Patents by Inventor Johannes Mathias Adriens

Johannes Mathias Adriens has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Lithographic apparatus and method for determining Z position errors/variations and substrate table flatness
    Publication number: 20060170892
    Abstract: A lithographic projection apparatus including an illumination system configured to provide a beam of radiation, a support configured to support a patterning device, the patterning device configured to impart the beam with a pattern in its cross section, a substrate table configured to hold a substrate, a projection system configured to project the patterned radiation onto a target portion of the substrate, a plurality of level sensors for sensing a level of a substrate carried on the substrate table at a plurality of different positions, and a system for determining the position of the substrate table.
    Type: Application
    Filed: December 27, 2005
    Publication date: August 3, 2006
    Applicant: ASML Netherlands B.V.
    Inventors: Willem Herman Koenen, Arthur Minnaert, Luberthus Ouwehand, Johannes Mathias Adriens, Wouter Pril