Abstract: An object suitable for a plasma cleaning treatment in a plasma cleaning device, the object including a first outer surface area; a second outer surface area, wherein the object is constructed and arranged to cooperate with a removable cover such that the cover is connectable to the object to cover the second outer surface area, and wherein the object connected with the removable cover is adapted to be cleaned in the plasma cleaning device such that the plasma cleaning device is not exposed to particles of the second outer surface area and wherein the first outer surface area is cleaned in the plasma cleaning device.

Abstract: An object suitable for a plasma cleaning treatment in a plasma cleaning device, the object including a first outer surface area; a second outer surface area, wherein the object is constructed and arranged to cooperate with a removable cover such that the cover is connectable to the object to cover the second outer surface area, and wherein the object connected with the removable cover is adapted to be cleaned in the plasma cleaning device such that the plasma cleaning device is not exposed to particles of the second outer surface area and wherein the first outer surface area is cleaned in the plasma cleaning device.

Abstract: An apparatus includes a first body; a second body that is moveable relative to the first body; a seal arranged between the first and the second body such that a first space is separated from a second space by the first body, the second body and the seal, wherein the seal is located at a distance from the first body; a fluid supply arranged to create a fluid flow between the first body and the seal to create a non-contact seal between the first and the second space so as to enable movement between the first and the second body, and a controller configured to control the distance during movement of the first and the second body relative to each other.

Abstract: The present invention provides a lithographic apparatus including an illumination system configured to condition a radiation beam; a patterning device support constructed to support a patterning device, the patterning device placed on the patterning device support being capable of imparting the radiation beam with a pattern in its cross-section to form a patterned radiation beam; a substrate table constructed to hold a substrate; a projection system configured to project the patterned radiation beam onto a target portion of the substrate, and a patterning device handling apparatus, including a single robot for exchanging a patterning device with the patterning device support and a loading station, wherein the robot includes a first holding device configured to hold a patterning device in a first holding position and a second holding device configured to hold a patterning device in a second holding position. Such single robot makes a rapid and accurate exchange of patterning devices possible.

Abstract: An apparatus includes a first support structure configured to support an element that has an alignment marker. The apparatus also includes an alignment sensor comprising a light source that is integrally formed on the first support structure and is configured to provide a light beam that illuminates the alignment marker and at least one detector configured to detect the position of the alignment marker by analyzing the light beam transmitted through the element. Such an apparatus may be used to align of the element with respect to the first support structure.

Abstract: The present invention relates to a lithographic apparatus including a projection system configured to project a patterned radiation beam onto a target portion of a substrate held on a substrate support, the patterned beam of radiation being patterned with a patterning device held by a patterning device support.

Abstract: The present invention provides a lithographic apparatus including an illumination system configured to condition a radiation beam; a patterning device support constructed to support a patterning device, the patterning device placed on the patterning device support being capable of imparting the radiation beam with a pattern in its cross-section to form a patterned radiation beam; a substrate table constructed to hold a substrate; a projection system configured to project the patterned radiation beam onto a target portion of the substrate, and a patterning device handling apparatus, including a single robot for exchanging a patterning device with the patterning device support and a loading station, wherein the robot includes a first holding device configured to hold a patterning device in a first holding position and a second holding device configured to hold a patterning device in a second holding position. Such single robot makes a rapid and accurate exchange of patterning devices possible.

Abstract: The present invention relates to a lithographic apparatus including a projection system configured to project a patterned radiation beam onto a target portion of a substrate held on a substrate support, the patterned beam of radiation being patterned with a patterning device held by a patterning device support.