Abstract: In a lithographic projection apparatus, a structure surrounds a space between the projection system and a substrate table of the lithographic projection apparatus. A gas seal is formed between said structure and the surface of said substrate to contain liquid in the space.

Abstract: A lithographic projection apparatus includes a support structure configured to hold a patterning device. The patterning device is configured to pattern a beam of radiation according to a desired pattern. The lithographic apparatus further includes a substrate table configured to hold a substrate. The substrate has a surface coated at least partially with a layer of radiation sensitive material. The lithographic apparatus also includes a projection system configured to project the patterned beam onto a target portion of the substrate, and a liquid supply system. The liquid supply system is configured to supply a prewetting liquid on top of the layer of radiation sensitive material to prewet the substrate, and is configured to supply an immersion liquid in a space between the prewet substrate and at least a portion of the projection system.

Abstract: A lithographic projection apparatus is disclosed in which a space between the projection system and the substrate is filled with a liquid. An edge seal member at least partly surrounds the substrate or other object on a substrate table to prevent liquid loss when edge portions of the substrate or other object are, for example, imaged or illuminated.

Abstract: A substrate is provided with a coating of material which is substantially transparent to the wavelength of the projection beam. The coating may be thicker than the wavelength of the projection beam and have a refractive index of the coating such that the wavelength of the projection beam is shortened as it passes through it. This allows the imaging of smaller features on the substrate. Alternatively, the coating may be used with a liquid supply system and act to keep bubbles away from a radiation sensitive layer of the substrate.

Abstract: A map of the surface of a substrate is generated at a measurement station. The substrate is then moved to where a space between a projection lens and the substrate is filled with a liquid. The substrate is then aligned using, for example, a transmission image sensor and, using the previous mapping, the substrate can be accurately exposed. Thus the mapping does not take place in a liquid environment.

Abstract: A lens element comprises a first face and a second face, where the first face comprises a plurality of concave shaped lens parts. Each concave shaped lens part is arranged to focus a portion of a beam incident on the second face via a liquid on a single flat surface.

Abstract: In a lithographic projection apparatus, a structure surrounds a space between the projection system and a substrate table of the lithographic projection apparatus. Gas is used between the structure and the surface of the substrate to contain liquid in the space.

Abstract: In an embodiment, a lithographic projection apparatus has an off-axis image field and a concave refractive lens as the final element of the projection system. The concave lens can be cut-away in parts not used optically to prevent bubbles from being trapped under the lens.

Abstract: In, for example, an immersion lithography apparatus, a sensor that would normally be provided on the substrate table is replaced by a retro-reflector on the substrate table and a sensor at, for example, patterning device level. This may avoid the need to make the sensor compatible with the immersion liquid and also make incoupling of radiation easier since the numerical aperture may be less at, for example, patterning device level.

Abstract: An immersion lithographic apparatus is disclosed which includes a liquid supply system having an inlet configured to supply a liquid to a space between a projection system of the lithographic apparatus and a substrate and an outlet configured to remove at least part of the liquid, the liquid supply system configured to rotate the inlet, the outlet, or both, about an axis substantially perpendicular to an exposure plane of the substrate.

Abstract: The lithographic apparatus includes a support structure configured to hold a patterning device. The patterning device is configured to pattern a beam of radiation according to a desired pattern. The lithographic apparatus further includes a substrate table configured to hold a substrate, a projection system configured to project the patterned beam onto a target portion of the substrate, a measurement system configured to measure a parameter of (a) the substrate table, or (b) the substrate, or (c) an image projected by the projection system, or (d) any combination of (a)-(c), and a liquid supply system configured to supply a liquid to a space between the substrate and the projection system. The lithographic apparatus also includes a shield disposed in a vicinity of a portion of the measurement system and configured to shield the portion of the measurement system from the liquid.

Abstract: To compensate for birefringence of a mask in a lithographic projection apparatus, the birefringence of a mask is measured and stored as birefringence data in a data storage device. A birefringent compensation element is disposed in the optical path of the lithographic projection apparatus. Appropriate adjustments of the compensation element are determined as those optimally reducing impact of the mask birefringence on the state of polarization at substrate level.

Abstract: A lithographic apparatus is provided in which exposure is carried out by projecting through an aqueous solution of alkali metal halide(s), the solution being in contact with the substrate to be exposed.

Abstract: In a lithographic projection apparatus, a structure surrounds a space between the projection system and a substrate table of the lithographic projection apparatus. A gas seal is formed between said structure and the surface of said substrate to contain liquid in the space.

Abstract: In immersion lithography after exposure of a substrate is complete, a detector is used to detect any residual liquid remaining on the substrate and/or substrate table.

Abstract: A lithographic projection apparatus is disclosed. The apparatus includes an illumination system configured to condition a beam of radiation, and a support structure configured to support a patterning device. The patterning device serves to impart the beam of radiation with a pattern in its cross-section. The apparatus also includes a substrate table configured to hold a substrate, a projection system configured to project the patterned beam onto a target portion of the substrate, and a fluid supply system configured to provide a fluid to a volume. The volume includes at least a portion of the projection system and/or at least a portion of the illumination system. The apparatus further includes a coupling device configured to couple the fluid supply system to the substrate table, substrate, support structure, patterning device, or any combination thereof.

Abstract: Liquid is supplied to a space between the projection system and the substrate by an inlet. In an embodiment, an overflow region removes liquid above a given level. The overflow region may be arranged above the inlet and thus the liquid may be constantly refreshed and the pressure in the liquid may remain substantially constant.

Abstract: A lithographic apparatus and method, in an embodiment for immersion lithography, are disclosed with a single stage in which levelling and exposure are performed simultaneously.

Abstract: A substrate is exposed through immersion liquid supplied by a liquid supply system. Prior to being exposed, a map of the surface of the substrate is generated at a measurement station. A liquid supply system fills the space between a measurement system and the substrate so the measurement takes place through liquid.

Abstract: An immersion lithography apparatus is disclosed having a liquid supply system configured to at least partially fill a space between a final element of a projection system and a substrate table, with a first liquid, and a measurement system configured to measure a location of each of a plurality of points on the substrate, the measurement system being arranged such that measurements take place through a second liquid, the second liquid not being supplied by the liquid supply system.