Patents by Inventor Johannes Mathias Theodorus Antonius Adriens

Johannes Mathias Theodorus Antonius Adriens has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Lithographic apparatus and method for determining Z position errors/variations and substrate table flatness
    Patent number: 7333174
    Abstract: A lithographic projection apparatus including an illumination system configured to provide a beam of radiation, a support configured to support a patterning device, the patterning device configured to impart the beam with a pattern in its cross section, a substrate table configured to hold a substrate, a projection system configured to project the patterned radiation onto a target portion of the substrate, a plurality of level sensors for sensing a level of a substrate carried on the substrate table at a plurality of different positions, and a system for determining the position of the substrate table.
    Type: Grant
    Filed: December 27, 2005
    Date of Patent: February 19, 2008
    Assignee: ASML Netherlands, B.V.
    Inventors: Willem Herman Gertruda Anna Koenen, Arthur Winfried Eduardus Minnaert, Luberthus Ouwehand, Johannes Mathias Theodorus Antonius Adriens, Wouter Onno Pril