Abstract: The invention describes a composite material for heat storage comprising a thermochemical material (TCM) encapsulated in a water vapour permeable polymeric material. The thermochemical material preferably comprises at least one salt, at least one salt hydrate or a mixture of these, wherein the salt is preferably capable of binding water in an exothermic reaction, such as calcium chloride. Encapsulation in a water vapour permeable polymeric material results in an improved stability, cyclability of the thermochemical material, a reduced regeneration temperature and reduced corrosion of the environment. The composite according to the invention is particularly suitable for energy storage, preferably in the field of building and construction, and more preferably in the seasonal storage of solar energy.

Abstract: The invention describes a composite material for heat storage comprising a thermochemical material (TCM) encapsulated in a water vapour permeable polymeric material. The thermochemical material preferably comprises at least one salt, at least one salt hydrate or a mixture of these, wherein the salt is preferably capable of binding water in an exothermic reaction, such as calcium chloride. Encapsulation in a water vapour permeable polymeric material results in an improved stability, cyclability of the thermochemical material, a reduced regeneration temperature and reduced corrosion of the environment. The composite according to the invention is particularly suitable for energy storage, preferably in the field of building and construction, and more preferably in the seasonal storage of solar energy.

Abstract: The present invention discloses a closed system for thermochemical storage comprising at least one water condenser and at least two thermochemical modules, wherein a first thermochemical module comprises a first thermochemical material and a second thermochemical module comprises a second thermochemical material, and wherein the at least one water condenser and the thermochemical modules are connected so that water vapor can be exchanged individually between any two selected from the list consisting of the at least one water condenser and the at least two thermochemical modules. A method for desorption in the system according to the invention is also described. In this method, the first thermochemical module is used as a condenser to dry the second thermochemical module.

Abstract: The invention describes a composite material for heat storage comprising a thermochemical material (TCM) encapsulated in a water vapor permeable polymeric material. The thermochemical material preferably comprises at least one salt, at least one salt hydrate or a mixture of these, wherein the salt is preferably capable of binding water in an exothermic reaction, such as calcium chloride. Encapsulation in a water vapor permeable polymeric material results in an improved stability, cyclability of the thermochemical material, a reduced regeneration temperature and reduced corrosion of the environment. The composite according to the invention is particularly suitable for energy storage, preferably in the field of building and construction, and more preferably in the seasonal storage of solar energy.

Abstract: The present invention discloses a closed system for thermochemical storage comprising at least one water condenser and at least two thermochemical modules, wherein a first thermochemical module comprises a first thermochemical material and a second thermochemical module comprises a second thermochemical material, and wherein the at least one water condenser and the thermochemical modules are connected so that water vapour can be exchanged individually between any two selected from the list consisting of the at least one water condenser and the at least two thermochemical modules. A method for desorption in the system according to the invention is also described. In this method, the first thermochemical module is used as a condenser to dry the second thermochemical module.

Abstract: A maskless lithography system for transferring a pattern onto the surface of a target. At least one beam generator for generating a plurality of beamlets. A plurality of modulators modulate the magnitude of a beamlet, and a control unit controls of the modulators. The control unit generates and delivers pattern data to the modulators for controlling the magnitude of each individual beamlet. The control unit includes at least one data storage for storing the pattern data, at least one readout unit for reading out the data from the data storage, at least one data converter for converting the data that is read out from the data storage into at least one modulated light beam, and at least one optical transmitter for transmitting the at least one modulated light beam to the modulation modulators.

Abstract: A maskless lithography system for transferring a pattern onto the surface of a target. At least one beam generator for generating a plurality of beamlets. A plurality of modulators modulate the magnitude of a beamlet, and a control unit controls of the modulators. The control unit generates and delivers pattern data to the modulators for controlling the magnitude of each individual beamlet. The control unit includes at least one data storage for storing the pattern data, at least one readout unit for reading out the data from the data storage, at least one data converter for converting the data that is read out from the data storage into at least one modulated light beam, and at least one optical transmitter for transmitting the at least one modulated light beam to the modulation modulators.

