Patents by Inventor Johannes Janssen

Johannes Janssen has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 11629068
    Abstract: A method for storing solar energy and generating electric power comprising the steps of utilizing a solar powered water treatment device (2) to convert non-potable water (3) into distillate (4) and concentrate (5), storing the distillate and the concentrate in a distillate storage tank (104) and a concentrate storage tank (105) respectively and feeding the distillate from the distillate storage tank and the concentrate from the concentrate storage tank to a salient gradient power device (106) to generate electric power.
    Type: Grant
    Filed: April 10, 2019
    Date of Patent: April 18, 2023
    Assignee: DESOLENATOR B.V.
    Inventors: Jiajun Cen, Wilheimus Franciscus Johannes Janssen
  • Patent number: 11235985
    Abstract: The present disclosure relates to a method and device for obtaining distillate from non-potable water. The method comprises the steps of utilizing solar power from a solar power system to produce electricity and steam, utilizing the electricity and the steam in a water treatment device to convert the non-potable water into distillate and concentrate, transporting at least a part of the distillate to consumers for use. The method and device provide multiple effect distillation (MED) combined with vapour compression (VC) being able to work 24 hours a day only on solar energy.
    Type: Grant
    Filed: February 5, 2019
    Date of Patent: February 1, 2022
    Assignee: DESOLENATOR B.V.
    Inventors: Jiajun Cen, Wilhelmus Franciscus Johannes Janssen, Leon Awerbuch
  • Patent number: 11003098
    Abstract: Tooling for a mask assembly suitable for use in a lithographic process, the mask assembly comprising a patterning device; and a pellicle frame configured to support a pellicle and mounted on the patterning device with a mount; wherein the mount provides a releasably engageable attachment between the patterning device and the pellicle frame.
    Type: Grant
    Filed: November 18, 2019
    Date of Patent: May 11, 2021
    Assignee: ASML Netherlands B.V
    Inventors: Frits Van Der Meulen, Maarten Mathijs Marinus Jansen, Jorge Manuel Azeredo Lima, Derk Servatius Gertruda Brouns, Marc Bruijn, Jeroen Dekkers, Paul Janssen, Ronald Harm Gunther Kramer, Matthias Kruizinga, Robert Gabriël Maria Lansbergen, Martinus Hendrikus Antonius Leenders, Erik Roelof Loopstra, Gerrit Van Den Bosch, Jérôme François Sylvain Virgile Van Loo, Beatrijs Louise Marie-Joseph Katrien Verbrugge, Angelo Cesar Peter De Klerk, Jacobus Maria Dings, Maurice Leonardus Johannes Janssen, Roland Jacobus Johannes Kerstens, Martinus Jozef Maria Kester, Michel Loos, Geert Middel, Silvester Matheus Reijnders, Frank Johannes Christiaan Theuerzeit, Anne Johannes Wilhelmus Van Lievenoogen
  • Patent number: 10969701
    Abstract: Tooling for a mask assembly suitable for use in a lithographic process, the mask assembly comprising a patterning device; and a pellicle frame configured to support a pellicle and mounted on the patterning device with a mount; wherein the mount provides a releasably engageable attachment between the patterning device and the pellicle frame.
    Type: Grant
    Filed: September 16, 2019
    Date of Patent: April 6, 2021
    Assignee: ASML Netherlands B.V.
