Patents by Inventor Johannes Hubertus Mulkens

Johannes Hubertus Mulkens has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Photon sieve for optical systems in micro-lithography
    Publication number: 20070194254
    Abstract: The use of photon sieves may be as a pupil defining element in an illumination system; a field of defining elements in an illumination system; a pupil lens element in a projection lens; a color correction system in the projection system; or as a transmitting diffractive element for EUV.
    Type: Application
    Filed: February 17, 2006
    Publication date: August 23, 2007
    Applicant: ASML Netherlands B.V.
    Inventor: Johannes Hubertus Mulkens
  • Lithographic apparatus and device manufacturing method
    Publication number: 20070132979
    Abstract: A lithographic projection apparatus is disclosed in which a space between the projection system and a sensor is filled with a liquid.
    Type: Application
    Filed: July 7, 2006
    Publication date: June 14, 2007
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Joeri Lof, Erik Maria Bijlaart, Roelof Aeilko Ritsema, Frank Schaik, Timotheus Sengers, Klaus Simon, Joannes De Smit, Arie Den Boef, Hans Butler, Sjoerd Lambertus Donders, Christiaan Hoogendam, Marcus Van De Kerkhof, Aleksey Kolesnychenko, Mark Kroon, Erik Loopstra, Hendricus Maria Meijer, Jeroen Sophia Maria Mertens, Johannes Hubertus Mulkens, Joost Ottens, Alexander Straaijer, Bob Streefkerk, Helmar Santen
  • Lithographic apparatus and device manufacturing method
    Publication number: 20060285097
    Abstract: To improve the resolution of lithographic apparatus, a flexible member is provided between the projection system and the substrate. The flexible member may be filled with a fluid of a known refractive index. The flexible member may be in contact with both the projection system and the substrate.
    Type: Application
    Filed: August 1, 2006
    Publication date: December 21, 2006
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Johannes Hubertus Mulkens, Jozef Benschop
  • Prewetting of substrate before immersion exposure
    Publication number: 20060121209
    Abstract: A lithographic projection apparatus includes a support structure configured to hold a patterning device. The patterning device is configured to pattern a beam of radiation according to a desired pattern. The lithographic apparatus further includes a substrate table configured to hold a substrate. The substrate has a surface coated at least partially with a layer of radiation sensitive material. The lithographic apparatus also includes a projection system configured to project the patterned beam onto a target portion of the substrate, and a liquid supply system. The liquid supply system is configured to supply a prewetting liquid on top of the layer of radiation sensitive material to prewet the substrate, and is configured to supply an immersion liquid in a space between the prewet substrate and at least a portion of the projection system.
    Type: Application
    Filed: December 7, 2004
    Publication date: June 8, 2006
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Johannes Matheus Baselmans, Sjoerd Lambertus Donders, Christiaan Hoogendam, Jeroen Sophia Maria Mertens, Johannes Hubertus Mulkens, Bob Streefkerk
  • Lithographic apparatus and device manufacturing method
    Publication number: 20050110973
    Abstract: The joint between the projection system element and its support comprises an inorganic layer or a direct bond and is thus liquid tight, which can prevent deformation by an immersion liquid. The joint can be made either warm or cold. Solders, glue, and glue protection can all be used in the formation of this joint. In an embodiment, the elements and its support are made of quartz.
    Type: Application
    Filed: November 24, 2003
    Publication date: May 26, 2005
    Applicants: ASML NETHERLANDS B.V., CARL ZEISS SMT AG
    Inventors: Bob Streefkerk, Johannes Baselmans, Paul Graupner, Jan Haisma, Nicodemus Hattu, Christiaan Hoogendam, Erik Loopstra, Johannes Hubertus Mulkens, Bernard Gellrich
  • Lithographic apparatus and device manufacturing method
    Publication number: 20050088635
    Abstract: A lithographic projection apparatus is disclosed in which a liquid confinement system, which at least partly confines liquid to a space between the projection system and the substrate, is restricted in its movement in the direction of the optical axis of the apparatus by a stopper.
    Type: Application
    Filed: September 22, 2004
    Publication date: April 28, 2005
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Christiaan Hoogendam, Erik Theodorus Bijlaart, Erik Loopstra, Johannes Hubertus Mulkens, Bob Streefkerk