Patents by Inventor Johannes G. Van Beek

Johannes G. Van Beek has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Method of manufacturing a plate of electrically insulating material having a pattern of apertures and/or cavities
    Patent number: 5833516
    Abstract: After a plate of electrically insulating, particularly hard and brittle material has been provided with a mask having a very large number of patterned apertures, it is exposed to at least one jet of abrasive powder particles, which jet is moved relative to the plate. In this way a plate is manufactured with a pattern of apertures and/or cavities which are eminently suitable for manipulating electron currents in electronic displays. Plates manufactured in this way may be used, for example, as control plates, spacer plates, or electron transport duct plates in electronic displays.
    Type: Grant
    Filed: June 20, 1996
    Date of Patent: November 10, 1998
    Assignee: U.S. Philips Corporation
    Inventors: Franciscus C. M. De Haas, Franciscus M. H. Van Laarhoven, Johannes G. Van Beek
  • Method of providing a pattern of apertures and/or cavities in a plate of non-metallic material
    Patent number: 5800231
    Abstract: A method of providing a plurality of cavities and/or apertures in a plate or layer wherein, after the plate or layer has been provided with a mask having a plurality of apertures arranged in a pattern, at least one jet of abrasive powder particles is moved relative to the plate. On its exposed surface, the mask is provided with a coating which prevents substantial mechanical stresses from being generated in the mask during the process by the jet of powder particles.
    Type: Grant
    Filed: November 12, 1996
    Date of Patent: September 1, 1998
    Assignee: U.S. Philips Corporation
    Inventors: Franciscus C.M. De Haas, Franciscus M.H. Van Laarhoven, Johannus M.E. Van Laarhoven, Henricus J. Ligthart, Petrus H.W. Swinkels, Johannes G. Van Beek
  • Display device having plate with electron guiding passages
    Patent number: 5767621
    Abstract: After a plate of electrically insulating, particularly hard and brittle material has been provided with a mask having a very large number of patterned apertures, it is exposed to at least one jet of abrasive powder particles, which jet is moved relative to the plate. In this way a plate is manufactured with a pattern of apertures and/or cavities which are eminently suitable for manipulating electron currents in electronic displays. Plates manufactured in this way may be used, for example, as control plates, spacer plates, or electron transport duct plates in electronic displays.
    Type: Grant
    Filed: April 7, 1995
    Date of Patent: June 16, 1998
    Assignee: U.S. Philips Corporation
    Inventors: Franciscus C. M. De Haas, Franciscus M. H. Van Laarhoven, Johannes G. Van Beek
  • Method of providing a pattern of apertures and/or cavities in a plate of non-metallic material
    Patent number: 5730635
    Abstract: A method of providing a plurality of cavities and/or apertures in a plate or layer wherein, after the plate or layer has been provided with a mask having a plurality of apertures arranged in a pattern, at least one jet of abrasive powder particles is moved relative to the plate. On its exposed surface, the mask is provided with a coating which prevents substantial mechanical stresses from being generated in the mask during the process by the jet of powder particles.
    Type: Grant
    Filed: July 7, 1995
    Date of Patent: March 24, 1998
    Assignee: U.S. Philips Corporation
    Inventors: Franciscus C. M. De Haas, Franciscus M. H. Van Laarhoven, Johannus M. E. Van Laarhoven, Henricus J. Ligthart, Petrus H. W. Swinkels, Johannes G. Van Beek