Patents by Inventor Johannes Liebenberg
Johannes Liebenberg has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Patent number: 11874098Abstract: A wireless detonator assembly which includes a detonator, a receiver, a printed circuit board with a stored key which is hardwired onto the board during manufacture of the detonator assembly and control logic which allows the detonator to be fired only if the control logic extracts from a signal, received by the receiver, a reference key which is identical to the stored key.Type: GrantFiled: February 2, 2021Date of Patent: January 16, 2024Assignee: DETNET SOUTH AFRICA (PTY) LTDInventors: Elmar Lennox Muller, Christiaan Tielman Meyer, Abraham Johannes Liebenberg
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Publication number: 20230417525Abstract: A detonator assembly which includes a detonator arrangement comprising a detonator, a receiver which is responsive to a magnetic signal from a control centre and a control circuit which, in response to a signal from the receiver, regulates firing of the detonator, and which is characterised in that a fibre optic cable is connected to and extends from the detonator arrangement, and in that the detonator arrangement includes a transmitter/receiver module which is in signal communication with the fibre optic cable and the control circuit.Type: ApplicationFiled: September 28, 2021Publication date: December 28, 2023Inventors: Elmar Lennox MULLER, Abraham Johannes LIEBENBERG
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Publication number: 20230194230Abstract: A safety arrangement for a wireless blasting system which includes a plurality of wireless detonator assemblies located at a blast zone wherein each route which provides access to the blast zone is monitored to detect removal of a wireless detonator assembly which is in an operative mode from the blast zone.Type: ApplicationFiled: February 2, 2021Publication date: June 22, 2023Inventors: Elmar Lennox Muller, Tielman Christiaan Meyer, Abraham Johannes Liebenberg
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Publication number: 20230143962Abstract: Systems, apparatuses, and methods are provided for dual-pass amplification of laser beams along a common beam path. An example method can include generating a first laser beam and a second laser beam. Subsequently, the example method can include performing dual-pass amplification of the first laser beam and the second laser beam along a common beam path. In some aspects, the first laser beam can include a first wavelength, the second laser beam can include a second wavelength different from the first wavelength.Type: ApplicationFiled: March 10, 2021Publication date: May 11, 2023Inventors: Rostislav Rokitski, Philip M. Conklin, Cory Alan Stinson, Alexander Anthony Schafgans, Christoffel Johannes Liebenberg
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Publication number: 20220357141Abstract: A wireless detonator assembly which includes a detonator, a receiver, a printed circuit board with a stored key which is hardwired onto the board during manufacture of the detonator assembly and control logic which allows the detonator to be fired only if the control logic extracts from a signal, received by the receiver, a reference key which is identical to the stored key.Type: ApplicationFiled: February 2, 2021Publication date: November 10, 2022Applicant: DETNET SOUTH AFRICA (PTY) LTDInventors: Elmar Lennox Muller, Christiaan Tielman Meyer, Abraham Johannes Liebenberg
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Publication number: 20220350181Abstract: An optical modulator includes an acousto-optic assembly and a thermal management apparatus. The acousto-optic assembly includes: an acousto-optic material; a first side configured to receive an incident light beam; and a second side configured to emit an output light beam based on the incident light beam. The thermal management apparatus includes: a first thermally conductive material in thermal contact with the first side of the acousto-optic assembly; and a second thermally conductive material in thermal contact with the second side of the acousto-optic assembly.Type: ApplicationFiled: September 17, 2020Publication date: November 3, 2022Inventors: Christoffel Johannes Liebenberg, Peter Frans Maria Muys, Heine Melle Mulder
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Patent number: 10887975Abstract: An optical pulse for an extreme ultraviolet (EUV) light source may be formed by illuminating a semiconductor material of a modulation system with a first light beam having a first wavelength; applying a voltage to the semiconductor material for a time duration, the applied voltage being sufficient to modify an index of refraction of the semiconductor material such that a polarization state of a light beam having a second wavelength passing through the semiconductor material is modified to pass through at least one polarization-based optical element of the modulation system; and forming an optical pulse by passing a second light beam having the second wavelength through the semiconductor material during the time duration.Type: GrantFiled: January 14, 2019Date of Patent: January 5, 2021Assignee: ASML Netherlands B.V.Inventors: Christoffel Johannes Liebenberg, Robert William Parry
