gas and said cleaning liquid from the enclosure volume.
    Type: Application
    Filed: June 22, 2010
    Publication date: November 18, 2010
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Vadim Yevgenyevich BANINE, Vladimir Vitalevitch Ivanov, Josephus Jacobus Smits, Harm-Jan Voorma, Lambertus Adrianus Van Den Wildenberg, Vladimir Mihailovitch Krivtsun, Alexander Matthijs Struycken, Carolus Ida Maria Antonius Spee, Klaas Timmer, Johannes Bernardus Ridder
  • Patent number: 7767989
    Abstract: A collector assembly with a radiation collector, a cover plate and a support member connecting the radiation collector to the cover plate are provided. The cover plate is designed to cover an opening in a collector chamber. The collector chamber opening may be large enough to pass the radiation collector and the support member. The removed radiation collector can be cleaned with different cleaning procedures, which may be performed in a cleaning device. Such cleaning device may for example consist of the following: a circumferential hull designed to provide an enclosure volume for circumferentially enclosing at least the radiation collector; an inlet configured to provide at least one of a cleaning gas and a cleaning liquid to the enclosure volume to clean at least said radiation collector; and an outlet configured to remove said at least one of said cleaning gas and said cleaning liquid from the enclosure volume.
    Type: Grant
    Filed: September 27, 2006
    Date of Patent: August 3, 2010
    Assignee: ASML Netherlands B.V.
    Inventors: Vadim Yevgenyevich Banine, Vladimir Vitalevitch Ivanov, Josephus Jacobus Smits, Harm-Jan Voorma, Lambertus Adrianus Van Den Wildenberg, Vladimir Mihailovitch Krivtsun, Alexander Matthijs Struycken, Carolus Ida Maria Antonius Spee, Klaas Timmer, Johannes Bernardus Ridder
  • Publication number: 20100002207
    Abstract: A lithographic apparatus includes a projection system configured to project an image onto a substrate, a substrate table configured to support the substrate, a first chamber that at least partially surrounds the projection system, and a second chamber that at least partially surrounds the substrate table and a first frame. The apparatus includes a base frame configured to support the second chamber, and an intermediate frame coupled to the base frame. The intermediate frame is configured to separate the first chamber and the second chamber. The apparatus includes a support coupled to the first frame. The support is configured to support the first chamber through a coupled opening in the intermediate frame and the second chamber.
    Type: Application
    Filed: June 12, 2009
    Publication date: January 7, 2010
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Erik Roelof LOOPSTRA, Petrus Rutgerus Bartray, Leon Martin Levasier, Bernardus Antonius Johannes Luttikhuis, Josephus Jacobus Smits, Anthonie Aantjes, Maurice Willem Jozef Etienne Wijckmans, Johannes Bernardus Ridder, Andre Schreuder, Dennis Jozef Maria Paulussen, Peter Gerardus Jonkers, Hugues Poincelin, Fransiscus Theresia Noel Heusschen
  • Patent number: 7372058
    Abstract: A collector assembly with a radiation collector, a cover plate and a support member connecting the radiation collector to the cover plate are provided. The cover plate is designed to cover an opening in a collector chamber. The collector chamber opening may be large enough to pass the radiation collector and the support member. The removed radiation collector can be cleaned with different cleaning procedures, which may be performed in a cleaning device. Such cleaning device may for example consist of the following: a circumferential hull designed to provide an enclosure volume for circumferentially enclosing at least the radiation collector; an inlet configured to provide at least one of a cleaning gas and a cleaning liquid to the enclosure volume to clean at least said radiation collector; and an outlet configured to remove said at least one of said cleaning gas and said cleaning liquid from the enclosure volume.
    Type: Grant
    Filed: September 27, 2005
    Date of Patent: May 13, 2008
    Assignee: ASML Netherlands B.V.
    Inventors: Vadim Yevgenyevich Banine, Lambertus Adrianus Wildenberg, Vladimir Mihailovitch Krivtsun, Alexander Matthijs Struycken, Johannes Bernardus Ridder, Vladimir Vitalevitch Ivanov, Josephus Jacobus Smits