Abstract: Systems and methods configured to generate virtual gimbal information for range images produced from 3D depth scans are described. In operation according to embodiments, known and advantageous spatial geometries of features of a scanned volume are exploited to generate virtual gimbal information for a pose. The virtual gimbal information of embodiments may be used to align a range image of the pose with one or more other range images for the scanned volume, such as for combining the range images for use in indoor mapping, gesture recognition, object scanning, etc. Implementations of range image registration using virtual gimbal information provide a realtime one shot direct pose estimator by detecting and estimating the normal vectors for surfaces of features between successive scans which effectively imparts a coordinate system for each scan with an orthogonal set of gimbal axes and defines the relative camera attitude.

Abstract: The present invention relates to an apparatus for carrying out a PCVD process in which one or more doped or undoped glass layers are coated onto the interior of a glass substrate tube. The apparatus comprises an applicator having an inner wall and an outer wall and a microwave guide that opens into the applicator. The applicator extends around a cylindrical axis and which is provided with a passage adjacent to the inner wall, through which the microwaves supplied via the microwave guide can exit, over which cylindrical axis the substrate tube can be positioned, while the applicator is fully surrounded by a furnace that extends over the cylindrical axis.

Abstract: Improved complementary phase shift mask (c:PSM) imaging techniques are described, including a method in which scattering bars are provided on the trim mask in order to allow better CD uniformity to be achieved in the double exposure process. The number, size and position of the scattering bars can be optimised to achieve a desired isofocal CD and/or a desired level of sensitivity of the CD to trim exposure energy used in the second exposure step of the c:PSM process. The trim exposure dose can be regulated, and/or the trim width used on the trim mask can be optimised, to compensate for iso-dense bias so as to achieve optical proximity correction.