Patents by Inventor Johannes Joseph JANSSEN
Johannes Joseph JANSSEN has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Patent number: 8462314Abstract: A lithographic apparatus includes a projection system configured to project a patterned radiation beam onto a target portion of a substrate. The apparatus also includes a barrier member, surrounding a space between the projection system and, in use, the substrate, to define in part with the projection system a reservoir for liquid. A radially outer surface of the barrier member facing a portion of projection system and a radially outer surface of the portion of the projection system facing the barrier member each have a liquidphobic outer surface. The liquidphobic outer surface of the barrier member and/or the liquidphobic outer surface of the portion of the projection system has an inner edge that defines in part the reservoir.Type: GrantFiled: August 1, 2008Date of Patent: June 11, 2013Assignee: ASML Netherlands B.V.Inventors: Marcel Beckers, Marcus Adrianus Van De Kerkhof, Siebe Landheer, Wouterus Johannes Petrus Maria Maas, Jeroen Peter Johannes Bruijstens, Ivo Adam Johannes Thomas, Franciscus Johannes Joseph Janssen, Bartholomeus Mathias Van Oerle
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Patent number: 8451423Abstract: A lithographic apparatus of the immersion type is disclosed. In the apparatus, a plurality of heating and/or cooling devices are provided in the vicinity of the final element of the projection system, e.g. in a barrier member of a liquid handling system. The heating and/or cooling devices can be used, for example, to control temperature gradients in the final element of the projection system to control aberrations therein.Type: GrantFiled: June 17, 2009Date of Patent: May 28, 2013Assignee: ASML Netherlands B.V.Inventors: Franciscus Johannes Joseph Janssen, Siebe Landheer, Yücel Kök, Marcel Beckers, Ivo Adam Johannes Thomas, Marcio Alexandre Cano Miranda
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Publication number: 20130001442Abstract: A radiation source includes a fuel supply configured to deliver fuel to a plasma emission location for vaporization by a laser beam to form a plasma, and a collector configured to collect EUV radiation emitted by the plasma and direct the EUV radiation towards an intermediate focus. The collector includes a diffraction grating configured to diffract infrared radiation emitted by the plasma. The radiation source includes a radiation conduit located in between the collector and the intermediate focus. The radiation conduit includes an entrance aperture connected by an inwardly tapering body to an exit aperture. The radiation conduit includes an inner portion and an outer portion, the inner portion being closer to the intermediate focus than the outer portion. The inner portion is configured to reflect incident diffracted infrared radiation towards the outer portion.Type: ApplicationFiled: June 5, 2012Publication date: January 3, 2013Applicant: ASML Netherlands B.V.Inventors: Maikel Adrianus Cornelis Schepers, Markus Franciscus Antonius Eurlings, Franciscus Johannes Joseph Janssen, Bernard Jacob Andries Stommen, Hrishikesh Patel, Hermanus Johannes Maria Kreuwel, Jacob Cohen, Pepijn Wijnand Jozef Janssen, Maarten Kees Jan Boon
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Publication number: 20120300187Abstract: A lithographic apparatus includes a substrate table constructed to hold a substrate, and a projection system configured to project a patterned radiation beam onto a target portion of the substrate. A surface of a component of the lithographic apparatus that is in a vacuum environment in use is provided with a repeating structure configured to increase the effective thermal accommodation coefficient of the surface.Type: ApplicationFiled: May 23, 2012Publication date: November 29, 2012Applicant: ASML Netherlands B.V.Inventors: Han-Kwang NIENHUYS, Franciscus Johannes Joseph JANSSEN, Sven PEKELDER, Roger Wilhelmus Antonius Henricus SCHMITZ, Alexander Marinus Arnoldus HUIJBERTS, Paulus Albertus Maria GASSELING
