Patents by Inventor Johannes Fegerl

Johannes Fegerl has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Ion source
    Patent number: 5317161
    Abstract: In addition to the three electrodes of a unipotential lens following a plasma chamber, an ion source for ion beam lithography or ion beam semiconductor or the like has a fourth electrode which is at the same potential as the second electrode and at a potential lower than the potential of the first and third electrodes The result is improved resolution.
    Type: Grant
    Filed: May 21, 1992
    Date of Patent: May 31, 1994
    Assignee: IMS Ionen Mikrofabrikations Systeme Gesellschaft m.b.H.
    Inventors: Alfred Chalupka, Gertraud Lammer, Gerhard Stengl, Peter Wolf, Johannes Fegerl