Patents by Inventor Johannes Christiaan Leonardus Franken
Johannes Christiaan Leonardus Franken has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Publication number: 20220035239Abstract: A method for manufacturing a membrane assembly for EUV lithography, the method including: providing a stack including: at least one membrane layer supported by a planar substrate, wherein the planar substrate has an inner region and a border region around the inner region; and a first sacrificial layer between the planar substrate and the membrane layer; selectively removing the inner region of the planar substrate such that the membrane assembly has: a membrane formed from the at least one membrane layer, and a border holding the membrane, the border having the border region of the planar substrate and the first sacrificial layer situated between the border region and the membrane layer, wherein the selectively removing the inner region of the planar substrate includes using an etchant which has a similar etch rate for the membrane layer and its oxide and a substantially different etch rate for the first sacrificial layer.Type: ApplicationFiled: October 2, 2019Publication date: February 3, 2022Applicant: ASML NETHERLANDS B.V.Inventors: Pieter-Jan VAN ZWOL, Sander BALTUSSEN, Dennis DE GRAAF, Johannes Christiaan Leonardus FRANKEN, Adrianus Johannes Maria GIESBERS, Alexander Ludwig KLEIN, Johan Hendrik KLOOTWIJK, Peter Simon Antonius KNAPEN, Evgenia KURGANOVA, Alexey Sergeevich KUZNETSOV, Arnoud Willem NOTENBOOM, Mahdiar VALEFI, Marcus Adrianus VAN DE KERKHOF, Wilhelmus Theodorus Anthonius Johannes VAN DEN EINDEN, Ties Wouter VAN DER WOORD, Hendrikus Jan WONDERGEM, Aleksandar Nikolov ZDRAVKOV
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Patent number: 10394141Abstract: A radiation source comprising a fuel source configured to deliver fuel to a location from which the fuel emits EUV radiation. The radiation source further comprises an immobile fuel debris receiving surface provided with a plurality of grooves. The grooves have orientations which are arranged to direct the flow of liquid fuel under the influence of gravity in one or more desired directions.Type: GrantFiled: July 27, 2017Date of Patent: August 27, 2019Assignee: ASML Netherlands B.V.Inventors: Michel Riepen, Dzmitry Labetski, Wilbert Jan Mestrom, Wim Ronald Kampinga, Jan Okke Nieuwenkamp, Jacob Brinkert, Henricus Jozef Castelijns, Nicolaas Ten Kate, Hendrikus Gijsbertus Schimmel, Hans Jansen, Dennis Jozef Maria Paulussen, Brian Vernon Virgo, Reinier Theodorus Martinus Jilisen, Ramin Badie, Albert Pieter Rijpma, Johannes Christiaan Leonardus Franken, Peter Van Putten, Gerrit Van Der Straaten
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Publication number: 20170322499Abstract: A radiation source comprising a fuel source configured to deliver fuel to a location from which the fuel emits EUV radiation. The radiation source further comprises an immobile fuel debris receiving surface provided with a plurality of grooves. The grooves have orientations which are arranged to direct the flow of liquid fuel under the influence of gravity in one or more desired directions.Type: ApplicationFiled: July 27, 2017Publication date: November 9, 2017Applicant: ASML Netherlands B.V.Inventors: Michel RIEPEN, Dzmitry Labetski, Wilbert Jan Mestrom, Wim Ronald Kampinga, Jan Okke Nieuwenkamp, Jacob Brinkert, Henricus Jozef Castelijns, Nicolaas Ten Kate, Hendrikus Gijsbertus Schimmel, Hans Jansen, Dennis Jozef Maria Paulussen, Brian Vernon Virgo, Reinier Theodorus Martinus Jilisen, Ramin Badie, Albert Pieter Rijpma, Johannes Christiaan Leonardus Franken, Peter Van Putten, Gerrit Van Der Straaten
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Patent number: 9753383Abstract: A radiation source comprising a fuel source configured to deliver fuel to a location from which the fuel emits EUV radiation. The radiation source further comprises an immobile fuel debris receiving surface provided with a plurality of grooves. The grooves have orientations which are arranged to direct the flow of liquid fuel under the influence of gravity in one or more desired directions.Type: GrantFiled: June 13, 2013Date of Patent: September 5, 2017Assignee: ASML Netherlands B.V.Inventors: Michel Riepen, Dzmitry Labetski, Wilbert Jan Mestrom, Wim Ronald Kampinga, Jan Okke Nieuwenkamp, Jacob Brinkert, Henricus Jozef Castelijns, Nicolaas Ten Kate, Hendrikus Gijsbertus Schimmel, Hans Jansen, Dennis Jozef Maria Paulussen, Brian Vernon Virgo, Reinier Theodorus Martinus Jilisen, Ramin Badie, Albert Pieter Rijpma, Johannes Christiaan Leonardus Franken, Peter Van Putten, Gerrit Van Der Straaten