    Inventors: Frits Van Der Meulen, Maarten Mathijs Marinus Jansen, Jorge Manuel Azeredo Lima, Derk Servatius Gertruda Brouns, Marc Bruijn, Jeroen Dekkers, Paul Janssen, Ronald Harm Gunther Kramer, Matthias Kruizinga, Robert Gabriël Maria Lansbergen, Martinus Hendrikus Antonius Leenders, Erik Roelof Loopstra, Gerrit Van Den Bosch, Jérôme François Sylvain Virgile Van Loo, Beatrijs Louise Marie-Joseph Katrien Verbrugge, Angelo Cesar Peter De Klerk, Jacobus Maria Dings, Maurice Leonardus Johannes Janssen, Roland Jacobus Johannes Kerstens, Martinus Jozef Maria Kester, Michel Loos, Geert Middel, Silvester Matheus Reijnders, Frank Johannes Christiaan Theuerzeit, Anne Johannes Wilhelmus Van Lievenoogen
  • Publication number: 20210071229
    Abstract: The present invention is related to a novel and direct method for measuring the fibrinogen level in a sample, which is particularly useful in emergency situations. The novel method is independent of thrombin formation and is not interfered by the presence of oral anti-coagulation drugs or other chemicals contrary to the commonly used clotting assays.
    Type: Application
    Filed: January 25, 2019
    Publication date: March 11, 2021
    Inventors: Michael Johannes JANSSEN, San PUN
  • Publication number: 20210024375
    Abstract: A method for storing solar energy and generating electric power comprising the steps of utilizing a solar powered water treatment device (2) to convert non-potable water (3) into distillate (4) and concentrate (5), storing the distillate and the concentrate in a distillate storage tank (104) and a concentrate storage tank (105) respectively and feeding the distillate from the distillate storage tank and the concentrate from the concentrate storage tank to a salient gradient power device (106) to generate electric power.
    Type: Application
    Filed: April 10, 2019
    Publication date: January 28, 2021
    Inventors: Jiajun CEN, Wilhelmus Franciscus Johannes JANSSEN
  • Publication number: 20200385287
    Abstract: The present disclosure relates to a method and device for obtaining distillate from non-potable water. The method comprises the steps of utilizing solar power from a solar power system to produce electricity and steam, utilizing the electricity and the steam in a water treatment device to convert the non-potable water into distillate and concentrate, transporting at least a part of the distillate to consumers for use. The method and device provide multiple effect distillation (MED) combined with vapour compression (VC) being able to work 24 hours a day only on solar energy.
    Type: Application
    Filed: February 5, 2019
    Publication date: December 10, 2020
    Inventors: Jiajun CEN, Wilhelmus Franciscus Johannes JANSSEN, Leon AWERBUCH
  • Patent number: 10696565
    Abstract: A method comprising the steps of flowing a flow of relatively cold fluid along at least one photovoltaic solar panel being heated by solar energy towards and into a fluid treatment device, at least heating the flow of fluid in a fluid treatment device to divide the flow of fluid into a flow of a first fluid part and a flow of a second fluid part, flowing the flows of the first fluid part and the second fluid part from the fluid treatment device along the flow of relatively cold fluid. Before entering the fluid treatment device the flow of relatively cold fluid is preheated by the relatively warm photovoltaic solar panel and the relatively warm flow of the first fluid part and the relatively warm flow of the second fluid part.
    Type: Grant
    Filed: September 17, 2013
    Date of Patent: June 30, 2020
    Assignee: DESOLENATOR B.V.
    Inventor: Wilhelmus Franciscus Johannes Janssen
  • Publication number: 20200096882
    Abstract: Tooling for a mask assembly suitable for use in a lithographic process, the mask assembly comprising a patterning device; and a pellicle frame configured to support a pellicle and mounted on the patterning device with a mount; wherein the mount provides a releasably engageable attachment between the patterning device and the pellicle frame.
    Type: Application
    Filed: November 18, 2019
    Publication date: March 26, 2020
    Applicant: ASML Netherlands B.V.
