Patents by Inventor Johannes Christiaan Maria Jasper
Johannes Christiaan Maria Jasper has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Patent number: 11422472Abstract: A method involving: obtaining a process model of a patterning process that includes or accounts for an average optical aberration of optical systems of a plurality of apparatuses for use with a patterning process; and applying the process model to determine an adjustment to a parameter of the patterning process to account for the average optical aberration.Type: GrantFiled: December 17, 2018Date of Patent: August 23, 2022Assignee: ASML Netherlands B.V.Inventors: Paulus Jacobus Maria Van Adrichem, Ahmad Wasiem Ibrahim El-Said, Christoph Rene Konrad Cebulla Hennerkes, Johannes Christiaan Maria Jasper
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Publication number: 20210165332Abstract: A method involving: obtaining a process model of a patterning process that includes or accounts for an average optical aberration of optical systems of a plurality of apparatuses for use with a patterning process; and applying the process model to determine an adjustment to a parameter of the patterning process to account for the average optical aberration.Type: ApplicationFiled: December 17, 2018Publication date: June 3, 2021Applicant: ASML NETHERLANDS B.V.Inventors: Paulus Jacobus Maria VAN ADRICHEM, Ahmad Wasiem Ibrahim EL-SAID, Christoph Rene Konrad Cebulla HENNERKES, Johannes Christiaan Maria JASPER
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Publication number: 20190086819Abstract: A lithographic projection apparatus is disclosed for use with an immersion liquid positioned between the projection system and a substrate. Several methods and mechanism are disclosed to protect components of the projection system, substrate table and a liquid confinement system. These include providing a protective coating on a final element of the projection system as well as providing one or more sacrificial bodies upstream of the components. A two component final optical element of CaF2 is also disclosed.Type: ApplicationFiled: November 21, 2018Publication date: March 21, 2019Applicant: ASML NETHERLANDS B.V.Inventors: Erik Roelof LOOPSTRA, Johannes Jacobus Matheus Baselmans, Marcel Mathijs Theodore Marie Dierichs, Johannes Christiaan Maria Jasper, Matthew Lipson, Hendricus Johannes Maria Meijer, Uwe Mickan, Johannes Catharinus Hubertus Mulkens, Tammo Uitterdijk
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Patent number: 10146142Abstract: A lithographic projection apparatus is disclosed for use with an immersion liquid positioned between the projection system and a substrate. Several methods and mechanism are disclosed to protect components of the projection system, substrate table and a liquid confinement system. These include providing a protective coating on a final element of the projection system as well as providing one or more sacrificial bodies upstream of the components. A two component final optical element of CaF2 is also disclosed.Type: GrantFiled: January 30, 2017Date of Patent: December 4, 2018Assignee: ASML NETHERLANDS B.V.Inventors: Erik Roelof Loopstra, Johannes Jacobus Matheus Baselmans, Marcel Mathijs Theodore Marie Dierichs, Johannes Christiaan Maria Jasper, Matthew Lipson, Hendricus Johannes Maria Meijer, Uwe Mickan, Johannes Catharinus Hubertus Mulkens, Tammo Uitterdijk
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Patent number: 9904180Abstract: A method of patterning substrates using a lithographic apparatus. The method comprising providing a beam of radiation using an illumination system, using a patterning device to impart the radiation beam with a pattern in its cross-section, and using a projection system to project the patterned radiation beam onto target portions of a lot of substrates, wherein the method further comprises performing a radiation beam aberration measurement after projecting the patterned radiation beam onto a subset of the lot of substrates, performing an adjustment of the projection system using the results of the radiation beam aberration measurement, then projecting the patterned radiation beam onto a further subset of the lot of substrates.Type: GrantFiled: August 13, 2015Date of Patent: February 27, 2018Assignee: ASML Netherlands B.V.Inventors: Johannes Jacobus Matheus Baselmans, Johannes Christiaan Maria Jasper