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Patent number: 9753372Abstract: A radiation source generates extreme ultraviolet radiation. The radiation source comprises a plasma formation site located at a position in which a fuel will be contacted by a beam of radiation to form a plasma. A receiving structure is provided to trap debris particles on its surface that are generated with the formation of the plasma. The receiving structure has a rod-shaped heater element for heating the receiving surface, the device preventing large droplets of fuel from forming on the receiving surface. Instead, the trapped fuel is melted off the receiving surface.Type: GrantFiled: June 5, 2014Date of Patent: September 5, 2017Assignee: ASML Netherlands B.V.Inventor: Johannes Christiaan Leonardus Franken
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Publication number: 20160147160Abstract: A radiation source generates extreme ultraviolet radiation. The radiation source comprises a plasma formation site located at a position in which a fuel will be contacted by a beam of radiation to form a plasma. A receiving structure is provided to trap debris particles on its surface that are generated with the formation of the plasma. The receiving structure has a rod-shaped heater element for heating the receiving surface, the device preventing large droplets of fuel from forming on the receiving surface. Instead, the trapped fuel is melted off the receiving surface.Type: ApplicationFiled: June 5, 2014Publication date: May 26, 2016Applicant: ASML Netherlands B.V.Inventor: Johannes Christiaan Leonardus FRANKEN
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Publication number: 20160041374Abstract: A radiation collector (141) comprising a plurality of reflective surfaces (400-405), wherein each of the plurality of reflective surfaces is coincident with part of one of a plurality of ellipsoids (40-45), wherein the plurality of ellipsoids have in common a first focus (12) and a second focus (16), each of the plurality of reflective surfaces coincident with a different one of the plurality of ellipsoids, wherein the plurality of reflective surfaces are configured to receive radiation originating from the first focus (12) and reflect the radiation to the second focus (16). An apparatus (820) shown in FIG.Type: ApplicationFiled: March 24, 2014Publication date: February 11, 2016Applicant: ASML Netherlands B.V.Inventors: Ivo VANDERHALLEN, Alexander Matthijs STRUYCKEN, Johannes Christiaan Leonardu FRANKEN
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Publication number: 20150338753Abstract: A radiation source comprising a fuel source configured to deliver fuel to a location from which the fuel emits EUV radiation. The radiation source further comprises an immobile fuel debris receiving surface provided with a plurality of grooves. The grooves have orientations which are arranged to direct the flow of liquid fuel under the influence of gravity in one or more desired directions.Type: ApplicationFiled: June 13, 2013Publication date: November 26, 2015Applicant: ASML Netherlands B.V.Inventors: Michel RIEPEN, Dzmitry LEBETSKI, Wilbert Jan MESTROM, Wim Ronald KAMPINGA, Jan Okke NIEUWENKAMP, Jacob BRINKERT, Henricus Jozef CASTELIJNS, Nicolaas TEN KATE, Hendrikus Gijsbertus SCHIMMEL, Hans JANSEN, Dennis Jozef Maria PAULUSSEN, Brian Vernon VIRGO, Reinier Theodorus Martinus JILISEN, Ramin BADIE, Albert Pieter RIJPMA, Johannes Christiaan Leonardus FRANKEN, Peter VAN PUTTEN, Gerrit VAN DER STRAATEN
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Patent number: 8976332Abstract: A conduit system for a lithographic apparatus is disclosed, the conduit system including a conduit configured to guide a liquid or liquid-gas mixture, and a gas injection nozzle configured to introduce a gas in the liquid or liquid-gas mixture to at least partially absorb pressure peaks or waves in the liquid or liquid-gas mixture. In an embodiment, the gas injection nozzle may be arranged in a pump of the conduit system. The pump further includes a pump inlet, a pump outlet and a pump chamber between the pump inlet and the pump outlet arranged for compression of the liquid or liquid-gas mixture.Type: GrantFiled: October 25, 2010Date of Patent: March 10, 2015Assignee: ASML Netherlands B.V.Inventors: Martinus Wilhelmus Van Den Heuvel, Johannes Christiaan Leonardus Franken, Josephus Cornelius Johannes Antonius Vugts
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Patent number: 8736806Abstract: A lithographic apparatus includes a radiation system for providing a beam of radiation from radiation emitted by a radiation source. The radiation system includes a contaminant trap for trapping material emanating from the radiation source. The rotation contaminant trap includes a multiple number of elements extending in a radial direction from a common rotation trap axis and being arranged for allowing contaminant material emanating from the radiation source to deposit during propagation of the radiation beam in the radiation system. The radiation system further includes a contaminant catch for receiving contaminant material particles from the rotation trap elements, the contaminant catch having a constitution, during operation of the radiation, for retaining said contaminant material particles.Type: GrantFiled: October 8, 2009Date of Patent: May 27, 2014Assignee: ASML Netherlands B.V.Inventors: Olav Waldemar Vladimir Frijns, Johannes Christiaan Leonardus Franken, Kurt Gielissen