    Inventors: Frits VAN DER MEULEN, Maarten Mathijs Marinus JANSEN, Jorge Manuel AZEREDO LIMA, Derk Servatius Gertruda BROUNS, Marc BRUIJN, Jeroen DEKKERS, Paul JANSSEN, Ronald Harm Gunther KRAMER, Matthias KRUIZINGA, Robert Gabriël Maria LANSBERGEN, Martinus Hendrikus Antonius LEENDERS, Erik Roelof LOOPSTRA, Gerrit VAN DEN BOSCH, Jérôme François Sylvain Virgile VAN LOO, Beatrijs Louise Marie-Joseph Katrien VERBRUGGE, Angelo Cesar Peter DE KLERK, Jacobus Maria DINGS, Maurice Leonardus Johannes JANSSEN, Roland Jacobus Johannes KERSTENS, Martinus Jozef Maria KESTERS, Michel LOOS, Geert MIDDEL, Silvester Matheus REIJNDERS, Frank Johannes Christiaan THEUERZEIT, Anne Johannes Wilhelmus VAN LIEVENOOGEN
  • Patent number: 10539886
    Abstract: A mask assembly suitable for use in a lithographic process. The mask assembly comprises a patterning device, a sub-frame secured to the patterning device, a pellicle frame configured to support a pellicle and a mechanical attachment interface operable to allow attachment of the pellicle frame to the sub-frame and detachment of the pellicle frame from the sub-frame.
    Type: Grant
    Filed: November 16, 2015
    Date of Patent: January 21, 2020
    Assignee: ASML Netherlands B.V.
    Inventors: Frits Van Der Meulen, Maarten Mathijs Marinus Jansen, Jorge Manuel Azeredo Lima, Derk Servatius Gertruda Brouns, Marc Bruijn, Jeroen Dekkers, Paul Janssen, Ronald Harm Gunther Kramer, Matthias Kruizinga, Robert Gabriël Maria Lansbergen, Martinus Hendrikus Antonius Leenders, Erik Roelof Loopstra, Gerrit Van Den Bosch, Jérôme François Sylvain Virgile Van Loo, Beatrijs Louise Marie-Joseph Katrien Verbrugge, Angelo Cesar Peter De Klerk, Jacobus Maria Dings, Maurice Leonardus Johannes Janssen, Roland Jacobus Johannes Kerstens, Martinus Jozef Maria Kesters, Michel Loos, Geert Middel, Silvester Matheus Reijnders, Frank Johannes Christiaan Theuerzeit, Anne Johannes Wilhelmus Van Lievenoogen
  • Publication number: 20200012204
    Abstract: Tooling for a mask assembly suitable for use in a lithographic process, the mask assembly comprising a patterning device; and a pellicle frame configured to support a pellicle and mounted on the patterning device with a mount; wherein the mount provides a releasably engageable attachment between the patterning device and the pellicle frame.
    Type: Application
    Filed: September 16, 2019
    Publication date: January 9, 2020
    Applicant: ASML Netherlands B.V.
    Inventors: Frits Van Der Meulen, Maarten Mathijs Marinus Jansen, Jorge Manuel Azeredo Lima, Derk Servatius Gertruda Brouns, Marc Bruijn, Jeroen Dekkers, Paul Janssen, Ronald Harm, Gunther Kramer, Matthias Kruizinga, Robert Gabriël Maria Lansbergen, Martinus Hendrikus Antonius Leenders, Erik Roelof Loopstra, Gerrit Van Den Bosch, Jérôme François Sylvain Virgile Van Loo, Beatrijs Louise Marie-Joseph Katrien Verbrugge, Angelo Cesar Peter De Klerk, Jacobus Maria Dings, Maurice Leonardus Johannes Janssen, Roland Jacobus Johannes Kerstens, Martinus Jozef Maria Kesters, Michel Loos, Geert Middel, Silvester Matheus Reijnders, Frank Johannes Christiaan Theuerzeit, Anne Johannes Wilhelmus Van Lievenoogen
  • Publication number: 20190037704
    Abstract: A maintenance unit for an inkjet system with a print head assembly having at least one print head being an integral unit configured to eject droplets of ink fluid from nozzles arranged in a surface of the at least one print head towards a substrate includes a wiper to wipe along the surface of the at least one print head; a force actuator to apply a force to the wiper in a direction perpendicular to the surface of the at least one print head; a force measuring unit configured to determine a wiping force with which the wiper is pressed against the surface of the at least one print head; and a controller configured to control the force applied by the force actuator in dependency of an output of the force measuring unit in order to press the wiper against the surface of a print head with a predetermined wiping force.