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Patent number: 9791787Abstract: A method of patterning substrates using a lithographic apparatus. The method comprising providing a beam of radiation using an illumination system, using a patterning device to impart the radiation beam with a pattern in its cross-section, and using a projection system to project the patterned radiation beam onto target portions of a lot of substrates, wherein the method further comprises performing a radiation beam aberration measurement after projecting the patterned radiation beam onto a subset of the lot of substrates, performing an adjustment of the projection system using the results of the radiation beam aberration measurement, then projecting the patterned radiation beam onto a further subset of the lot of substrates.Type: GrantFiled: November 6, 2015Date of Patent: October 17, 2017Assignee: ASML Netherlands B.V.Inventors: Johannes Jacobus Matheus Baselmans, Johannes Christiaan Maria Jasper
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Publication number: 20170160650Abstract: A lithographic projection apparatus is disclosed for use with an immersion liquid positioned between the projection system and a substrate. Several methods and mechanism are disclosed to protect components of the projection system, substrate table and a liquid confinement system. These include providing a protective coating on a final element of the projection system as well as providing one or more sacrificial bodies upstream of the components. A two component final optical element of CaF2 is also disclosed.Type: ApplicationFiled: January 30, 2017Publication date: June 8, 2017Applicant: ASML NETHERLANDS B.V.Inventors: Erik Roelof LOOPSTRA, Johannes Jacobus Matheus BASELMANS, Marcel Mathijs Theodore Marie DIERICHS, Johannes Christiaan Maria JASPER, Matthew LIPSON, Hendricus Johannes Maria MEIJER, Uwe MICKAN, Johannes Catharinus Hubertus MULKENS, Tammo UITTERDIJK
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Patent number: 9606448Abstract: A lithographic projection apparatus is disclosed for use with an immersion liquid positioned between the projection system and a substrate. Several methods and mechanism are disclosed to protect components of the projection system, substrate table and a liquid confinement system. These include providing a protective coating on a final element of the projection system as well as providing one or more sacrificial bodies upstream of the components. A two component final optical element of CaF2 is also disclosed.Type: GrantFiled: May 28, 2013Date of Patent: March 28, 2017Assignee: ASML NETHERLANDS B.V.Inventors: Erik Roelof Loopstra, Johannes Jacobus Matheus Baselmans, Marcel Mathijs Theodore Marie Dierichs, Johannes Christiaan Maria Jasper, Matthew Lipson, Hendricus Johannes Maria Meijer, Uwe Mickan, Johannes Catharinus Hubertus Mulkens, Tammo Uitterdijk
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Patent number: 9442388Abstract: A lithographic projection apparatus is disclosed for use with an immersion liquid positioned between the projection system and a substrate, Several methods and mechanism are disclosed to protect components of the projection system, substrate table and a liquid confinement system. These include providing a protective coating on a final element of the projection system as well as providing one or more sacrificial bodies upstream of the components. A two component final optical element of CaF2 is also disclosed.Type: GrantFiled: August 11, 2014Date of Patent: September 13, 2016Assignee: ASML NETHERLANDS B.V.Inventors: Erik Roelof Loopstra, Johannes Jacobus Matheus Baselmans, Marcel Mathijs Theodore Marie Dierichs, Johannes Christiaan Maria Jasper, Matthew Lipson, Hendricus Johannes Maria Meijer, Uwe Mickan, Johannes Catharinus Hubertus Mulkens, Tammo Uitterdijk
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Patent number: 9423701Abstract: A lithographic method of determining a sensitivity of a property of a pattern feature to change in optical aberrations of a lithographic apparatus used to provide that pattern feature. The method includes controlling a configuration of the lithographic apparatus to establish a first aberration state, forming a first image of the pattern feature with that lithographic apparatus when the lithographic apparatus is in that first aberration state, measuring a property of the image, controlling a configuration of the lithographic apparatus to establish a second, different, aberration state, forming an image of the same pattern feature with that lithographic apparatus when the lithographic apparatus is in that second aberration state, measuring a same property of the image, and using the measurements to determine the sensitivity of the property of the pattern feature to changes in the aberration state.Type: GrantFiled: April 3, 2012Date of Patent: August 23, 2016Assignee: ASML NETHERLANDS B.V.Inventors: Shaoxian Zhang, Johannes Jacobus Matheus Baselmans, Johannes Christiaan Maria Jasper
