Patents by Inventor Johannes Catharinus Hubertus Mulkens

Johannes Catharinus Hubertus Mulkens has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Lithographic apparatus and device manufacturing method
    Patent number: 9360765
    Abstract: A lithographic projection apparatus includes a support structure configured to hold a patterning device, the patterning device configured to pattern a beam of radiation according to a desired pattern; a substrate table configured to hold a substrate; a projection system configured to project the patterned beam onto a target portion of the substrate; a liquid supply system configured to provide liquid to a space between the projection system and the substrate; and a shutter configured to isolate the space from the substrate or a space to be occupied by a substrate.
    Type: Grant
    Filed: August 3, 2015
    Date of Patent: June 7, 2016
    Assignee: ASML NETHERLANDS B.V.
    Inventors: Christiaan Alexander Hoogendam, Antonius Theodorus Anna Maria Derksen, Sjoerd Nicolaas Lambertus Donders, Joeri Lof, Erik Roelof Loopstra, Johannes Catharinus Hubertus Mulkens, Hans Jansen, Jacobus Johannus Leonardus Hendricus Verspay, Alexander Straaijer, Bob Streefkerk
  • Lithographic apparatus, fluid combining unit and device manufacturing method
    Patent number: 9330912
    Abstract: A system for tuning the refractive index of immersion liquid in an immersion lithographic apparatus is disclosed. Two or more immersion liquids of different refractive index are mixed together in order to achieve a desired refractive index. Further, the fluids may be conditioned and treated to maintain optical characteristics.
    Type: Grant
    Filed: September 21, 2011
    Date of Patent: May 3, 2016
    Assignees: ASML NETHERLANDS B.V., ASML HOLDING N.V.
    Inventors: Johannes Catharinus Hubertus Mulkens, Matthew Lipson, Harry Sewell, Louis John Markoya
  • LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD
    Publication number: 20160085161
    Abstract: A substrate table of an immersion lithographic apparatus is disclosed which comprises a barrier configured to collect liquid. The barrier surrounds the substrate and is spaced apart from the substrate. In this way any liquid which is spilt from the liquid supply system can be collected to reduce the risk of contamination of delicate components of the lithographic projection apparatus.
    Type: Application
    Filed: December 1, 2015
    Publication date: March 24, 2016
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Aleksey Yurievich KOLESNYCHENKO, Johannes Jacobus Matheus BASELMANS, Sjoerd Nicolaas Lambertus DONDERS, Christiaan Alexander HOOGENDAM, Hans JANSEN, Jeroen Johannes Sophia Maria MERTENS, Johannes Catharinus Hubertus MULKENS, Felix Godfried Peter PEETERS, Bob STREEFKERK, Franciscus Johannes Herman Maria TEUNISSEN, Helmar VAN SANTEN
  • Lithographic apparatus and device manufacturing method
    Patent number: 9285685
    Abstract: In an immersion lithography apparatus or device manufacturing method, the position of focus of the projected image is changed during imaging to increase focus latitude. In an embodiment, the focus may be varied using the liquid supply system of the immersion lithographic apparatus.
    Type: Grant
    Filed: April 24, 2014
    Date of Patent: March 15, 2016
    Assignees: ASML NETHERLANDS B.V., CARL ZEISS SMT GmbH
    Inventors: Bob Streefkerk, Johannes Jacobus Matheus Baselmans, Adrianus Franciscus Petrus Engelen, Jozef Maria Finders, Paul Gräupner, Johannes Catharinus Hubertus Mulkens, Jan Bernard Plechelmus Van Schoot
  • LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD
    Publication number: 20160062248
    Abstract: A map of the surface of a substrate is generated at a measurement station. The substrate is then moved to where a space between a projection lens and the substrate is filled with a liquid. The substrate is then aligned using, for example, a transmission image sensor and, using the previous mapping, the substrate can be accurately exposed. Thus the mapping does not take place in a liquid environment.
    Type: Application
    Filed: November 10, 2015
    Publication date: March 3, 2016
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Joeri LOF, Joannes Theodoor De Smit, Roelof Aeilko Siebrand Ritsema, Klaus Simon, Theodorus Marinus Modderman, Johannes Catharinus Hubertus Mulkens, Hendricus Johannes Maria Meijer, Erik Roelof Loopstra
  • Lithography Cluster, Method and Control Unit for Automatic Rework of Exposed Substrates
    Publication number: 20160041478
    Abstract: A lithography cluster comprises a track unit, a lithography apparatus, a metrology unit, a control unit and a strip unit. The track unit is for applying a layer on a substrate for lithographic exposure. The lithography apparatus is for exposing the layer according to a pattern. The metrology unit is for measuring a property of the exposed pattern in the layer. The control unit is for controlling an automatic substrate flow between the track unit, the lithography apparatus, and the metrology unit. The strip unit is for removing the layer from the substrate. The control unit is constructed and arranged for controlling the automatic substrate flow on the basis of the measured property such that the substrate is directed to the strip unit for removing the layer if a measured property of its pattern falls outside a pre-determined quality range.