    Type: Application
    Filed: October 4, 2018
    Publication date: January 31, 2019
    Applicant: MUTRACX INTERNATIONAL B.V.
    Inventors: Henk Jan ZWIERS, Jacobus Hendricus Johannes JANSSEN, Joost Anne VEERMAN
  • Patent number: 10123427
    Abstract: A printing process for printing an ink pattern on a substrate is provided. The ink pattern to be printed is based on an available pattern layout. The pattern layout defines a desired layout of the ink pattern to be printed. Based on the pattern layout an input image for allocating dot positions of the ink pattern is generated. The printing process includes a step of comparing a scan image with the input image to carry out a quality inspection to detect any print defects in the printed ink pattern. The printing process includes a step of providing a decision on an approval or a rejection of the printed ink pattern. In case of an approval, the substrate can be supplied to a subsequent processing station to finalise the substrate. In case of a rejection, the substrate including print defects can be recycled.
    Type: Grant
    Filed: August 15, 2017
    Date of Patent: November 6, 2018
    Assignee: MUTRACX INTERNATIONAL B.V.
    Inventors: Henk Jan Zwiers, Jacobus Hendricus Johannes Janssen, Joost Anne Veerman
  • Publication number: 20170347461
    Abstract: A printing process for printing an ink pattern on a substrate is provided. The ink pattern to be printed is based on an available pattern layout. The pattern layout defines a desired layout of the ink pattern to be printed. Based on the pattern layout an input image for allocating dot positions of the ink pattern is generated. The printing process includes a step of comparing a scan image with the input image to carry out a quality inspection to detect any print defects in the printed ink pattern. The printing process includes a step of providing a decision on an approval or a rejection of the printed ink pattern. In case of an approval, the substrate can be supplied to a subsequent processing station to finalise the substrate. In case of a rejection, the substrate including print defects can be recycled.
    Type: Application
    Filed: August 15, 2017
    Publication date: November 30, 2017
    Applicant: MUTRACX INTERNATIONAL B.V.
    Inventors: Henk Jan ZWIERS, Jacobus Hendricus Johannes JANSSEN, Joost Anne VEERMAN
  • Patent number: 9769932
    Abstract: A printing process for printing an ink pattern on a substrate is provided. The ink pattern to be printed is based on an available pattern layout. The pattern layout defines a desired layout of the ink pattern to be printed. Based on the pattern layout an input image for allocating dot positions of the ink pattern is generated. The printing process includes a step of comparing a scan image with the input image to carry out a quality inspection to detect any print defects in the printed ink pattern. The printing process includes a step of providing a decision on an approval or a rejection of the printed ink pattern. In case of an approval, the substrate can be supplied to a subsequent processing station to finalize the substrate. In case of a rejection, the substrate including print defects can be recycled.
    Type: Grant
    Filed: May 6, 2016
    Date of Patent: September 19, 2017
    Assignee: MUTRACX INTERNATIONAL B.V.
    Inventors: Henk Jan Zwiers, Jacobus Hendricus Johannes Janssen, Joost Anne Veerman
  • Publication number: 20160255727
    Abstract: A printing process for printing an ink pattern on a substrate is provided. The ink pattern to be printed is based on an available pattern layout. The pattern layout defines a desired layout of the ink pattern to be printed. Based on the pattern layout an input image for allocating dot positions of the ink pattern is generated. The printing process includes a step of comparing a scan image with the input image to carry out a quality inspection to detect any print defects in the printed ink pattern. The printing process includes a step of providing a decision on an approval or a rejection of the printed ink pattern. In case of an approval, the substrate can be supplied to a subsequent processing station to finalise the substrate. In case of a rejection, the substrate including print defects can be recycled.