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Publication number: 20120274912Abstract: A lithographic apparatus includes a projection system configured to project a patterned radiation beam onto a target portion of a substrate. The projection system has a final element. The apparatus also includes a barrier member surrounding a space between the projection system and, in use, the substrate, to define in part with the final element a reservoir for liquid. The barrier member is spaced from the final element to define a gap therebetween. The apparatus further includes a deformable seal between a radially outer surface of the final element and a radially outer surface of the barrier member. The deformable seal is configured to substantially prevent a gas from flowing past the seal towards or away from the reservoir of liquid.Type: ApplicationFiled: July 6, 2012Publication date: November 1, 2012Applicant: ASML NETHERLANDS B.V.Inventors: Marcus Adrianus VAN DE KERKHOF, Siebe Landheer, Marcel Beckers, Jeroen Peter Johannes Bruijstens, Ivo Adam Johannes Thomas, Franciscus Johannes Joseph Janssen
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Publication number: 20120262688Abstract: In an EUV (extreme ultraviolet) lithography apparatus, an illumination system includes a multifaceted field mirror and a multifaceted pupil mirror. A field facet mirror within mirror focuses EUV radiation onto a particular associated pupil facet mirror, from where it is directed to a target area. Each field facet mirror is modified to scatter unwanted DUV (deep ultraviolet) radiation into a range of directions. The majority of DUV falls onto neighboring pupil facet mirrors within the pupil mirrors, so that the amount of DUV radiation reaching target E is suppressed in comparison to the wanted EUV radiation. Because the distance between mirrors is much greater than the width of an individual pupil facet mirror, good DUV suppression can be achieved with only a narrow scattering angle. Absorption of EUV radiation in the scattering layer can be minimized.Type: ApplicationFiled: March 29, 2012Publication date: October 18, 2012Applicant: ASML Netherlands B.V.Inventors: Gosse Charles DE VRIES, Jan Bernard Plechelmus VAN SCHOOT, Franciscus Johannes Joseph JANSSEN, Nicolaas Aldegonda Jan Maria VAN AERLE
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Publication number: 20120229783Abstract: A lithographic apparatus includes a substrate table constructed to hold a substrate, a projection system configured to project a patterned radiation beam through an opening and onto a target portion of the substrate, and a conduit having an outlet in the opening. The conduit is configured to deliver gas to the opening. The lithographic apparatus further includes a cooling apparatus controlled by a control system. The cooling apparatus is configured to cool the gas such that gas which travels from the opening to the substrate has a predetermined temperature when the gas is incident upon the substrate.Type: ApplicationFiled: March 1, 2012Publication date: September 13, 2012Applicant: ASML Netherlands B.V.Inventors: Han-Kwang Nienhuys, Martinus Agnes Willem Cuijpers, Nicolaas Ten Kate, Leon Martin Levasier, Jan Bernard Plechelmus Van Schoot, Yuri Johannes Gabriël Van De Vijver, Oleg Viacheslavovich Voznyi, Franciscus Johannes Joseph Janssen, Danny Maria Hubertus Philips, Marcio Alexandre Cano Miranda, Oleksiy Galaktionov, Manish Ranjan, Albert Pieter Rijpma, Kursat Bal, Laurentius Johannes Adrianus Van Bokhoven, Roger Wilhelmus Antonius Henricus Schmitz, Alain Louis Claude Leroux
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Publication number: 20120229782Abstract: A lithographic apparatus includes a substrate table constructed to hold a substrate, a projection system configured to project a patterned radiation beam through an opening and onto a target portion of the substrate, and a conduit having an outlet in the opening. The conduit is configured to deliver gas to the opening. The lithographic apparatus further includes a cooling apparatus controlled by a control system. The cooling apparatus is configured to cool the gas such that gas which travels from the opening to the substrate has a predetermined temperature when the gas is incident upon the substrate.Type: ApplicationFiled: February 29, 2012Publication date: September 13, 2012Applicant: ASML Netherlands B.V.Inventors: Han-Kwang Nienhuys, Martinus Anges Willem Cuijpers, Leon Martin Levasier, Jan Bernard Plechelmus Van Schoot, Yuri Johannes Gabriël Van De Vijver, Oleg Viacheslavovich Voznyi, Franciscus Johannes Joseph Janssen, Danny Maria Hubertus Philips, Marcio Alexandre Cano Miranda, Olesksiy Galaktionov, Manish Ranjan, Albert Pieter Rijpma, Kursat Bal, Roger Wilhelmus Antonius Henricus Schmitz, Alain Louis Claude Leroux