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Publication number: 20110242516Abstract: A lithographic apparatus includes a radiation system for providing a beam of radiation from radiation emitted by a radiation source. The radiation system includes a contaminant trap for trapping material emanating from the radiation source. The rotation contaminant trap includes a multiple number of elements extending in a radial direction from a common rotation trap axis and being arranged for allowing contaminant material emanating from the radiation source to deposit during propagation of the radiation beam in the radiation system. The radiation system further includes a contaminant catch for receiving contaminant material particles from the rotation trap elements, the contaminant catch having a constitution, during operation of the radiation, for retaining said contaminant material particles.Type: ApplicationFiled: October 8, 2009Publication date: October 6, 2011Applicant: ASML NETHERLANDS B.V.Inventors: Olav Waldemar Vladimir Frijns, Johannes Christiaan Leonardus Franken, Kurt Gielissen
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Publication number: 20110096308Abstract: A contaminant trap apparatus arranged in a path of a radiation beam to trap contaminants emanating from a radiation source configured to produce the radiation beam is disclosed. The contaminant trap apparatus includes a rotor having a plurality of channel forming elements defining channels which are arranged substantially parallel to the direction of propagation of the radiation beam, the rotor including electrically chargeable material and arranged to be electrically charged as a result of the operation of the radiation source; and a bearing configured to rotatably hold the rotor with respect to a rotor carrying structure, wherein the apparatus is configured to (i) control or redirect an electrical discharge of the rotor, or (ii) suppress an electrical discharge of the rotor, or (iii) both (i) and (ii).Type: ApplicationFiled: January 5, 2011Publication date: April 28, 2011Applicant: ASML Netherlands B.V.Inventors: Johannes Christiaan Leonardus FRANKEN, Vadim Yevgenyevich Banine, Arnoud Cornelis Wassink
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Patent number: 7897941Abstract: A lithographic apparatus, comprising a collector being constructed to receive radiation from a radiation source and transmit radiation to an illumination system, wherein the collector is provided with at least one fluid duct, the apparatus including a temperature conditioner to thermally condition the collector utilizing the fluid duct of the collector, the temperature conditioner being configured to feed a first fluid to the fluid duct during a first period, and to feed a second fluid to the fluid duct during at least a second period.Type: GrantFiled: November 4, 2008Date of Patent: March 1, 2011Assignee: ASML Netherlands B.V.Inventors: Johannes Christiaan Leonardus Franken, Alexander Matthijs Struycken, Leon Joseph Marie Van Den Schoor
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Patent number: 7889312Abstract: A contaminant trap apparatus arranged in a path of a radiation beam to trap contaminants emanating from a radiation source configured to produce the radiation beam is disclosed. The contaminant trap apparatus includes a rotor having a plurality of channel forming elements defining channels which are arranged substantially parallel to the direction of propagation of the radiation beam, the rotor including electrically chargeable material and arranged to be electrically charged as a result of the operation of the radiation source; and a bearing configured to rotatably hold the rotor with respect to a rotor carrying structure, wherein the apparatus is configured to (i) control or redirect an electrical discharge of the rotor, or (ii) suppress an electrical discharge of the rotor, or (iii) both (i) and (ii).Type: GrantFiled: September 22, 2006Date of Patent: February 15, 2011Assignee: ASML Netherlands B.V.Inventors: Johannes Christiaan Leonardus Franken, Vadim Yevgenyevich Banine, Arnoud Cornelis Wassink
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Publication number: 20110032497Abstract: A conduit system for a lithographic apparatus is disclosed, the conduit system including a conduit configured to guide a liquid or liquid-gas mixture, and a gas injection nozzle configured to introduce a gas in the liquid or liquid-gas mixture to at least partially absorb pressure peaks or waves in the liquid or liquid-gas mixture. In an embodiment, the gas injection nozzle may be arranged in a pump of the conduit system. The pump further includes a pump inlet, a pump outlet and a pump chamber between the pump inlet and the pump outlet arranged for compression of the liquid or liquid-gas mixture.Type: ApplicationFiled: October 25, 2010Publication date: February 10, 2011Applicant: ASML Netherlands B.V.Inventors: Martinus Wilhelmus VAN DEN HEUVEL, Johannes Christiaan Leonardus Franken, Josephus Cornelius Johannes Antonius Vugts
