Patents by Inventor Johannes Catharinus Hebertus Mulkens

Johannes Catharinus Hebertus Mulkens has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Lithographic apparatus and device manufacturing method
    Patent number: 7961293
    Abstract: In an immersion lithography apparatus or device manufacturing method, the position of focus of the projected image is changed during imaging to increase focus latitude. In an embodiment, the focus may be varied using the liquid supply system of the immersion lithographic apparatus.
    Type: Grant
    Filed: March 17, 2008
    Date of Patent: June 14, 2011
    Assignees: ASML Netherlands B.V., Carl Zeiss SMT GmbH
    Inventors: Bob Streefkerk, Johannes Jacobus Matheus Baselmans, Adrianus Franciscus Petrus Engelen, Jozef Maria Finders, Paul Graeupner, Johannes Catharinus Hebertus Mulkens, Jan Bernard Plechelmus Van Schoot