Patents by Inventor Johannes H. J. Moors

Johannes H. J. Moors has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Lithographic apparatus, device manufacturing method, and device manufactured thereby
    Publication number: 20040190677
    Abstract: A lithographic projection apparatus includes a radiation system for providing a projection beam of radiation having a wavelength &lgr;1 smaller than 50 nm; a support structure for supporting patterning structure, the patterning structure serving to pattern the projection beam according to a desired pattern; a substrate table for holding a substrate; and a projection system for projecting the patterned beam onto a target portion of the substrate. The apparatus further includes a radiation sensor which is located so as to be able to receive radiation out of the projection beam, said sensor comprising a radiation-sensitive material which converts incident radiation of wavelength &lgr;1 into secondary radiation; and sensing means capable of detecting said secondary radiation emerging from said layer.
    Type: Application
    Filed: April 8, 2004
    Publication date: September 30, 2004
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Jan E. Van Der Werf, Mark Kroon, Wilhelmus C. Keur, Vadim Y. Banine, Hans Van Der Laan, Johannes H.J. Moors, Erik R. Loopstra
  • Lithographic apparatus, device manufacturing method, and device manufactured thereby
    Patent number: 6721389
    Abstract: A lithographic projection apparatus includes a radiation system for providing a projection beam of radiation having a wavelength &lgr;1 smaller than 50 nm; a support structure for supporting patterning structure, the patterning structure serving to pattern the projection beam according to a desired pattern; a substrate table for holding a substrate; and a projection system for projecting the patterned beam onto a target portion of the substrate. The apparatus further includes a radiation sensor which is located so as to be able to receive radiation out of the projection beam, said sensor comprising a radiation-sensitive material which converts incident radiation of wavelength &lgr;1 into secondary radiation; and sensing means capable of detecting said secondary radiation emerging from said layer.
    Type: Grant
    Filed: August 23, 2001
    Date of Patent: April 13, 2004
    Assignee: ASML Netherlands B.V.
    Inventors: Jan E. Van Der Werf, Mark Kroon, Wilhelmus C. Keur, Vadim Y. Banine, Hans Van Der Laan, Johannes H. J. Moors, Erik R. Loopstra
  • Lithographic apparatus, device manufacturing method, and device manufactured thereby
    Publication number: 20020037461
    Abstract: A lithographic projection apparatus includes a radiation system for providing a projection beam of radiation having a wavelength &lgr;1 smaller than 50 nm; a support structure for supporting patterning structure, the patterning structure serving to pattern the projection beam according to a desired pattern; a substrate table for holding a substrate; and a projection system for projecting the patterned beam onto a target portion of the substrate. The apparatus further includes a radiation sensor which is located so as to be able to receive radiation out of the projection beam, said sensor comprising a radiation-sensitive material which converts incident radiation of wavelength &lgr;1 into secondary radiation; and sensing means capable of detecting said secondary radiation emerging from said layer.
    Type: Application
    Filed: August 23, 2001
    Publication date: March 28, 2002
    Inventors: Jan E. Van Der Werf, Mark Kroon, Wilhelmus C. Keur, Vadim Y. Banine, Hans Van Der Laan, Johannes H.J. Moors, Erik R. Loopstra