    Type: Application
    Filed: March 18, 2014
    Publication date: February 11, 2016
    Applicant: ASML NETHERLANDS B.V.
    Inventor: Johannes Catharinus Hubertus MULKENS
  • LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD
    Publication number: 20160026095
    Abstract: In an embodiment, a lithographic projection apparatus has an off-axis image field and a concave refractive lens as the final element of the projection system. The concave lens can be cut-away in parts not used optically to prevent bubbles from being trapped under the lens.
    Type: Application
    Filed: September 30, 2015
    Publication date: January 28, 2016
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Johannes Catharinus Hubertus MULKENS, Bob Streefkerk
  • LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD
    Publication number: 20160004171
    Abstract: An immersion lithographic projection apparatus is disclosed in which liquid is provided between a projection system of the apparatus and a substrate. The use of both liquidphobic and liquidphilic layers on various elements of the apparatus is provided to help prevent formation of bubbles in the liquid and to help reduce residue on the elements after being in contact with the liquid.
    Type: Application
    Filed: August 28, 2015
    Publication date: January 7, 2016
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Bob STREEFKERK, Johannes Jacobus Matheus BASELMANS, Richard Joseph BRULS, Marcel Mathijs Theodore Marie DIERICHS, Sjoerd Nicolaas Lambertus DONDERS, Christiaan Alexander HOOGENDAM, Hans JANSEN, Erik Roelof LOOPSTRA, Jeroen Johannes Sophia Maria MERTENS, Johannes Catharinus Hubertus MULKENS, Ronald Walther Jeanne SEVERIJNS, Sergei SHULEPOV, Herman BOOM, Timotheus Franciscus SENGERS
  • LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD
    Publication number: 20150362844
    Abstract: In a lithographic projection apparatus, a structure surrounds a space between the projection system and a substrate table of the lithographic projection apparatus. A gas seal is formed between said structure and the surface of said substrate to contain liquid in the space.
    Type: Application
    Filed: June 18, 2015
    Publication date: December 17, 2015
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Joeri LOF, Antonius Theodorus Anna Maria DERKSEN, Christiaan Alexander HOOGENDAM, Aleksey KOLESNYCHENKO, Erik Roelof LOOPSTRA, Theodorus Marinus MODDERMAN, Johannes Catharinus Hubertus MULKENS, Roelof Aeilko Siebrand RITSEMA, Klaus SIMON, Joannes Theodoor DE SMIT, Alexander STRAAIJER, Bob STREEFKERK, Helmar VAN SANTEN
  • COMPUTATIONAL WAFER INSPECTION
    Publication number: 20150356233
    Abstract: Disclosed herein is a computer-implemented defect prediction method for a device manufacturing process involving processing a portion of a design layout onto a substrate, the method comprising: identifying a hot spot from the portion of the design layout; determining a range of values of a processing parameter of the device manufacturing process for the hot spot, wherein when the processing parameter has a value outside the range, a defect is produced from the hot spot with the device manufacturing process; determining an actual value of the processing parameter; determining or predicting, using the actual value, existence, probability of existence, a characteristic, or a combination thereof, of a defect produced from the hot spot with the device manufacturing process.
    Type: Application
    Filed: June 4, 2015
    Publication date: December 10, 2015
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Christophe David FOUQUET, Bernardo KASTRUP, Arie Jeffrey DEN BOEF, Johannes Catharinus Hubertus MULKENS, James Benedict KAVANAGH, James Patrick KOONMEN, Neal Patrick CALLAN
  • Lithographic apparatus and device manufacturing method involving a groove to collect liquid
    Patent number: 9207543
    Abstract: A substrate table of an immersion lithographic apparatus is disclosed which comprises a barrier configured to collect liquid. The barrier surrounds the substrate and is spaced apart from the substrate. In this way any liquid which is spilt from the liquid supply system can be collected to reduce the risk of contamination of delicate components of the lithographic projection apparatus.
    Type: Grant
    Filed: May 8, 2014
    Date of Patent: December 8, 2015
    Assignee: ASML NETHERLANDS B.V.
