Patents by Inventor Johannes Franssen

Johannes Franssen has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20060072108
    Abstract: To enable differentiation between a particle and a ghost particle, a detector system resolves radiation from a ghost particle from radiation from an actual particle. The detector system outputs at least two detector signals corresponding to intensities of radiation being incident on different parts of the detector system or the detector system outputs at least two detector signals corresponding to intensities of radiation with different wavelengths being incident on the detector system. If radiation is received from a ghost particle, not each of the at least two detector signals has a level above a predetermined threshold level, whereas radiation received from a particle results in the signals having substantially a same level above a threshold level.
    Type: Application
    Filed: October 4, 2005
    Publication date: April 6, 2006
    Applicant: ASML Nethderlands B.V.
    Inventors: Johannes Onvlee, Raimond Visser, Peter Greve, Johannes Franssen, Erwin Verhagen
  • Publication number: 20050281638
    Abstract: A robot arm is presented, which inserts and removes an object from a conditioned environment using a carrier connected to the robot arm. The robot arm is positioned in a conditionable vessel, a wall of which vessel may deform when the interior is conditioned. Since the trajectory of the robot arm needs to be accurate, the robot arm is flexibly coupled to the vessel wall such that an orientation of the robot arm is independent from an orientation of the vessel wall. Further, a docking system is disclosed for use in a device comprising a robot arm having a carrier connected thereto.
    Type: Application
    Filed: May 24, 2004
    Publication date: December 22, 2005
    Applicant: ASML Netherlands B.V.
    Inventors: Leo Kuipers, Johannes Franssen
  • Publication number: 20050054217
    Abstract: A load lock for a lithographic apparatus is arranged to transfer an object, like a substrate, into and from the lithographic apparatus. The load lock outer wall defining at least part of a load lock volume accommodating a support unit for supporting the object when in the load lock. The load lock also has a temperature conditioned structure to control the temperature of the object to a desired temperature at least before the object is transferred from the load lock towards the lithographic projection apparatus.
    Type: Application
    Filed: March 11, 2004
    Publication date: March 10, 2005
    Applicant: ASML Netherlands B.V.
    Inventors: Albert Klomp, Jan Hoogkamp, Raimond Visser, Josephus Cornelius Vugts, Henricus Marie Vullings, Leo Kuipers, Johannes Franssen
  • Publication number: 20050019709
    Abstract: A method of and apparatus for maintaining a machine part arranged in an interior space of a machine, where the interior space is kept at a first pressure and is separated from an environment having a second pressure via a load lock. The method includes transporting a machine part via the load lock out of the interior space and transporting via the load lock into the interior space one of the maintained machine part and a separate replacement machine part.
    Type: Application
    Filed: March 11, 2004
    Publication date: January 27, 2005
    Applicant: ASML Netherlands B.V.
    Inventors: Pieter Van Groos, Jan Hoogkamp, Josephus Vugts, Robert Livesey, Johannes Franssen, Albert Klomp, Johannes Petrus Vermeulen, Erik Loopstra
  • Publication number: 20050002003
    Abstract: The present invention relates to a lithographic projection apparatus and a method for transferring an object via a load lock between a lithography patterning chamber and a second environment. The load lock forms an inner space that is enclosed by a wall that forms the inner space. The load lock includes a first door that faces the lithography patterning chamber and a second door that faces the second environment. The load lock is at least during part of the transfer vented with a gas that is essentially free from at least one of particles, oxygen, hydrocarbon, and H2O.
    Type: Application
    Filed: May 18, 2004
    Publication date: January 6, 2005
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Jan Hoogkamp, Albert Klomp, Johannes Franssen