    Type: Application
    Filed: May 6, 2016
    Publication date: September 1, 2016
    Applicant: MUTRACX INTERNATIONAL B.V.
    Inventors: Henk Jan ZWIERS, Jacobus Hendricus Johannes JANSSEN, Joost Anne VEERMAN
  • Patent number: 9363899
    Abstract: A printing process for printing (P) an ink pattern on a substrate is provided. The ink pattern to be printed is based on an available pattern layout (R). The pattern layout defines a desired layout of the ink pattern to be printed. Based on the pattern layout an input image (rii) for allocating dot positions of the ink pattern is generated. The printing process comprises a step of comparing a scan (S) image (rsi) with the input image to carry out a quality inspection (Q) to detect any print defects in the printed ink pattern. The printing process comprises a step of providing a decision (os) on an approval or a rejection of the printed ink pattern. In case of an approval, the substrate can be supplied to a subsequent processing station (E) to finalize the substrate. In case of a rejection, the substrate including print defects can be recycled (D).
    Type: Grant
    Filed: December 28, 2012
    Date of Patent: June 7, 2016
    Assignee: MUTRACX INTERNATIONAL B.V.
    Inventors: Henk Jan Zwiers, Jacobus Hendricus Johannes Janssen, Joost Anne Veerman
  • Patent number: 9267794
    Abstract: A method of determining a target spatial coordinate using an apparatus comprising a movable hand-held probe, having a body and a pointing element for pointing the target spatial coordinate, and a portable base unit provided with line-of-sight distance coupling means, wherein the hand-held probe is coupled to the base unit by said line-of-sight distance coupling means, coupled to the body at an attachment point, and wherein the base unit is provided with sensors providing measuring signals for measuring length or a change in length of the line-of-sight distance coupling means and rotation of said line-of-sight distance coupling means in at least one degree of freedom. Computer-controlled processing means are arranged for processing measuring signals. The method further comprising retrieving measuring signals wherein the target spatial coordinate is appointed from different orientations of the hand-held probe, and determining the target spatial coordinate from the measuring signals.
    Type: Grant
    Filed: April 10, 2014
    Date of Patent: February 23, 2016
    Assignee: Holding Prodim Systems B.V.
    Inventors: Rene Teune, Antonius Johannes Janssen
  • Patent number: 9212889
    Abstract: An apparatus for pointing spatial coordinates, comprising a movable hand-held probe, having a pointing tip, and a portable base unit provided with a rotatably supported elongated arm, wherein the hand-held probe connects to the portable base unit by means of a cord or a wire via the elongated arm and wherein the base unit is provided with sensors for measuring length or a change in length of the cord or the wire and rotation of the arm in at least one degree of freedom, and computer-controlled processing means for processing measuring signals delivered by the sensors into position data of the hand-held probe.
    Type: Grant
    Filed: March 7, 2013
    Date of Patent: December 15, 2015
    Assignee: HOLDING PRODIM SYSTEMS B.V.
    Inventors: Rene Teune, Antonius Johannes Janssen
  • Publication number: 20150251923
    Abstract: A method comprising the steps of flowing a flow of relatively cold fluid along at least one photovoltaic solar panel being heated by solar energy towards and into a fluid treatment device, at least heating the flow of fluid in a fluid treatment device to divide the flow of fluid into a flow of a first fluid part and a flow of a second fluid part, flowing the flows of the first fluid part and the second fluid part from the fluid treatment device along the flow of relatively cold fluid. Before entering the fluid treatment device the flow of relatively cold fluid is preheated by the relatively warm photovoltaic solar panel and the relatively warm flow of the first fluid part and the relatively warm flow of the second fluid part.
    Type: Application
    Filed: September 17, 2013
    Publication date: September 10, 2015
    Inventor: Wilhelmus Franciscus Johannes Janssen