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Patent number: 7868304Abstract: A method for removal of deposition on a radiation collector of a lithographic apparatus includes providing a gas barrier to an end of a radiation collector, thereby providing a radiation collector enclosure volume; providing a gas to the enclosure volume, the gas selected from a halogen containing gas and a hydrogen containing gas; and removing at least part of the deposition from the radiation collector. A lithographic apparatus includes a radiation collector; a circumferential hull enclosing the radiation collector; a gas barrier at an end of the radiation collector, thereby providing a radiation collector enclosure volume. The radiation collector is enclosed by the circumferential hull and the gas barrier. An inlet provides a gas to the radiation collector enclosure volume and an outlet removes a gas from the radiation collector enclosure volume.Type: GrantFiled: February 7, 2005Date of Patent: January 11, 2011Assignee: ASML Netherlands B.V.Inventors: Levinus Pieter Bakker, Vadim Yevgenyevich Banine, Johannes Hubertus Josephina Moors, Carolus Ida Maria Antonius Spee, Johannes Christiaan Leonardus Franken, Arnoud Cornelis Wassink, Paul Peter Anna Antonius Brom
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Patent number: 7863591Abstract: An optical sensor apparatus for use in an extreme ultraviolet lithographic system is disclosed. The apparatus includes an optical sensor comprising a sensor surface and a removal mechanism configured to remove debris from the sensor surface. Accordingly, dose and/or contamination measurements may be carried out conveniently for the lithographic system.Type: GrantFiled: May 13, 2009Date of Patent: January 4, 2011Assignees: ASML Netherlands B.V., Koninklijke Philips Electronics N.V.Inventors: Maarten Marinus Johannes Wilhelmus Van Herpen, Vadim Yevgenyevich Banine, Derk Jan Wilfred Klunder, Wouter Anthon Soer, Johannes Christiaan Leonardus Franken, Olav Waldemar Vladimir Frijns, Niels Machiel Driessen
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Patent number: 7843548Abstract: A conduit system for a lithographic apparatus is disclosed, the conduit system including a conduit configured to guide a liquid or liquid-gas mixture, and a gas injection nozzle configured to introduce a gas in the liquid or liquid-gas mixture to at least partially absorb pressure peaks or waves in the liquid or liquid-gas mixture. In an embodiment, the gas injection nozzle may be arranged in a pump of the conduit system. The pump further includes a pump inlet, a pump outlet and a pump chamber between the pump inlet and the pump outlet arranged for compression of the liquid or liquid-gas mixture.Type: GrantFiled: October 18, 2007Date of Patent: November 30, 2010Assignee: ASML Netherlands B.V.Inventors: Martinus Wilhelmus Van Den Heuvel, Johannes Christiaan Leonardus Franken, Josephus Cornelis Johannes Antonlus Vugts
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Patent number: 7724349Abstract: A device is arranged to measure a quantity relating to radiation. The device includes a sensor configured to measure the quantity, a screen arranged to protect the sensor from incoming particles emitted from a source configured to emit extreme ultraviolet radiation, and a mirror configured to redirect extreme ultraviolet radiation emitted by the source, past the screen, to the sensor.Type: GrantFiled: May 2, 2007Date of Patent: May 25, 2010Assignee: ASML Netherlands B.V.Inventors: Wouter Anthon Soer, Maarten Marinus Johannes Wilhelmus Van Herpen, Niels Machiel Driessen, Vadim Yevgenyevich Banine, Johannes Christiaan Leonardus Franken, Olav Waldemar Vladimir Frijns, Derek Jan Wilfred Klunder
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Publication number: 20090309048Abstract: An optical sensor apparatus for use in an extreme ultraviolet lithographic system is disclosed. The apparatus includes an optical sensor comprising a sensor surface and a removal mechanism configured to remove debris from the sensor surface. Accordingly, dose and/or contamination measurements may be carried out conveniently for the lithographic system.Type: ApplicationFiled: May 13, 2009Publication date: December 17, 2009Applicant: ASML Netherlands B.V.Inventors: Maarten Marinus Johannes Wilhelmus VAN HERPEN, Vadim Yevgenyevich Banine, Derk Jan Wilfred Klunder, Wouter Anthon Soer, Johannes Christiaan Leonardu Franken, Olav Waldemar Vladimir Frijns, Niels Machiel Driessen