Patents by Inventor Johannes Christiaan Maria Jasper

Johannes Christiaan Maria Jasper has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20210165332
    Abstract: A method involving: obtaining a process model of a patterning process that includes or accounts for an average optical aberration of optical systems of a plurality of apparatuses for use with a patterning process; and applying the process model to determine an adjustment to a parameter of the patterning process to account for the average optical aberration.
    Type: Application
    Filed: December 17, 2018
    Publication date: June 3, 2021
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Paulus Jacobus Maria VAN ADRICHEM, Ahmad Wasiem Ibrahim EL-SAID, Christoph Rene Konrad Cebulla HENNERKES, Johannes Christiaan Maria JASPER
  • Publication number: 20190086819
    Abstract: A lithographic projection apparatus is disclosed for use with an immersion liquid positioned between the projection system and a substrate. Several methods and mechanism are disclosed to protect components of the projection system, substrate table and a liquid confinement system. These include providing a protective coating on a final element of the projection system as well as providing one or more sacrificial bodies upstream of the components. A two component final optical element of CaF2 is also disclosed.
    Type: Application
    Filed: November 21, 2018
    Publication date: March 21, 2019
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Erik Roelof LOOPSTRA, Johannes Jacobus Matheus Baselmans, Marcel Mathijs Theodore Marie Dierichs, Johannes Christiaan Maria Jasper, Matthew Lipson, Hendricus Johannes Maria Meijer, Uwe Mickan, Johannes Catharinus Hubertus Mulkens, Tammo Uitterdijk
  • Patent number: 10146142
    Abstract: A lithographic projection apparatus is disclosed for use with an immersion liquid positioned between the projection system and a substrate. Several methods and mechanism are disclosed to protect components of the projection system, substrate table and a liquid confinement system. These include providing a protective coating on a final element of the projection system as well as providing one or more sacrificial bodies upstream of the components. A two component final optical element of CaF2 is also disclosed.
    Type: Grant
    Filed: January 30, 2017
    Date of Patent: December 4, 2018
    Assignee: ASML NETHERLANDS B.V.
    Inventors: Erik Roelof Loopstra, Johannes Jacobus Matheus Baselmans, Marcel Mathijs Theodore Marie Dierichs, Johannes Christiaan Maria Jasper, Matthew Lipson, Hendricus Johannes Maria Meijer, Uwe Mickan, Johannes Catharinus Hubertus Mulkens, Tammo Uitterdijk
  • Patent number: 9904180
    Abstract: A method of patterning substrates using a lithographic apparatus. The method comprising providing a beam of radiation using an illumination system, using a patterning device to impart the radiation beam with a pattern in its cross-section, and using a projection system to project the patterned radiation beam onto target portions of a lot of substrates, wherein the method further comprises performing a radiation beam aberration measurement after projecting the patterned radiation beam onto a subset of the lot of substrates, performing an adjustment of the projection system using the results of the radiation beam aberration measurement, then projecting the patterned radiation beam onto a further subset of the lot of substrates.
    Type: Grant
    Filed: August 13, 2015
    Date of Patent: February 27, 2018
    Assignee: ASML Netherlands B.V.
    Inventors: Johannes Jacobus Matheus Baselmans, Johannes Christiaan Maria Jasper
  • Patent number: 9791787
    Abstract: A method of patterning substrates using a lithographic apparatus. The method comprising providing a beam of radiation using an illumination system, using a patterning device to impart the radiation beam with a pattern in its cross-section, and using a projection system to project the patterned radiation beam onto target portions of a lot of substrates, wherein the method further comprises performing a radiation beam aberration measurement after projecting the patterned radiation beam onto a subset of the lot of substrates, performing an adjustment of the projection system using the results of the radiation beam aberration measurement, then projecting the patterned radiation beam onto a further subset of the lot of substrates.
    Type: Grant
    Filed: November 6, 2015
    Date of Patent: October 17, 2017
    Assignee: ASML Netherlands B.V.
