Abstract: A device for continuously monitoring one or more indicators relating to the health or comfort of a person 12 includes one or more sensing means for measuring a value of one or more desired indicators and a communicating means 13 communicating an alarm signal when the measured value is above or below a predetermined value or range of values range, wherein the device 10 is adapted to be attached to an item of clothing 14 of the person 12.

Abstract: A device for continuously monitoring one or more indicators relating to the health or comfort of a person 12 includes one or more sensing means for measuring a value of one or more desired indicators and a communicating means 13 communicating an alarm signal when the measured value is above or below a predetermined value or range of values range, wherein the device 10 is adapted to be attached to an item of clothing 14 of the person 12.

Abstract: A device for continuously monitoring one or more indicators relating to the health or comfort of a person 12 includes one or more sensing means for measuring a value of one or more desired indicators and a communicating means 13 communicating an alarm signal when the measured value is above or below a predetermined value or range of values range, wherein the device 10 is adapted to be attached to an item of clothing 14 of the person 12.

Abstract: A multiple-die mask pattern is arranged with dies having the same pattern in mutually opposite orientations. The method for arranging the dies includes analyzing the pattern of a single die to identify a pattern characteristic property which is non uniformly distributed over the area of the die. If the distribution is found to be asymmetric, a line separating the die area into two half-die areas is defined with respect to which the asymmetry is apparent. Half-die areas of different dies with the same pattern characteristic property are grouped together in the mask pattern. The resulting enhanced symmetry of the distribution of the pattern characteristic property over the mask area increases lithographic processability and thereby improves die yield.

Abstract: A lithographic apparatus wherein a dipole illumination mode used for printing a line pattern, is arranged to provide quadrupole illumination. Radiation emanating from the two additional poles and passing the mask pattern without being affected by diffraction is prevented from reaching the wafer by a radiation blocking aperture disposed in the projection system. Astigmatism aberration due to lens heating associated with the dipole illumination mode is reduced by lens heating associated with the additional poles of the quadrupole illumination mode.

Abstract: A method for improving the uniformity of a lithographic process. In one aspect, the probability density function of a first and second lithographic apparatus are matched by providing a continuous z-motion to a stage in the first lithographic apparatus during substrate exposure. Preferably, the z-motion is characterized by a normally distributed function, wherein the effective probability density function of the first apparatus is substantially similar to the probability density function of the second apparatus.

Abstract: A lithographic apparatus includes an illuminator configured to provide a projection beam of radiation and a polarization controller configured to control an intensity of a preferred state of polarization of the projection beam. The lithographic apparatus further includes a support configured to hold a patterning device. The patterning device configured to pattern the projection beam according to a desired pattern. The apparatus also includes a substrate table configured to hold a substrate, and a projection system configured to project the patterned beam onto a target portion of the substrate to form a patterned image on the substrate.

Abstract: A CD-pitch dependency for a lithographic pattern printing process is related to the spectral intensity distribution of radiation used for projecting the pattern. A CD-pitch dependency can vary from one system to another. This can result in an iso-dense bias mismatch between systems. The invention addresses this problem by providing a lithographic apparatus including an illumination system for providing a projection beam of radiation, a projection system for projecting a patterned beam onto a target portion of a substrate, and a substrate table for holding the substrate, with a controller to provide an adjustment of the spectral distribution of radiant intensity of the projection beam. The adjustment of the spectral intensity distribution is based on data relating to an iso dense bias, and comprises a broadening of the spectral bandwidth or a change of shape of the spectral intensity distribution.

Abstract: A method of inhibiting erosion of an interior surface of a process vessel by solid objects carried in a fluid passing over the interior surface includes providing at least one formation at or in close proximity to the interior surface to interfere with the flow of the fluid over the interior surface, and to interfere with the movement of the solid objects by the fluid. The invention extends to a process vessel (10) which includes a body (16) defining an interior vessel surface (20), a catalyst bed (12) in the body (16), retaining means (22) on the catalyst bed for retaining the catalyst bed in position, and at least one formation (26) at or in close proximity to the interior vessel surface above the retaining means for interfering with fluid flow above the retaining means.