    Inventors: Aleksey Yurievich Kolesnychenko, Johannes Jacobus Matheus Baselmans, Sjoerd Nicolaas Lambertus Donders, Christiaan Alexander Hoogendam, Hans Jansen, Jeroen Johannes Sophia Maria Mertens, Johannes Catharinus Hubertus Mulkens, Felix Godfried Peter Peeters, Bob Streefkerk, Franciscus Johannes Herman Maria Teunissen, Helmar Van Santen
  • LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD
    Publication number: 20150338748
    Abstract: A lithographic projection apparatus includes a support structure configured to hold a patterning device, the patterning device configured to pattern a beam of radiation according to a desired pattern; a substrate table configured to hold a substrate; a projection system configured to project the patterned beam onto a target portion of the substrate; a liquid supply system configured to provide liquid to a space between the projection system and the substrate; and a shutter configured to isolate the space from the substrate or a space to be occupied by a substrate.
    Type: Application
    Filed: August 3, 2015
    Publication date: November 26, 2015
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Christiaan Alexander HOOGENDAM, Antonius Theodorus Anna Maria DERKSEN, Sjoerd Nicolaas Lambertus DONDERS, Joeri LOF, Erik Roelof LOOPSTRA, Johannes Catharinus Hubertus MULKENS, Hans JANSEN, Jacobus Johannus Leonardus Hendricus VERSPAY, Alexander STRAAIJER, Bob STREEFKERK
  • Lithographic apparatus and device manufacturing method
    Patent number: 9195153
    Abstract: A map of the surface of a substrate is generated at a measurement station. The substrate is then moved to where a space between a projection lens and the substrate is filled with a liquid. The substrate is then aligned using, for example, a transmission image sensor and, using the previous mapping, the substrate can be accurately exposed. Thus the mapping does not take place in a liquid environment.
    Type: Grant
    Filed: December 3, 2012
    Date of Patent: November 24, 2015
    Assignee: ASML NETHERLANDS B.V.
    Inventors: Joeri Lof, Joannes Theodoor De Smit, Roelof Aeilko Siebrand Ritsema, Klaus Simon, Theodorus Marinus Modderman, Johannes Catharinus Hubertus Mulkens, Hendricus Johannes Maria Meijer, Erik Roelof Loopstra
  • LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD
    Publication number: 20150316858
    Abstract: In immersion lithography after exposure of a substrate is complete, a detector is used to detect any residual liquid remaining on the substrate and/or substrate table.
    Type: Application
    Filed: July 15, 2015
    Publication date: November 5, 2015
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Bob STREEFKERK, Johannes Jacobus Matheus BASELMANS, Sjoerd Nicolaas Lambertus DONDERS, Christiaan Alexander HOOGENDAM, Jeroen Johannes Sophia Maria MERTENS, Johannes Catharinus Hubertus MULKENS
  • Lithographic apparatus and device manufacturing method involving a member and a fluid opening
    Patent number: 9152058
    Abstract: An exposure apparatus including a movable table, a member, movably separate from the table and located on a top surface of the table, to provide a surface substantially co-planar with a top surface of an object in or on the table, a projection system configured to project a radiation beam onto a radiation-sensitive target portion of a substrate, and a liquid supply system configured to provide a liquid to a space between the projection system and the object.
    Type: Grant
    Filed: July 29, 2011
    Date of Patent: October 6, 2015
    Assignee: ASML NETHERLANDS B.V.
    Inventors: Joeri Lof, Erik Theodorus Maria Bijlaart, Roelof Aeilko Siebrand Ritsema, Frank Van Schaik, Timotheus Franciscus Sengers, Klaus Simon, Joannes Theodoor De Smit, Arie Jeffrey Maria Den Boef, Hans Butler, Sjoerd Nicolaas Lambertus Donders, Christiaan Alexander Hoogendam, Marcus Adrianus Van De Kerkhof, Aleksey Yurievich Kolensnychenko, Mark Kroon, Erik Roelof Loopstra, Hendricus Johannes Maria Meijer, Jeroen Johannes Sophia Maria Mertens, Johannes Catharinus Hubertus Mulkens, Joost Jeroen Ottens, Alexander Straaijer, Bob Streefkerk, Helmar Van Santen
  • LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD
    Publication number: 20150261102
    Abstract: A lithographic projection apparatus includes a support structure to hold a patterning device, the patterning device configured to pattern a beam of radiation according to a desired pattern; a projection system to project the patterned beam onto a target portion of a substrate; a substrate table configured to hold the substrate, the substrate table including a support surface to support an intermediary plate between the projection system and at least one of the substrate and an object positioned on the substrate table and not in contact with the at least one of the substrate and the object; and a liquid supply system to provide a liquid, through which the beam is to be projected, in a space between the projection system and the at least one of the substrate and the object.