    Inventors: Johannes Jacobus Matheus Baselmans, Johannes Christiaan Maria Jasper
  • Publication number: 20170160650
    Abstract: A lithographic projection apparatus is disclosed for use with an immersion liquid positioned between the projection system and a substrate. Several methods and mechanism are disclosed to protect components of the projection system, substrate table and a liquid confinement system. These include providing a protective coating on a final element of the projection system as well as providing one or more sacrificial bodies upstream of the components. A two component final optical element of CaF2 is also disclosed.
    Type: Application
    Filed: January 30, 2017
    Publication date: June 8, 2017
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Erik Roelof LOOPSTRA, Johannes Jacobus Matheus BASELMANS, Marcel Mathijs Theodore Marie DIERICHS, Johannes Christiaan Maria JASPER, Matthew LIPSON, Hendricus Johannes Maria MEIJER, Uwe MICKAN, Johannes Catharinus Hubertus MULKENS, Tammo UITTERDIJK
  • Patent number: 9606448
    Abstract: A lithographic projection apparatus is disclosed for use with an immersion liquid positioned between the projection system and a substrate. Several methods and mechanism are disclosed to protect components of the projection system, substrate table and a liquid confinement system. These include providing a protective coating on a final element of the projection system as well as providing one or more sacrificial bodies upstream of the components. A two component final optical element of CaF2 is also disclosed.
    Type: Grant
    Filed: May 28, 2013
    Date of Patent: March 28, 2017
    Assignee: ASML NETHERLANDS B.V.
    Inventors: Erik Roelof Loopstra, Johannes Jacobus Matheus Baselmans, Marcel Mathijs Theodore Marie Dierichs, Johannes Christiaan Maria Jasper, Matthew Lipson, Hendricus Johannes Maria Meijer, Uwe Mickan, Johannes Catharinus Hubertus Mulkens, Tammo Uitterdijk
  • Patent number: 9442388
    Abstract: A lithographic projection apparatus is disclosed for use with an immersion liquid positioned between the projection system and a substrate, Several methods and mechanism are disclosed to protect components of the projection system, substrate table and a liquid confinement system. These include providing a protective coating on a final element of the projection system as well as providing one or more sacrificial bodies upstream of the components. A two component final optical element of CaF2 is also disclosed.
    Type: Grant
    Filed: August 11, 2014
    Date of Patent: September 13, 2016
    Assignee: ASML NETHERLANDS B.V.
    Inventors: Erik Roelof Loopstra, Johannes Jacobus Matheus Baselmans, Marcel Mathijs Theodore Marie Dierichs, Johannes Christiaan Maria Jasper, Matthew Lipson, Hendricus Johannes Maria Meijer, Uwe Mickan, Johannes Catharinus Hubertus Mulkens, Tammo Uitterdijk
  • Patent number: 9423701
    Abstract: A lithographic method of determining a sensitivity of a property of a pattern feature to change in optical aberrations of a lithographic apparatus used to provide that pattern feature. The method includes controlling a configuration of the lithographic apparatus to establish a first aberration state, forming a first image of the pattern feature with that lithographic apparatus when the lithographic apparatus is in that first aberration state, measuring a property of the image, controlling a configuration of the lithographic apparatus to establish a second, different, aberration state, forming an image of the same pattern feature with that lithographic apparatus when the lithographic apparatus is in that second aberration state, measuring a same property of the image, and using the measurements to determine the sensitivity of the property of the pattern feature to changes in the aberration state.
    Type: Grant
    Filed: April 3, 2012
    Date of Patent: August 23, 2016
    Assignee: ASML NETHERLANDS B.V.
    Inventors: Shaoxian Zhang, Johannes Jacobus Matheus Baselmans, Johannes Christiaan Maria Jasper
  • Patent number: 9304411
    Abstract: A method of patterning substrates using a lithographic apparatus. The method comprising providing a beam of radiation using an illumination system, using a patterning device to impart the radiation beam with a pattern in its cross-section, and using a projection system to project the patterned radiation beam onto target portions of a lot of substrates, wherein the method further comprises performing a radiation beam aberration measurement after projecting the patterned radiation beam onto a subset of the lot of substrates, performing an adjustment of the projection system using the results of the radiation beam aberration measurement, then projecting the patterned radiation beam onto a further subset of the lot of substrates.