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Patent number: 9304411Abstract: A method of patterning substrates using a lithographic apparatus. The method comprising providing a beam of radiation using an illumination system, using a patterning device to impart the radiation beam with a pattern in its cross-section, and using a projection system to project the patterned radiation beam onto target portions of a lot of substrates, wherein the method further comprises performing a radiation beam aberration measurement after projecting the patterned radiation beam onto a subset of the lot of substrates, performing an adjustment of the projection system using the results of the radiation beam aberration measurement, then projecting the patterned radiation beam onto a further subset of the lot of substrates.Type: GrantFiled: February 14, 2013Date of Patent: April 5, 2016Assignee: ASML Netherlands B.V.Inventors: Johannes Jacobus Matheus Baselmans, Johannes Christiaan Maria Jasper
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Publication number: 20160062243Abstract: A method of patterning substrates using a lithographic apparatus. The method comprising providing a beam of radiation using an illumination system, using a patterning device to impart the radiation beam with a pattern in its cross-section, and using a projection system to project the patterned radiation beam onto target portions of a lot of substrates, wherein the method further comprises performing a radiation beam aberration measurement after projecting the patterned radiation beam onto a subset of the lot of substrates, performing an adjustment of the projection system using the results of the radiation beam aberration measurement, then projecting the patterned radiation beam onto a further subset of the lot of substrates.Type: ApplicationFiled: November 6, 2015Publication date: March 3, 2016Applicant: ASML Netherlands B.V.Inventors: Johannes Jacobus Matheus Baselmans, Johannes Christiaan Maria Jasper
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Publication number: 20150346606Abstract: A method of patterning substrates using a lithographic apparatus. The method comprising providing a beam of radiation using an illumination system, using a patterning device to impart the radiation beam with a pattern in its cross-section, and using a projection system to project the patterned radiation beam onto target portions of a lot of substrates, wherein the method further comprises performing a radiation beam aberration measurement after projecting the patterned radiation beam onto a subset of the lot of substrates, performing an adjustment of the projection system using the results of the radiation beam aberration measurement, then projecting the patterned radiation beam onto a further subset of the lot of substrates.Type: ApplicationFiled: August 13, 2015Publication date: December 3, 2015Applicant: ASML Netherlands B.V.Inventors: Johannes Jacobus Matheus BASELMANS, Johannes Christiaan Maria JASPER
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Publication number: 20140347642Abstract: A lithographic projection apparatus is disclosed for use with an immersion liquid positioned between the projection system and a substrate, Several methods and mechanism are disclosed to protect components of the projection system, substrate table and a liquid confinement system. These include providing a protective coating on a final element of the projection system as well as providing one or more sacrificial bodies upstream of the components. A two component final optical element of CaF2 is also disclosed.Type: ApplicationFiled: August 11, 2014Publication date: November 27, 2014Applicant: ASML NETHERLANDS B.V.Inventors: Erik Roelof LOOPSTRA, Johannes Jacobus Matheus Baselmans, Marcel Mathijs Theodore Marie Dierichs, Johannes Christiaan Maria Jasper, Matthew Lipson, Hendricus Johannes Maria Meijer, Uwe Mickan, Johannes Catharinus Hubertus Mulkens, Tammo Uitterdijk
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Patent number: 8681309Abstract: In a lithographic method, a characteristic of a projection system is measured before and after periods of heating (exposures) and cooling to provide data to calibrate a model of lens heating. The model has a part modeling the effect of cooling and a part modeling the effect of heating on the characteristic.Type: GrantFiled: December 16, 2009Date of Patent: March 25, 2014Assignee: ASML Netherlands B.V.Inventors: Johannes Jacobus Matheus Baselmans, Johannes Christiaan Maria Jasper