    Type: Application
    Filed: April 30, 2015
    Publication date: September 17, 2015
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Joeri LOF, Hans Butler, Sjoerd Nicolaas Lambertus Donders, Aleksey Yurievich Kolesnychenko, Erik Roelof Loopstra, Hendricus Johannes Maria Meijer, Jeroen Johannes Sophia Maria Mertens, Johannes Catharinus Hubertus Mulkens, Roelof Aeilko Siebrand Ritsema, Frank Van Schaik, Timotheus Franciscus Sengers, Klaus Simon, Joannes Theodoor De Smit, Alexander Straaijer, Helmar Van Santen
  • Lithographic apparatus and device manufacturing method
    Patent number: 9134623
    Abstract: An immersion lithographic projection apparatus is disclosed in which liquid is provided between a projection system of the apparatus and a substrate. The use of both liquidphobic and liquidphilic layers on various elements of the apparatus is provided to help prevent formation of bubbles in the liquid and to help reduce residue on the elements after being in contact with the liquid.
    Type: Grant
    Filed: April 30, 2014
    Date of Patent: September 15, 2015
    Assignee: ASML NETHERLANDS B.V.
    Inventors: Bob Streefkerk, Johannes Jacobus Matheus Baselmans, Richard Joseph Bruls, Marcel Mathijs Theodore Marie Dierichs, Sjoerd Nicolaas Lambertus Donders, Christiaan Alexander Hoogendam, Hans Jansen, Erik Roelof Loopstra, Jeroen Johannes Sophia Maria Mertens, Johannes Catharinus Hubertus Mulkens, Ronald Walther Jeanne Severijns, Sergei Shulepov, Herman Boom, Timotheus Franciscus Sengers
  • Lithographic apparatus and device manufacturing method
    Patent number: 9134622
    Abstract: An immersion lithographic projection apparatus is disclosed in which liquid is provided between a projection system of the apparatus and a substrate. The use of both liquidphobic and liquidphilic layers on various elements of the apparatus is provided to help prevent formation of bubbles in the liquid and to help reduce residue on the elements after being in contact with the liquid.
    Type: Grant
    Filed: December 16, 2013
    Date of Patent: September 15, 2015
    Assignee: ASML NETHERLANDS B.V.
    Inventors: Bob Streefkerk, Johannes Jacobus Matheus Baselmans, Richard Joseph Bruls, Marcel Mathijs Theodore Marie Dierichs, Sjoerd Nicolaas Lambertus Donders, Christiaan Alexander Hoogendam, Hans Jansen, Erik Roelof Loopstra, Jeroen Johannes Sophia Maria Mertens, Johannes Catharinus Hubertus Mulkens, Ronald Walther Jeanne Severijns, Sergei Shulepov, Herman Boom, Timotheus Franciscus Sengers
  • ILLUMINATION SYSTEM AND LITHOGRAPHIC APPARATUS
    Publication number: 20150241792
    Abstract: An illumination system is disclosed having a polarization member that includes first and second polarization modifiers movable into at least partial intersection with a radiation beam such that the respective polarization modifier applies a modified polarization to at least part of the beam. The illumination system further includes an array of individually controllable reflective elements positioned to receive the radiation beam after it has passed the polarization member, and a controller configured to control movement of the first and second polarization modifiers such that the first and second polarization modifiers intersect with different portions of the radiation beam.
    Type: Application
    Filed: May 11, 2015
    Publication date: August 27, 2015
    Applicants: ASML NETHERLANDS B.V., CARL ZEISS SMT GmbH
    Inventors: Heine Melle MULDER, Steven George Hansen, Johannes Catharinus Hubertus Mulkens, Markus Deguenther
  • Illumination system and lithographic apparatus
    Patent number: 9116439
    Abstract: An illumination system is disclosed having a polarization member that includes first and second polarization modifiers movable into at least partial intersection with a radiation beam such that the respective polarization modifier applies a modified polarization to at least part of the beam. The illumination system further includes an array of individually controllable reflective elements positioned to receive the radiation beam after it has passed the polarization member, and a controller configured to control movement of the first and second polarization modifiers such that the first and second polarization modifiers intersect with different portions of the radiation beam.
    Type: Grant
    Filed: March 18, 2011
    Date of Patent: August 25, 2015
    Assignees: ASML NETHERLANDS B.V., CARL ZEISS SMT GmbH
    Inventors: Heine Melle Mulder, Steven George Hansen, Johannes Catharinus Hubertus Mulkens, Markus Deguenther