Patents by Inventor Johannes C. H. Mulkens

Johannes C. H. Mulkens has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 6239862
    Abstract: Photolithographic apparatus (1) including an illumination unit (3). The illumination unit (3) comprises, in this order, a radiation source unit (11), a first optical system (5) and an optical waveguide (17). The apparatus (1) further includes a second optical system (7) and a mask table (9). The apparatus (1) is adapted in such a way that both the stepper mode and the scanner mode are selectable modi, and comprises means by which the illumination unit (11), when being operative, has a slit-shaped static illumination field with a width s which is variable between smin and smax while substantially maintaining energy within the static illumination field.
    Type: Grant
    Filed: February 18, 2000
    Date of Patent: May 29, 2001
    Assignee: ASM Lithography B. V.
    Inventors: Johannes C. H. Mulkens, Marinus A. Van Den Brink, Johannes C. M. Jasper
  • Patent number: 6067146
    Abstract: Photolithographic apparatus (1) including an illumination unit (3). The illumination unit (3) comprises, in this order, a radiation source unit (11), a first optical system (5) and an optical waveguide (17). The apparatus (1) further includes a second optical system (7) and a mask table (9). The apparatus (1) is adapted in such a way that both the stepper mode and the scanner mode are selectable modi, and comprises means by which the illumination unit (11), when being operative, has a slit-shaped static illumination field with a width s which is variable between s.sub.min and s.sub.max while substantially maintaining energy within the static illumination field.
    Type: Grant
    Filed: April 10, 1997
    Date of Patent: May 23, 2000
    Assignee: ASM Lithography B.V.
    Inventors: Johannes C. H. Mulkens, Marinus A. Van Den Brink, Johannes C. M. Jasper
  • Patent number: 6028660
    Abstract: Illumination unit (2) for an optical system, including an illumination system (1) which comprises, in this order, a radiation source (3) and a first optical integrator (11). The illumination unit (2) further comprises a detection system (45) including a radiation-sensitive detector (47). The illumination system (1) comprises a second optical integrator (13). The two integrators (11, 13) enclose a prism system (15) comprising at least one prism (17). The prism system (15) has a coupling-out surface via which light can be coupled out of the illumination system (1), and an exit surface via which light can be coupled out of the prism system (15), without the intensity in the main light path being essentially influenced. The detection system (45) is arranged proximate to the exit surface of the prism system (15) and comprises light-integrating means.
    Type: Grant
    Filed: July 25, 1996
    Date of Patent: February 22, 2000
    Assignee: ASM Lithography B.V.
    Inventors: Hans Van Der Laan, Johannes C. H. Mulkens, Judocus M. D. Stoeldrayer
  • Patent number: 5555113
    Abstract: Picture inversion in display devices based on the twisted pneumatic effect is prevented by choosing a twist angle .phi.T such that 70.degree.<.phi.T<90.degree., and an angle .alpha. between the direction of polarization of one of the polarizers and the associated direction of orientation such that: 30.degree.+.phi.T/2<.alpha.<60.degree.+.phi.T/2.
    Type: Grant
    Filed: October 11, 1994
    Date of Patent: September 10, 1996
    Assignee: U.S. Philips Corporation
    Inventors: Johannes C. H. Mulkens, Ingrid E. J. R. Heynderickx
  • Patent number: 5508528
    Abstract: An imaging apparatus and an illumination unit for use in such an apparatus are described, which unit comprises an illumination housing (LH) accommodating a radiation source (LA) and at least a reflector (RL). To prevent a decrease of the radiation power supplied by the illumination housing, this housing is provided with means (LA, SH, L.sub.29) which prevent a diffuse deposit of silicon-containing particles present in the ambient air from being formed on optical components within the illumination housing.
    Type: Grant
    Filed: November 29, 1994
    Date of Patent: April 16, 1996
    Assignee: ASM Lithography B.V.
    Inventors: Johannes C. H. Mulkens, Nicolaas C. J. A. Van Hijningen, Judocus M. D. Stoeldrayer
  • Patent number: 5287207
    Abstract: In a double cell the values of d..DELTA.n for both the actual cell (10) and the compensation cell (20) having opposite twist angles .phi. are chosen to be such that they are associated with different Gooch & Tarry extrema for a given wavelength. The compensation cell may then be thicker and can be obtained in a simpler manner. A universal compensation cell may alternatively be used.
    Type: Grant
    Filed: September 2, 1992
    Date of Patent: February 15, 1994
    Assignee: U.S. Philips Corporation
    Inventors: Johannes C. H. Mulkens, Ingrid E. J. R. Heynderickx
  • Patent number: 5221978
    Abstract: A liquid-crystal display device having an improved picture quality is obtained by rendering the iso-contrast curves rotationally symmetrical. This is obtained by means of a double cell construction, in which two identical TN-cells are present between two parallel polarizers, which TN cells are arranged relative to each other in such a manner that the director at the front face of the second cell encloses an angle of 180.degree. with the director at the front face of the first cell. A polarizer is provided between both cells, the direction of polarization of said polarizer extending perpendicularly to the direction of polarization of the two other polarizers.
    Type: Grant
    Filed: May 21, 1991
    Date of Patent: June 22, 1993
    Assignee: U.S. Philips Corporation
    Inventors: Ingrid E. J. R. Heynderickx, Dirk J. Broer, Johannes C. H. Mulkens