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Patent number: 8233134Abstract: A lithographic apparatus includes a projection system configured to project a patterned radiation beam onto a target portion of a substrate. The projection system has a final element. The apparatus also includes a barrier member surrounding a space between the projection system and, in use, the substrate, to define in part with the final element a reservoir for liquid. The barrier member is spaced from the final element to define a gap therebetween. The apparatus further includes a deformable seal between a radially outer surface of the final element and a radially outer surface of the barrier member. The deformable seal is configured to substantially prevent a gas from flowing past the seal towards or away from the reservoir of liquid.Type: GrantFiled: September 25, 2008Date of Patent: July 31, 2012Assignee: ASML Netherlands B.V.Inventors: Marcus Adrianus Van De Kerkhof, Siebe Landheer, Marcel Beckers, Jeroen Peter Johannes Bruijstens, Franciscus Johannes Joseph Janssen, Ivo Adam Johannes Thomas
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Publication number: 20120113402Abstract: A lithographic apparatus is described having a liquid supply system configured to at least partly fill a space between a projection system of the lithographic apparatus and a substrate with liquid, a barrier member arranged to substantially contain the liquid within the space, and one or more elements to control and/or compensate for evaporation of liquid from the substrate.Type: ApplicationFiled: November 3, 2011Publication date: May 10, 2012Applicant: ASML NETHERLANDS B.V.Inventors: Theodorus Petrus Maria CADEE, Johannes Henricus Wilhelmus Jacobs, Nicolaas Ten Kate, Erik Roelof Loopstra, Aschwin Lodewijk Hendricus Johannes Vermeer, Jeroen Johannes Sophia Maria Mertens, Christianus Gerardus Maria De Mol, Marcel Johannus Elisabeth Hubertus Muitjens, Antonius Johannus Van Der Net, Joost Jeroen Ottens, Johannes Anna Quaedackers, Maria Elisabeth Reuhman-Huisken, Marco Koert Stavenga, Patricius Aloysius Jacobus Tinnemans, Martinus Comelis Maria Verhagen, Jacobus Johannus Leonardus Hendricus Verspay, Frederik Eduard De Jong, Koen Goorman, Boris Menchtchikov, Herman Boom, Stoyan Nihtianov, Richard Moerman, Martin Frans Pierre Smeets, Bart Leonard Peter Schoondermark, Franciscus Johannes Joseph Janssen, Michel Riepen
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Patent number: 8138486Abstract: In an immersion lithographic apparatus, bubble formation in immersion liquid is reduced or prevented by reducing a gap size or area on a substrate table and/or covering the gap.Type: GrantFiled: November 6, 2009Date of Patent: March 20, 2012Assignee: ASML Netherlands B.V.Inventors: Hans Jansen, Sebastiaan Maria Johannes Cornelissen, Sjoerd Nicolaas Lambertus Donders, Roelof Frederik De Graaf, Christiaan Alexander Hoogendam, Hernes Jacobs, Martinus Hendrikus Antonius Leenders, Jeroen Johannes Sophia Maria Mertens, Jan-Gerard Cornelis Van Der Toorn, Peter Smits, Franciscus Johannes Joseph Janssen, Michel Riepen, Bob Streefkerk