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Patent number: 10299361Abstract: An optical pulse for an extreme ultraviolet (EUV) light source may be formed by illuminating a semiconductor material of a modulation system with a first light beam having a first wavelength; applying a voltage to the semiconductor material for a time duration, the applied voltage being sufficient to modify an index of refraction of the semiconductor material such that a polarization state of a light beam having a second wavelength passing through the semiconductor material is modified to pass through at least one polarization-based optical element of the modulation system; and forming an optical pulse by passing a second light beam having the second wavelength through the semiconductor material during the time duration.Type: GrantFiled: March 24, 2017Date of Patent: May 21, 2019Assignee: ASML Netherlands B.V.Inventors: Christoffel Johannes Liebenberg, Robert William Parry
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Publication number: 20190150267Abstract: An optical pulse for an extreme ultraviolet (EUV) light source may be formed by illuminating a semiconductor material of a modulation system with a first light beam having a first wavelength; applying a voltage to the semiconductor material for a time duration, the applied voltage being sufficient to modify an index of refraction of the semiconductor material such that a polarization state of a light beam having a second wavelength passing through the semiconductor material is modified to pass through at least one polarization-based optical element of the modulation system; and forming an optical pulse by passing a second light beam having the second wavelength through the semiconductor material during the time duration.Type: ApplicationFiled: January 14, 2019Publication date: May 16, 2019Inventors: Christoffel Johannes Liebenberg, Robert William Parry
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Publication number: 20190049226Abstract: A blasting system in which environmental and installation data prevailing at the time a detonator is loaded into a borehole are stored in the detonator and are made available to an operator before the detonator is fired.Type: ApplicationFiled: May 4, 2016Publication date: February 14, 2019Inventors: Abraham Johannes Liebenberg, Michiel Jacobus Kruger, Aldaine Whyte
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Publication number: 20180279458Abstract: An optical pulse for an extreme ultraviolet (EUV) light source may be formed by illuminating a semiconductor material of a modulation system with a first light beam having a first wavelength; applying a voltage to the semiconductor material for a time duration, the applied voltage being sufficient to modify an index of refraction of the semiconductor material such that a polarization state of a light beam having a second wavelength passing through the semiconductor material is modified to pass through at least one polarization-based optical element of the modulation system; and forming an optical pulse by passing a second light beam having the second wavelength through the semiconductor material during the time duration.Type: ApplicationFiled: March 24, 2017Publication date: September 27, 2018Inventors: Christoffel Johannes Liebenberg, Robert William Parry
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Publication number: 20180120073Abstract: A method of locating a borehole and a detonator in a blasting system which includes a number of boreholes and detonators, wherein an operator uses a mobile device which presents to the operator identity and location information of a borehole but only if the borehole is within a predetermined distance of the operator.Type: ApplicationFiled: May 4, 2016Publication date: May 3, 2018Inventors: Abraham Johannes Liebenberg, Michiel Jacobus Kruger, Aldaine Whyte
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Patent number: 8939082Abstract: For use in a blasting system (10), a visible, throw-away, safety lockout device (30) which operates automatically, to interrupt power to the blasting system (10), upon the occurrence of one or more defined fault conditions.Type: GrantFiled: July 7, 2011Date of Patent: January 27, 2015Assignee: Detnet South Africa (Pty) LtdInventor: Abraham Johannes Liebenberg
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Publication number: 20130180422Abstract: For use in a blasting system (10), a visible, throw-away, safety lockout device (30) which operates automatically, to interrupt power to the blasting system (10), upon the occurrence of one or more defined fault conditions.Type: ApplicationFiled: July 7, 2011Publication date: July 18, 2013Applicant: DETNET SOUTH AFRICA (PTY) LTDInventor: Abraham Johannes Liebenberg
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Publication number: 20070142481Abstract: A process (10) for synthesising hydrocarbons includes feeding a gaseous feedstock (18) comprising hydrogen and carbon monoxide, into a first Fischer-Tropsch reaction stage (12) which is a three-phase low temperature catalytic Fischer-Tropsch reaction stage, and allowing the hydrogen and carbon monoxide partially to react catalytically in the first reaction stage (12) to form hydrocarbons. At least a portion of a tail gas (32) which includes unreacted hydrogen and carbon monoxide obtained from the first reaction stage, is fed into a second Fischer-Tropsch reaction stage (42) which is a two-phase high temperature catalytic Fischer-Tropsch reaction stage. The hydrogen and carbon monoxide are allowed at least partially to react catalytically in the second reaction stage (42) to form gaseous hydrocarbons.Type: ApplicationFiled: August 20, 2004Publication date: June 21, 2007Applicant: Sasol Technology (Proprietary) LimitedInventors: André Steynberg, Jacob De Boer, Herman Nel, Werner Ernst, Johannes Liebenberg