    Type: Grant
    Filed: February 14, 2013
    Date of Patent: April 5, 2016
    Assignee: ASML Netherlands B.V.
    Inventors: Johannes Jacobus Matheus Baselmans, Johannes Christiaan Maria Jasper
  • Publication number: 20160062243
    Abstract: A method of patterning substrates using a lithographic apparatus. The method comprising providing a beam of radiation using an illumination system, using a patterning device to impart the radiation beam with a pattern in its cross-section, and using a projection system to project the patterned radiation beam onto target portions of a lot of substrates, wherein the method further comprises performing a radiation beam aberration measurement after projecting the patterned radiation beam onto a subset of the lot of substrates, performing an adjustment of the projection system using the results of the radiation beam aberration measurement, then projecting the patterned radiation beam onto a further subset of the lot of substrates.
    Type: Application
    Filed: November 6, 2015
    Publication date: March 3, 2016
    Applicant: ASML Netherlands B.V.
    Inventors: Johannes Jacobus Matheus Baselmans, Johannes Christiaan Maria Jasper
  • Publication number: 20150346606
    Abstract: A method of patterning substrates using a lithographic apparatus. The method comprising providing a beam of radiation using an illumination system, using a patterning device to impart the radiation beam with a pattern in its cross-section, and using a projection system to project the patterned radiation beam onto target portions of a lot of substrates, wherein the method further comprises performing a radiation beam aberration measurement after projecting the patterned radiation beam onto a subset of the lot of substrates, performing an adjustment of the projection system using the results of the radiation beam aberration measurement, then projecting the patterned radiation beam onto a further subset of the lot of substrates.
    Type: Application
    Filed: August 13, 2015
    Publication date: December 3, 2015
    Applicant: ASML Netherlands B.V.
    Inventors: Johannes Jacobus Matheus BASELMANS, Johannes Christiaan Maria JASPER
  • Publication number: 20140347642
    Abstract: A lithographic projection apparatus is disclosed for use with an immersion liquid positioned between the projection system and a substrate, Several methods and mechanism are disclosed to protect components of the projection system, substrate table and a liquid confinement system. These include providing a protective coating on a final element of the projection system as well as providing one or more sacrificial bodies upstream of the components. A two component final optical element of CaF2 is also disclosed.
    Type: Application
    Filed: August 11, 2014
    Publication date: November 27, 2014
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Erik Roelof LOOPSTRA, Johannes Jacobus Matheus Baselmans, Marcel Mathijs Theodore Marie Dierichs, Johannes Christiaan Maria Jasper, Matthew Lipson, Hendricus Johannes Maria Meijer, Uwe Mickan, Johannes Catharinus Hubertus Mulkens, Tammo Uitterdijk
  • Patent number: 8681309
    Abstract: In a lithographic method, a characteristic of a projection system is measured before and after periods of heating (exposures) and cooling to provide data to calibrate a model of lens heating. The model has a part modeling the effect of cooling and a part modeling the effect of heating on the characteristic.
    Type: Grant
    Filed: December 16, 2009
    Date of Patent: March 25, 2014
    Assignee: ASML Netherlands B.V.
    Inventors: Johannes Jacobus Matheus Baselmans, Johannes Christiaan Maria Jasper
  • Patent number: 8675169
    Abstract: A gas manifold to direct a gas flow between two plates of an optical component of a lithographic apparatus, the gas manifold having an inlet, a diffuser downstream of the inlet, a flow straightener downstream of the inlet, a contractor downstream of the flow straightener, and an outlet downstream of the contractor.
    Type: Grant
    Filed: October 14, 2011
    Date of Patent: March 18, 2014
    Assignee: ASML Netherlands B.V.
    Inventors: Frank Johannes Jacobus Van Boxtel, Marinus Johannes Maria Van Dam, Johannes Christiaan Maria Jasper, Ronald Van Der Ham, Sergei Yurievich Shulepov, Gerben Pieterse, Marco Baragona, Pieter Debrauwer, Antonius Arnoldus Henricus Van Der Steen
  • Publication number: 20140071420
    Abstract: A lithographic projection apparatus is disclosed for use with an immersion liquid positioned between the projection system and a substrate. Several methods and mechanism are disclosed to protect components of the projection system, substrate table and a liquid confinement system. These include providing a protective coating on a final element of the projection system as well as providing one or more sacrificial bodies upstream of the components. A two component final optical element of CaF2 is also disclosed.