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Publication number: 20110310368Abstract: A method for thermally conditioning an optical element includes irradiating the optical element with radiation, not-irradiating the optical element with the radiation, allowing heat flow between the optical element and a conditioning fluid that is held in a conditioning fluid reservoir, and providing a fluid flow of the conditioning fluid, to supply thermally conditioned fluid to the reservoir. A flow rate of the fluid during the irradiating of the optical element is lower than a flow rate of the fluid when the optical element is not-irradiated.Type: ApplicationFiled: May 20, 2009Publication date: December 22, 2011Applicant: ASML Netherlands B.V.Inventors: Roger Wilhelmus Antonius Henricus Schmitz, Tjarko Adriaan Rudolf Van Empel, Marcel Johannus Elisabeth Hubertus Muitjens, Lun Cheng, Franciscus Johannes Joseph Janssen, William Arie Van Helden, Richard Versluis, Paulus Bartholomeus Johannes Schaareman, Axel Sebastiaan Lexmond, Evert Nieuwkoop, Charles William Barras Potts, Martinus Henricus Johannes Lemmen, Frederik Van Der Graaf, Mathilde Gertrudis Maria De Kroon, Johannes Fransiscus Maria Velthuis
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Publication number: 20110249245Abstract: A method of thermally conditioning an optical element operating in a vacuum environment. The optical element includes a first body having at least one optical surface and at least one heat transfer surface. The first body is dynamically controlled in position and/or orientation. The method includes controlling a temperature of a second body to a desired temperature, the second body including a second heat transfer surface; positioning the second body adjacent the first body and dynamically controlling the second body in position and/or orientation so as to maintain the first and second heat transfer surfaces in a substantially constant arrangement without contact between the bodies; and delivering a gas as a heat transfer medium into a heat transfer space defined by the first and second heat transfer surfaces, while controlling the pressure of the gas in the heat transfer space to between about 30 Pa and about 300 Pa.Type: ApplicationFiled: April 6, 2011Publication date: October 13, 2011Applicant: ASML Netherlands B.V.Inventors: Franciscus Johannes Joseph JANSSEN, Erik Roelof Lopstra
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Publication number: 20110183257Abstract: In an immersion lithographic apparatus, bubble formation in immersion liquid is reduced or prevented by reducing a gap size or area on a substrate table and/or covering the gap.Type: ApplicationFiled: April 8, 2011Publication date: July 28, 2011Applicant: ASML NETHERLANDS B.V.Inventors: Hans JANSEN, Sebastiaan Maria Johannes CORNELISSEN, Sjoerd Nicolaas Lambertus DONDERS, Roelof Frederik DE GRAAF, Christiaan Alexander HOOGENDAM, Hernes JACOBS, Martinus Hendrikus Antonius LEENDERS, Jeroen Johannes Sophia Maria MERTENS, Bob STREEFKERK, Jan-Gerard Cornelis VAN DER TOORN, Peter SMITS, Franciscus Johannes Joseph JANSSEN, Michel RIEPEN
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Publication number: 20110176121Abstract: In a lithographic apparatus, a part of a reflector is heated and cooled. The rate of heating and/or the rate of cooling is adjusted to adjust the temperature of the part. The change in temperature of the part exerts a force on the reflector, which changes its shape.Type: ApplicationFiled: January 11, 2011Publication date: July 21, 2011Applicant: ASML NETHERLANDS B.V.Inventors: Erik Roelof LOOPSTRA, Marius RAVENSBERGEN, Franciscus Johannes Joseph JANSSEN
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Publication number: 20110170078Abstract: A projection system (PS) is provided which includes, in an embodiment, two frames. The optical elements of the projection system are mounted on a first frame (200). The position of the optical elements is measured relative to a second frame (300) using a first measurement system (910). A second measurement system (920) is used to measure a parameter associated with a deformation of the second frame. The measurement made by the second measurement system can be used to compensate for any errors in the position of the optical elements as measured by the first measurement system resulting from deformations of the second frame. Typically, deformations of the frames are due to resonant oscillation and thermal expansion. Having two frames enables the optical elements of the projection system to be positioned with a high degree of accuracy.Type: ApplicationFiled: July 17, 2009Publication date: July 14, 2011Applicant: ASML Netherlands B.V.Inventors: Erik Roelof Loopstra, Wilhelmus Petrus De Boeij, Hans Butler, Robertus Johannes Marinus, Jan Bernard Plechelmus Van Schoot, Timotheus Franciscus Sengers, Maurice Willem Jozef Etiënne Wijckmans, Franciscus Johannes Joseph Janssen