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Patent number: 8675169Abstract: A gas manifold to direct a gas flow between two plates of an optical component of a lithographic apparatus, the gas manifold having an inlet, a diffuser downstream of the inlet, a flow straightener downstream of the inlet, a contractor downstream of the flow straightener, and an outlet downstream of the contractor.Type: GrantFiled: October 14, 2011Date of Patent: March 18, 2014Assignee: ASML Netherlands B.V.Inventors: Frank Johannes Jacobus Van Boxtel, Marinus Johannes Maria Van Dam, Johannes Christiaan Maria Jasper, Ronald Van Der Ham, Sergei Yurievich Shulepov, Gerben Pieterse, Marco Baragona, Pieter Debrauwer, Antonius Arnoldus Henricus Van Der Steen
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Publication number: 20140071420Abstract: A lithographic projection apparatus is disclosed for use with an immersion liquid positioned between the projection system and a substrate. Several methods and mechanism are disclosed to protect components of the projection system, substrate table and a liquid confinement system. These include providing a protective coating on a final element of the projection system as well as providing one or more sacrificial bodies upstream of the components. A two component final optical element of CaF2 is also disclosed.Type: ApplicationFiled: May 28, 2013Publication date: March 13, 2014Applicant: ASML NETHERLANDS B.V.Inventors: Erik Roelof Loopstra, Johannes Jacobus Matheus Baselmans, Marcel Mathijs Theodore Marie Dierichs, Johannes Christiaan Maria Jasper, Matthew Lipson, Hendricus Johannes Maria Meijer, Uwe Mickan, Johannes Catharinus Hubertus Mulkens, Tammo Uitterdijk
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Publication number: 20130235361Abstract: A method of patterning substrates using a lithographic apparatus. The method comprising providing a beam of radiation using an illumination system, using a patterning device to impart the radiation beam with a pattern in its cross-section, and using a projection system to project the patterned radiation beam onto target portions of a lot of substrates, wherein the method further comprises performing a radiation beam aberration measurement after projecting the patterned radiation beam onto a subset of the lot of substrates, performing an adjustment of the projection system using the results of the radiation beam aberration measurement, then projecting the patterned radiation beam onto a further subset of the lot of substrates.Type: ApplicationFiled: February 14, 2013Publication date: September 12, 2013Applicant: ASML Netherlands B.V.Inventors: Johannes Jacobus Matheus BASELMANS, Johannes Christiaan Maria JASPER
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Publication number: 20120257182Abstract: A lithographic method of determining a sensitivity of a property of a pattern feature to change in optical aberrations of a lithographic apparatus used to provide that pattern feature. The method includes controlling a configuration of the lithographic apparatus to establish a first aberration state, forming a first image of the pattern feature with that lithographic apparatus when the lithographic apparatus is in that first aberration state, measuring a property of the image, controlling a configuration of the lithographic apparatus to establish a second, different, aberration state, forming an image of the same pattern feature with that lithographic apparatus when the lithographic apparatus is in that second aberration state, measuring a same property of the image, and using the measurements to determine the sensitivity of the property of the pattern feature to changes in the aberration state.Type: ApplicationFiled: April 3, 2012Publication date: October 11, 2012Applicant: ASML NETHERLANDS B.V.Inventors: Shaoxian Zhang, Johannes Jacobus Matheus Baselmans, Johannes Christiaan Maria Jasper
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Patent number: 8208123Abstract: A lithographic projection apparatus is disclosed for use with an immersion liquid positioned between the projection system and a substrate. Several methods and mechanism are disclosed to protect components of the projection system, substrate table and a liquid confinement system. These include providing a protective coating on a final element of the projection system as well as providing one or more sacrificial bodies upstream of the components. A two component final optical element of CaF2 is also disclosed.Type: GrantFiled: August 27, 2004Date of Patent: June 26, 2012Assignee: ASML Netherlands B.V.Inventors: Erik Roelof Loopstra, Johannes Jacobus Matheus Baselmans, Marcel Mathijs Theodore Marie Dierichs, Johannes Christiaan Maria Jasper, Hendricus Johannes Maria Meijer, Uwe Mickan, Johannes Catharinus Hubertus Mulkens, Matthew Lipson, Tammo Utterdijk