Abstract: A maskless lithography system for transferring a pattern onto the surface of a target. At least one beam generator for generating a plurality of beamlets. A plurality of modulators modulate the magnitude of a beamlet, and a control unit controls of the modulators. The control unit generates and delivers pattern data to the modulators for controlling the magnitude of each individual beamlet. The control unit includes at least one data storage for storing the pattern data, at least one readout unit for reading out the data from the data storage, at least one data converter for converting the data that is read out from the data storage into at least one modulated light beam, and at least one optical transmitter for transmitting the at least one modulated light beam to the modulation modulators.

Abstract: A maskless lithography system for transferring a pattern onto the surface of a target. At least one beam generator for generating a plurality of beamlets. A plurality of modulators modulate the magnitude of a beamlet, and a control unit controls of the modulators. The control unit generates and delivers pattern data to the modulators for controlling the magnitude of each individual beamlet. The control unit includes at least one data storage for storing the pattern data, at least one readout unit for reading out the data from the data storage, at least one data converter for converting the data that is read out from the data storage into at least one modulated light beam, and at least one optical transmitter for transmitting the at least one modulated light beam to the modulation modulators.

Abstract: A maskless lithography system for transferring a pattern onto the surface of a target. At least one beam generator for generating a plurality of beamlets. A plurality of modulators modulate the magnitude of a beamlet, and a control unit controls of the modulators. The control unit generates and delivers pattern data to the modulators for controlling the magnitude of each individual beamlet. The control unit includes at least one data storage for storing the pattern data, at least one readout unit for reading out the data from the data storage, at least one data converter for converting the data that is read out from the data storage into at least one modulated light beam, and at least one optical transmitter for transmitting the at least one modulated light beam to the modulation modulators.

Abstract: A maskless lithography system for transferring a pattern onto the surface of a target. At least one beam generator for generating a plurality of beamlets. A plurality of modulators modulate the magnitude of a beamlet, and a control unit controls of the modulators. The control unit generates and delivers pattern data to the modulators for controlling the magnitude of each individual beamlet. The control unit includes at least one data storage for storing the pattern data, at least one readout unit for reading out the data from the data storage, at least one data converter for converting the data that is read out from the data storage into at least one modulated light beam, and at least one optical transmitter for transmitting the at least one modulated light beam to the modulation modulators.

Abstract: A maskless lithography system for transferring a pattern onto the surface of a target. At least one beam generator generates a plurality of beamlets. A plurality of modulators modulate the magnitude of a beamlet, and a control unit controls each of the modulators. The control unit generates and delivers pattern data to the modulators for controlling the magnitude of each individual beamlet. The control unit includes at least one data storage for storing the pattern data, at least one readout unit for reading out the data from the data storage, at least one data converter for converting the data that is read out from the data storage into at least one modulated light beam, and at least one optical transmitter for transmitting the at least one modulated light beam to the modulation modulators.

Abstract: The invention relates to a modulator for modulating the magnitude of a beamlet in a multi-beamlet lithography system, said modulator comprising at least one means for influencing the direction of a beamlet, a light sensitive element for receiving light from a modulated light beam and converting said light into a signal, and discretizing means, coupling to said light sensitive element and to at least one of means for influencing, for converting said signal received from said light sensitive element into a discrete signal having discrete values selected from a set of predefined discrete values and providing said discrete signal to said means for influencing.

Abstract: A maskless lithography system for transferring a pattern onto the surface of a target. At least one beam generator for generating a plurality of beamlets. A plurality of modulators modulate the magnitude of a beamlet, and a control unit controls of the modulators. The control unit generates and delivers pattern data to the modulators for controlling the magnitude of each individual beamlet. The control unit includes at least one data storage for storing the pattern data, at least one readout unit for reading out the data from the data storage, at least one data converter for converting the data that is read out from the data storage into at least one modulated light beam, and at least one optical transmitter for transmitting the at least one modulated light beam to the modulation modulators.

Abstract: The invention relates to a maskless lithography system for transferring a pattern onto the surface of a target, comprising at least one beam generator for generating a plurality of beamlets, modulation means comprising a plurality of modulators for modulating the magnitude of a beamlet, and a control unit for controling each of the modulators, wherein the control unit generates and delivers pattern data to said modulation means for controlling the magnitude of each individual beamlet, the control unit comprising at least one data storage for storing the pattern data, at least one readout unit for reading out the data from the data storage, at least one data converter for converting the data that is read out from the data storage into at least one modulated light beam, and at least one optical transmitter for transmitting said at least one modulated light beam to said modulation means.