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Publication number: 20110090474Abstract: In an immersion lithographic apparatus, bubble formation in immersion liquid is reduced or prevented by reducing a gap size or area on a substrate table and/or covering the gap.Type: ApplicationFiled: December 29, 2010Publication date: April 21, 2011Applicant: ASML NETHERLANDS B.V.Inventors: Hans JANSEN, Sebastiaan Maria Johannes Cornelissen, Sjoerd Nicolaas Lambertus Donders, Roelof Frederik De Graaf, Christiaan Alexander Hoogendam, Hernes Jacobs, Martinus Hendrikus Antonius Leenders, Jeroen Johannes Sophia Maria Mertens, Bob Streefkerk, Jan-Gerard Cornelis Van Der Toorn, Peter Smits, Franciscus Johannes Joseph Janssen, Michel Riepen
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Patent number: 7928407Abstract: In an immersion lithographic apparatus, bubble formation in immersion liquid is reduced or prevented by reducing a gap size or area on a substrate table and/or covering the gap.Type: GrantFiled: November 22, 2006Date of Patent: April 19, 2011Assignee: ASML Netherlands B.V.Inventors: Hans Jansen, Sebastiaan Maria Johannes Cornelissen, Sjoerd Nicolaas Lambertus Donders, Roelof Frederik De Graaf, Christiaan Alexander Hoogendam, Hernes Jacobs, Martinus Hendrikus Antonius Leenders, Jeroen Johannes Sophia Maria Mertens, Bob Streefkerk, Jan-Gerard Cornelis Van Der Toorn, Peter Smits, Franciscus Johannes Joseph Janssen, Michel Riepen
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Publication number: 20110005603Abstract: A fluid handling structure configured to supply and confine immersion liquid to a space defined between a projection system and a facing surface facing the fluid handling structure is disclosed. The fluid handling structure includes a supply passage formed therein for the passage of fluid from outside the fluid handling structure to the space, and a thermal isolator positioned adjacent the supply passage at least partly to isolate fluid in the supply passage from a thermal load induced in the fluid handling structure.Type: ApplicationFiled: June 22, 2010Publication date: January 13, 2011Applicant: ASML Netherlands B.V.Inventors: Hrishikesh Patel, Johannes Henricus Wilhelmus Jacobs, Paulus Martinus Maria Liebregts, Ronald Van Der Ham, Wilhelmus Franciscus Johannes Simons, Daniel Jozef Maria Direcks, Franciscus Johannes Joseph Janssen, Paul Petrus Joannes Berkvens, Gert-Jan Gerardus Johannes Thomas Brands, Koen Steffens, Han Henricus Aldegonda Lempens, Matheus Anna Karel Van Lierop, Christophe De Metsenaere, Marcio Alexandre Cano Miranda, Patrick Johannes Wilhelmus Spruytenburg, Joris Johan Anne-Marie Verstraete, Ruud Hendricus Martinus Johannes Bloks
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Publication number: 20100321650Abstract: A lithographic apparatus is described having a liquid supply system configured to at least partly fill a space between a projection system of the lithographic apparatus and a substrate with liquid, a barrier member arranged to substantially contain the liquid within the space, and one or more elements to control and/or compensate for evaporation of liquid from the substrate.Type: ApplicationFiled: August 26, 2010Publication date: December 23, 2010Applicant: ASML NETHERLANDS B.V.Inventors: THEODORUS PETRUS MARIA CADEE, Johannes Henricus Wilhelmus Jacobs, Nicolaas Ten Kate, Erik Roelof Loopstra, Aschwin Lodewijk Hendricus Johannes Vermeer, Jeroen Johannes Sophia Maria Mertens, Christianus Gerardus Maria De Mol, Marcel Johannus Elisabeth Hubertus Muitjens, Antonius Johannus Van Der Net, Joost Jeroen Ottens, Johannes Anna Quaedackers, Mana Elisabeth Reuhman-Huisken, Marco Koert Stavenga, Patricius Aloysius Jacobus Tinnemans, Martinus Comelis Maria Verhagen, Jacobus Johannus Leonardus Hendricus Verspay, Frederik Eduard De Jong, Koen Goorman, Boris Menchtchikov, Herman Boom, Stoyan Nihtianov, Richard Moerman, Martin Frans Pierre Smeets, Bart Leonard Peter Schoondermark, Franciscus Johannes Joseph Janssen, Michel Riepen