    Type: Application
    Filed: May 28, 2013
    Publication date: March 13, 2014
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Erik Roelof Loopstra, Johannes Jacobus Matheus Baselmans, Marcel Mathijs Theodore Marie Dierichs, Johannes Christiaan Maria Jasper, Matthew Lipson, Hendricus Johannes Maria Meijer, Uwe Mickan, Johannes Catharinus Hubertus Mulkens, Tammo Uitterdijk
  • Publication number: 20130235361
    Abstract: A method of patterning substrates using a lithographic apparatus. The method comprising providing a beam of radiation using an illumination system, using a patterning device to impart the radiation beam with a pattern in its cross-section, and using a projection system to project the patterned radiation beam onto target portions of a lot of substrates, wherein the method further comprises performing a radiation beam aberration measurement after projecting the patterned radiation beam onto a subset of the lot of substrates, performing an adjustment of the projection system using the results of the radiation beam aberration measurement, then projecting the patterned radiation beam onto a further subset of the lot of substrates.
    Type: Application
    Filed: February 14, 2013
    Publication date: September 12, 2013
    Applicant: ASML Netherlands B.V.
    Inventors: Johannes Jacobus Matheus BASELMANS, Johannes Christiaan Maria JASPER
  • Publication number: 20120257182
    Abstract: A lithographic method of determining a sensitivity of a property of a pattern feature to change in optical aberrations of a lithographic apparatus used to provide that pattern feature. The method includes controlling a configuration of the lithographic apparatus to establish a first aberration state, forming a first image of the pattern feature with that lithographic apparatus when the lithographic apparatus is in that first aberration state, measuring a property of the image, controlling a configuration of the lithographic apparatus to establish a second, different, aberration state, forming an image of the same pattern feature with that lithographic apparatus when the lithographic apparatus is in that second aberration state, measuring a same property of the image, and using the measurements to determine the sensitivity of the property of the pattern feature to changes in the aberration state.
    Type: Application
    Filed: April 3, 2012
    Publication date: October 11, 2012
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Shaoxian Zhang, Johannes Jacobus Matheus Baselmans, Johannes Christiaan Maria Jasper
  • Patent number: 8208123
    Abstract: A lithographic projection apparatus is disclosed for use with an immersion liquid positioned between the projection system and a substrate. Several methods and mechanism are disclosed to protect components of the projection system, substrate table and a liquid confinement system. These include providing a protective coating on a final element of the projection system as well as providing one or more sacrificial bodies upstream of the components. A two component final optical element of CaF2 is also disclosed.
    Type: Grant
    Filed: August 27, 2004
    Date of Patent: June 26, 2012
    Assignee: ASML Netherlands B.V.
    Inventors: Erik Roelof Loopstra, Johannes Jacobus Matheus Baselmans, Marcel Mathijs Theodore Marie Dierichs, Johannes Christiaan Maria Jasper, Hendricus Johannes Maria Meijer, Uwe Mickan, Johannes Catharinus Hubertus Mulkens, Matthew Lipson, Tammo Utterdijk
  • Publication number: 20120092631
    Abstract: A gas manifold to direct a gas flow between two plates of an optical component of a lithographic apparatus, the gas manifold having an inlet, a diffuser downstream of the inlet, a flow straightener downstream of the inlet, a contractor downstream of the flow straightener, and an outlet downstream of the contractor.
    Type: Application
    Filed: October 14, 2011
    Publication date: April 19, 2012
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Frank Johannes Jacobus VAN BOXTEL, Marinus Johannes Maria Van Dam, Johannes Christiaan Maria Jasper, Ronald Van Der Ham, Sergei Yurievich Shulepov, Gerben Pieterse, Marco Baragona, Pieter Debrauwer, Antonius Arnoldus Henricus Van Der Steen